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For: Ding Y, Zhang Y, Chung HY, Christofides PD. Machine learning-based modeling and operation of plasma-enhanced atomic layer deposition of hafnium oxide thin films. Comput Chem Eng 2021;144:107148. [DOI: 10.1016/j.compchemeng.2020.107148] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
Number Cited by Other Article(s)
1
Machine learning-based run-to-run control of a spatial thermal atomic layer etching reactor. Comput Chem Eng 2022. [DOI: 10.1016/j.compchemeng.2022.108044] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
2
Valencia-Marquez D, Flores-Tlacuahuac A, García-Cuéllar AJ, Ricardez-Sandoval L. Computer aided molecular design coupled with molecular dynamics as a novel approach to design new lubricants. Comput Chem Eng 2022. [DOI: 10.1016/j.compchemeng.2021.107523] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/26/2022]
3
Yun S, Ding Y, Zhang Y, Christofides PD. Integration of feedback control and run-to-run control for plasma enhanced atomic layer deposition of hafnium oxide thin films. Comput Chem Eng 2021. [DOI: 10.1016/j.compchemeng.2021.107267] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/22/2022]
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