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For: Davidson LM, Hughes KJ, Scampton RJ. Some mechanistic suggestions for silylene to silylene interconversions. J Organomet Chem 1984. [DOI: 10.1016/0022-328x(84)80438-6] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Number Cited by Other Article(s)
1
Liu X, Zhang J, Vazquez A, Wang D, Li S. Mechanistic Study of Thermal Decomposition of Hexamethyldisilane by Flash Pyrolysis Vacuum Ultraviolet Photoionization Time-of-Flight Mass Spectrometry and Density Functional Theory. J Phys Chem A 2019;123:10520-10528. [PMID: 31710488 DOI: 10.1021/acs.jpca.9b08102] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
2
Liu X, Zhang J, Vazquez A, Wang D, Li S. Mechanism of the thermal decomposition of tetramethylsilane: a flash pyrolysis vacuum ultraviolet photoionization time-of-flight mass spectrometry and density functional theory study. Phys Chem Chem Phys 2018;20:18782-18789. [PMID: 29963661 DOI: 10.1039/c8cp02626b] [Citation(s) in RCA: 11] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/14/2022]
3
Becerra R, Cannady JP, Walsh R. Time-resolved gas-phase kinetic studies of the reaction of dimethylsilylene with triethylsilane-1-d: kinetic isotope effect for the Si–H insertion process. Phys Chem Chem Phys 2013;15:5530-8. [DOI: 10.1039/c3cp43222j] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/25/2022]
4
Badran I, Forster TD, Roesler R, Shi YJ. Competition of Silene/Silylene Chemistry with Free Radical Chain Reactions Using 1-Methylsilacyclobutane in the Hot-Wire Chemical Vapor Deposition Process. J Phys Chem A 2012;116:10054-62. [DOI: 10.1021/jp3055558] [Citation(s) in RCA: 22] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/01/2023]
5
Wróbel AM, Walkiewicz-Pietrzykowska A, Klemberg-Sapieha JE, Hatanaka Y, Aoki T, Nakanishi Y. Remote hydrogen plasma chemical vapor deposition of silicon-carbon thin-film materials from a hexamethyldisilane source: Characterization of the process and the deposits. J Appl Polym Sci 2002. [DOI: 10.1002/app.11304] [Citation(s) in RCA: 30] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/07/2022]
6
Larson GL. Organosilicon survey 1985. The silicon-carbon bond. J Organomet Chem 1987. [DOI: 10.1016/0022-328x(87)87186-3] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
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