Theoretical calculations of relative ion yields for glow discharge mass spectrometry

Glow discharge mass spectrometry

Over the past twenty years or so, glow discharge mass spectrometry (GDMS) has become the industry standard for the analysis of trace elements in metals and semiconductors. A review of its history is followed by a picture of the present situation and a look to where the future may lie. Applications are summarised, including the ability of GDMS to offer depth-resolved data and non-conductor analysis, and the well-documented quantitative nature of the results is reviewed. The effects resulting from the physical properties of the analyte material are discussed at length. Finally, recent work such as "fast flow" sources and pulsed glow discharges is reviewed.

Relative ion yields measured with a high-resolution glow discharge mass spectrometer operated with an argon/hydrogen mixture

Quantitative elemental analysis by glow discharge mass spectrometry (GDMS) requires a calibration factor for each element. The calibration factors used in the present work are called relative ion yields (RIYs). The RIYs of each of 19 elements within samples of four National Institute of Standards and Technology steel reference materials (nos. 661-664) were measured using pure argon and an argon mixture containing 1.0% hydrogen by volume. The RIYs measured using pure argon correlated within a factor of approximately 2-3 to the RIYs calculated by a theoretical model. The RlYs measured for these 19 elements using the argon mixture containing 1.0% hydrogen correlated within a factor of approximately 1.3 to the calculated RIYs. These results may have significant analytical potential with respect to GDMS and may have application to other plasma techniques.