Machine learning-based modeling and operation for ALD of SiO2 thin-films using data from a multiscale CFD simulation

When Machine Learning Meets 2D Materials: A Review

The availability of an ever-expanding portfolio of 2D materials with rich internal degrees of freedom (spin, excitonic, valley, sublattice, and layer pseudospin) together with the unique ability to tailor heterostructures made layer by layer in a precisely chosen stacking sequence and relative crystallographic alignments, offers an unprecedented platform for realizing materials by design. However, the breadth of multi-dimensional parameter space and massive data sets involved is emblematic of complex, resource-intensive experimentation, which not only challenges the current state of the art but also renders exhaustive sampling untenable. To this end, machine learning, a very powerful data-driven approach and subset of artificial intelligence, is a potential game-changer, enabling a cheaper - yet more efficient - alternative to traditional computational strategies. It is also a new paradigm for autonomous experimentation for accelerated discovery and machine-assisted design of functional 2D materials and heterostructures. Here, the study reviews the recent progress and challenges of such endeavors, and highlight various emerging opportunities in this frontier research area.

Machine-learning screening of luminogens with aggregation-induced emission characteristics for fluorescence imaging

Due to the excellent biocompatible physicochemical performance, luminogens with aggregation-induced emission (AIEgens) characteristics have played a significant role in biomedical fluorescence imaging recently. However, screening AIEgens for special applications takes a lot of time and efforts by using conventional chemical synthesis route. Fortunately, artificial intelligence techniques that could predict the properties of AIEgen molecules would be helpful and valuable for novel AIEgens design and synthesis. In this work, we applied machine learning (ML) techniques to screen AIEgens with expected excitation and emission wavelength for biomedical deep fluorescence imaging. First, a database of various AIEgens collected from the literature was established. Then, by extracting key features using molecular descriptors and training various state-of-the-art ML models, a multi-modal molecular descriptors strategy has been proposed to extract the structure-property relationships of AIEgens and predict molecular absorption and emission wavelength peaks. Compared to the first principles calculations, the proposed strategy provided greater accuracy at a lower computational cost. Finally, three newly predicted AIEgens with desired absorption and emission wavelength peaks were synthesized successfully and applied for cellular fluorescence imaging and deep penetration imaging. All the results were consistent successfully with our expectations, which demonstrated the above ML has a great potential for screening AIEgens with suitable wavelengths, which could boost the design and development of novel organic fluorescent materials.

Machine-Learning-Assisted Accurate Prediction of Molecular Optical Properties upon Aggregation

For practical applications, molecules often exist in an aggregate state. Therefore, it is of great value if one can predict the performance of molecules when forming aggregates, for example, aggregation-induced emission (AIE) or aggregation-caused quenching (ACQ). Herein, a database containing AIE/ACQ molecules reported in the literature is first established. Through training, these machine learning (ML) models can build up the structure-property relationship and thus implement fast prediction of AIE/ACQ properties. To this end, a multi-modal approach is proposed, multiple prediction methods are compared and designed, and thus an ensemble strategy is developed. First, multiple molecular descriptors are considered at the same time, major features are extracted by dimensionality reduction, and multi-modal features are synthesized. Then, several state-of-the-art methods are designed and compared to analyze the advantages of the different methods. Finally, the ensemble strategy combines the advantages of the multiple methods to obtain the final prediction result. The reliability of this approach in an unknown molecular space is further verified by three newly designed molecules. Reasonable consistency between model predictions and experimental outcomes is obtained. The result indicates that ML can be a powerful tool to predict molecular properties in the aggregated state, thus accelerating the development of solid-state optical materials.

Intelligent Agents for the Optimization of Atomic Layer Deposition

Atomic layer deposition (ALD) is a highly controllable thin film synthesis approach with applications in computing, energy, and separations. The flexibility of ALD means that it can access a massive chemical catalogue; however, this chemical and process diversity results in significant challenges in determining processing parameters that result in stable and uniform film growth with minimal precursor consumption. In situ measurements of the ALD growth per cycle (GPC) can accelerate process development but it still requires expert intuition and time-consuming trial and error to identify acceptable processing parameters. This procedure is made more difficult by the presence of experimental noise in the GPC values and the complexity of ALD surface chemistries. A need exists for efficient optimization approaches capable of autonomously determining processing conditions resulting in optimal ALD film growth. In this work, we present the development of three optimization strategies and compare their performance in optimizing four simulated ALD processes. Furthermore, the effect of noise in the GPC measurements on optimization convergence is studied.

High Surface Area VOx/TiO2/SBA-15 Model Catalysts for Ammonia SCR Prepared by Atomic Layer Deposition

The mode of operation of titania-supported vanadia (VOx) catalysts for NOx abatement using ammonia selective catalytic reduction (NH3-SCR) is still vigorously debated. We introduce a new high surface area VOx/TiO2/SBA-15 model catalyst system based on mesoporous silica SBA-15 making use of atomic layer deposition (ALD) for controlled synthesis of titania and vanadia multilayers. The bulk and surface structure is characterized by X-ray diffraction (XRD), UV-vis and Raman spectroscopy, as well as X-ray photoelectron spectroscopy (XPS), revealing the presence of dispersed surface VOx species on amorphous TiO2 domains on SBA-15, forming hybrid Si–O–V and Ti–O–V linkages. Temperature-dependent analysis of the ammonia SCR catalytic activity reveals NOx conversion levels of up to ~60%. In situ and operando diffuse reflection IR Fourier transform (DRIFT) spectroscopy shows N–Hstretching modes, representing adsorbed ammonia and -NH2 and -NH intermediate structures on Bronsted and Lewis acid sites. Partial Lewis acid sites with adjacent redox sites are proposed as the active sites and desorption of product molecules as the rate-determining step at low temperature. The high NOx conversion is attributed to the presence of highly dispersed VOx species and the moderate acidity of VOx supported on TiO2/SBA-15.

Integrating Feedback Control and Run-to-Run Control in Multi-Wafer Thermal Atomic Layer Deposition of Thin Films

There is currently a lack of understanding of the deposition profile in a batch atomic layer deposition (ALD) process. Also, no on-line control scheme has been proposed to resolve the prevalent disturbances. Motivated by this, we develop a computational fluid dynamics (CFD) model and an integrated online run-to-run and feedback control scheme. Specifically, we analyze a furnace reactor for a SiO2 thin-film ALD with BTBAS and ozone as precursors. Initially, a high-fidelity 2D axisymmetric multiscale CFD model is developed using ANSYS Fluent for the gas-phase characterization and the surface thin-film deposition, based on a kinetic Monte-Carlo (kMC) model database. To deal with the disturbance during reactor operation, a proportional integral (PI) control scheme is adopted, which manipulates the inlet precursor concentration to drive the precursor partial pressure to the set-point, ensuring the complete substrate coverage. Additionally, the CFD model is utilized to investigate a wide range of operating conditions, and a regression model is developed to describe the relationship between the half-cycle time and the feed flow rate. A run-to-run (R2R) control scheme using an exponentially weighted moving average (EWMA) strategy is developed to regulate the half-cycle time for the furnace ALD process between batches.