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Tobón YA, Romano RM, Védova COD, Downs AJ. Formation of New Halogenothiocarbonylsulfenyl Halides, XC(S)SY, through Photochemical Matrix Reactions Starting from CS2and a Dihalogen Molecule XY (XY = Cl2, Br2, or BrCl). Inorg Chem 2007; 46:4692-703. [PMID: 17411033 DOI: 10.1021/ic070119+] [Citation(s) in RCA: 21] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Abstract
Isolation of a dihalogen molecule XY (XY=Cl2, Br2, or BrCl) with CS2 in a solid Ar matrix at about 15 K leads, by broad-band UV-vis photolysis (200<or=lambda<or=800 nm), to a variety of products depending on the natures of X and Y. These products have been identified on the basis of the IR spectra of the matrices. In addition to the familiar species SCCl2, ClCS*, Cl*...SCS, CCl4, *CCl3, :CCl2, SCl2, SCBr2, CBr4, *CBr3, BrC(S)Cl, BrCCl3, and :CBrCl, the following new molecules have also been identified as products of the various photoreactions: syn-ClC(S)SCl, anti-ClC(S)SCl, syn-BrC(S)SBr, anti-BrC(S)SBr, syn-ClC(S)SBr, anti-ClC(S)SBr, syn-BrC(S)SCl, anti-BrC(S)SCl, ClC(S)S*, BrCS*, and Br*...SCS. The IR spectra of these hitherto unknown species have been interpreted with reference to the predictions of ab initio (HF and MP2) and density functional theory (DFT) calculations. The results are analyzed in relation to the reaction pathways accessed by matrix photolysis.
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Affiliation(s)
- Yeny A Tobón
- CEQUINOR (UNLP-CONICET) and Laboratorio de Servicios a la Industria y al Sistema Científico (UNLP-CIC-CONICET), Departamento de Química, Facultad de Ciencias Exactas, Universidad Nacional de La Plata, 47 esq. 115, (1900) La Plata, Argentina
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Tomovska R, Bastl Z, Vorlíček V, Vacek K, Šubrt J, Plzák Z, Pola J. ArF Laser-Induced Chemical Vapor Deposition of Polythiene Films from Carbon Disulfide. J Phys Chem B 2003. [DOI: 10.1021/jp034411o] [Citation(s) in RCA: 18] [Impact Index Per Article: 0.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Radmila Tomovska
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
| | - Zdeněk Bastl
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
| | - Vladimír Vorlíček
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
| | - Karel Vacek
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
| | - Jan Šubrt
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
| | - Zbyněk Plzák
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
| | - Josef Pola
- Laser Chemistry Group, Institute of Chemical Process Fundamentals, Academy of Sciences of the Czech Republic, 16502 Prague, Czech Republic, J. Heyrovský Institute of Physical Chemistry, Academy of Sciences of the Czech Republic, 18223 Prague, Czech Republic, Institute of Physics, Academy of Sciences of the Czech Republic, 18040 Prague, Czech Republic, and Institute of Inorganic Chemistry, Academy of Sciences of the Czech Republic, 25068 Řež near Prague, Czech Republic
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