Formation of long-range-ordered self-assembled monolayers of dodecyl thiocyanates on Au(111) via ambient-pressure vapor deposition

Formation and Thermal Stability of Ordered Self-Assembled Monolayers by the Adsorption of Amide-Containing Alkanethiols on Au(111)

We examined the surface structure, binding conditions, electrochemical behavior, and thermal stability of self-assembled monolayers (SAMs) on Au(111) formed by N-(2-mercaptoethyl)heptanamide (MEHA) containing an amide group in an inner alkyl chain using scanning tunneling microscopy (STM), X-ray photoelectron spectroscopy (XPS), and cyclic voltammetry (CV) to understand the effects of an internal amide group as a function of deposition time. The STM study clearly showed that the structural transitions of MEHA SAMs on Au(111) occurred from the liquid phase to the formation of a closely packed and well-ordered β-phase via a loosely packed α-phase as an intermediate phase, depending on the deposition time. XPS measurements showed that the relative peak intensities of chemisorbed sulfur against Au 4f for MEHA SAMs formed after deposition for 1 min, 10 min, and 1 h were calculated to be 0.0022, 0.0068, and 0.0070, respectively. Based on the STM and XPS results, it is expected that the formation of a well-ordered β-phase is due to an increased adsorption of chemisorbed sulfur and the structural rearrangement of molecular backbones to maximize lateral interactions resulting from a longer deposition period of 1 h. CV measurements showed a significant difference in the electrochemical behavior of MEHA and decanethiol (DT) SAMs as a result of the presence of an internal amide group in the MEHA SAMs. Herein, we report the first high-resolution STM image of well-ordered MEHA SAMs on Au(111) with a (3 × 2√3) superlattice (β-phase). We also found that amide-containing MEHA SAMs were thermally much more stable than DT SAMs due to the formation of internal hydrogen networks in MEHA SAMs. Our molecular-scale STM results provide new insight into the growth process, surface structure, and thermal stability of amide-containing alkanethiols on Au(111).

Thermally Driven Structural Order of Oligo(Ethylene Glycol)-Terminated Alkanethiol Monolayers on Au(111) Prepared by Vapor Deposition

To probe the effects of deposition temperature on the formation and structural order of self-assembled monolayers (SAMs) on Au(111) prepared by vapor deposition of 2-(2-methoxyethoxy)ethanethiol (CH3O(CH2)2O(CH2)2SH, EG2) for 24 h, we examined the surface structure and electrochemical behavior of the resulting EG2 SAMs using scanning tunneling microscopy (STM) and cyclic voltammetry (CV). STM observations clearly revealed that EG2 SAMs vapor-deposited on Au(111) at 298 K were composed of a disordered phase on the entire Au surface, whereas those formed at 323 K showed improved structural order, showing a mixed phase of ordered and disordered phases. Moreover, at 348 K, uniform and highly ordered EG2 SAMs on Au(111) were formed with a (2 × 3√3) packing structure. CV measurements showed sharp reductive desorption (RD) peaks at −0.818, −0.861, and −0.880 V for EG2 SAM-modified Au electrodes formed at 298, 323, and 348 K, respectively. More negative potential shifts of RD peaks with increasing deposition temperature are attributed to an increase in van der Waals interactions between EG2 molecular backbones resulting from the improved structural quality of EG2 SAMs. Our results obtained herein provide new insights into the formation and thermally driven structural order of oligo(ethylene glycol)-terminated SAMs vapor-deposited on Au(111).

Chemical-Structure Evolution Model for the Self-Assembling of Amine-Terminated Monolayers on Nanoporous Carbon-Doped Organosilicate in Tightly Controlled Environments

Amine-terminated self-assembled monolayers are molecular nanolayers, typically formed via wet-chemical solution on specific substrates for precision surface engineering or interface modification. However, homogeneous assembling of a highly ordered monolayer by the facile, wet method is rather tricky because it involves process parameters, such as solvent type, molecular concentration, soaking time and temperature, and humidity level. Here, we select 3-aminopropyltrimethoxysilane (APTMS) as a model molecule of aminosilane for the silanization of nanoporous carbon-doped organosilicate (p-SiOCH) under tightly controlled process environments. Surface mean roughness (R_a) and the water contact angle (θ) of the p-SiOCH layers upon silanization at a 10% humidity-controlled environment behave similarly and follow a three-stage evolution: a leap to a maximum at 15 min for R_a (from 0.227 to 0.411 nm) and θ (from 25 to 86°), followed by a gradual decrease to 0.225 nm and 69^o, finally leveling off at the above values (>60 min). The -NH₃⁺ fraction indicating monolayer disorientation evolves in a similar fashion. The fully grown monolayer is highly oriented yielding an unprecedented low -NH₃⁺ fraction of 0.08 (and 0.92 of upright -NH₂ groups). However, while having a similar thickness of approximately 1.4 ± 0.1 nm, the molecular layers grown at 30% relative humidity exhibit a significantly elevated -NH₃⁺ fraction of 0.42, indicating that controlling the humidity is vital to the fabrication of highly oriented APTMS molecular layers. A bonding-structure evolution model, as distinct from those offered previously, is proposed and discussed.