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Huang Z, Ren K, Zheng R, Wang L, Wang L. Ultrahigh Carrier Mobility in Two-Dimensional IV-VI Semiconductors for Photocatalytic Water Splitting. Molecules 2023; 28:molecules28104126. [PMID: 37241866 DOI: 10.3390/molecules28104126] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/28/2023] [Revised: 05/10/2023] [Accepted: 05/14/2023] [Indexed: 05/28/2023] Open
Abstract
Two-dimensional materials have been developed as novel photovoltaic and photocatalytic devices because of their excellent properties. In this work, four δ-IV-VI monolayers, GeS, GeSe, SiS and SiSe, are investigated as semiconductors with desirable bandgaps using the first-principles method. These δ-IV-VI monolayers exhibit exceptional toughness; in particular, the yield strength of the GeSe monolayer has no obvious deterioration at 30% strain. Interestingly, the GeSe monolayer also possesses ultrahigh electron mobility along the x direction of approximately 32,507 cm2·V-1·s-1, which is much higher than that of the other δ-IV-VI monolayers. Moreover, the calculated capacity for hydrogen evolution reaction of these δ-IV-VI monolayers further implies their potential for applications in photovoltaic and nano-devices.
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Affiliation(s)
- Zhaoming Huang
- School of Mechanical Engineering, Nanjing University of Science and Technology, Nanjing 210094, China
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing 211189, China
| | - Kai Ren
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing 211189, China
- School of Mechanical Engineering, Wanjiang University of Technology, Ma'anshan 243031, China
| | - Ruxin Zheng
- School of Mechanical Engineering, Southeast University, Nanjing 211189, China
| | - Liangmo Wang
- School of Mechanical Engineering, Nanjing University of Science and Technology, Nanjing 210094, China
| | - Li Wang
- School of Mechanical Engineering, Wanjiang University of Technology, Ma'anshan 243031, China
- Office of Academic Affairs, Xuancheng Vocational and Technical College, Xuancheng 242000, China
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Ren K, Ma X, Liu X, Xu Y, Huo W, Li W, Zhang G. Prediction of 2D IV-VI semiconductors: auxetic materials with direct bandgap and strong optical absorption. NANOSCALE 2022; 14:8463-8473. [PMID: 35662311 DOI: 10.1039/d2nr00818a] [Citation(s) in RCA: 13] [Impact Index Per Article: 6.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
Auxetic materials are highly desirable for advanced applications because of their negative Poisson's ratios, which are rather scarce in two-dimensional materials. Motivated by the elemental mutation method, we predict a new class of monolayer IV-VI semiconductors, namely, δ-IV-VI monolayers (GeS, GeSe, SiS and SiSe). Distinctly different from the previously predicted IV-VI monolayers, the newly predicted δ-MX (X = Ge and Si; M = S and Se) monolayers exhibit a puckered unit cell with a space group of Pca21. Their stabilities were confirmed by first-principles lattice dynamics and molecular dynamics calculations. In particular, all these MX monolayers possess a large bandgap in the range of 2.08-2.65 eV and pronounced anisotropic mechanical properties, which are demonstrated by direction-dependent in-plane Young's moduli and Poisson's ratios. Furthermore, all these 2D MX monolayers possess negative Poisson's ratios (even up to about -0.3 for SiSe). Strong optical absorption is observed in these δ-IV-VI monolayers. These interesting physical properties will stimulate the development of 2D flexible devices based on IV-VI semiconductor monolayers.
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Affiliation(s)
- Kai Ren
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing, Jiangsu 210042, China
| | - Xikui Ma
- School of Physics, Shandong University, Jinan, Shandong 250100, China.
| | - Xiangjun Liu
- Institute of Micro/Nano Electromechanical System College of Mechanical Engineering, Donghua University, Shanghai, 201620, China
| | - Yujing Xu
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing, Jiangsu 210042, China
| | - Wenyi Huo
- School of Mechanical and Electronic Engineering, Nanjing Forestry University, Nanjing, Jiangsu 210042, China
| | - Weifeng Li
- School of Physics, Shandong University, Jinan, Shandong 250100, China.
| | - Gang Zhang
- Institute of High Performance Computing Agency for Science, Technology and Research (A*STAR), 138632, Singapore.
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Theoretical investigation on structural transformation of TiN to HfN monolayer: A first principles study. Chem Phys Lett 2021. [DOI: 10.1016/j.cplett.2021.138992] [Citation(s) in RCA: 6] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
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Chen J, Tan C, Li G, Chen L, Zhang H, Yin S, Li M, Li L, Li G. 2D Silicon-Based Semiconductor Si 2 Te 3 toward Broadband Photodetection. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2021; 17:e2006496. [PMID: 33656798 DOI: 10.1002/smll.202006496] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/18/2020] [Revised: 12/22/2020] [Indexed: 06/12/2023]
Abstract
Silicon-based semiconductor materials dominate modern technology for more than half a century with extraordinary electrical-optical performance and mutual processing compatibility. Now, 2D materials have rapidly established themselves as prospective candidates for the next-generation semiconductor industry because of their novel properties. Considering chemical and processing compatibility, silicon-based 2D materials possess significant advantages in integrating with silicon. Here, a systematic study is reported on the structural, electrical, and optical performance of silicon telluride (Si2 Te3 ) 2D material, a IV-VI silicon-based semiconductor with a layered structure. The ultrawide photoluminescence (PL) spectra in the range of 550-1050 nm reveals the intrinsic defects in Si2 Te3 . The Si2 Te3 -based field-effect transistors (FETs) and photodetectors show a typical p-type behavior and a remarkable broadband spectral response in the range of 405-1064 nm. Notably, the photoresponsivity and detectivity of the photodetector device with 13.5 nm in thickness and upon 405 nm illumination can reach up to 65 A W-1 and 2.81 × 1012 Jones, respectively, outperforming many traditional broadband photodetectors. It is believed this work will excite interests in further exploring the practical application of 2D silicon-based materials in the field of optoelectronics.
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Affiliation(s)
- Jiawang Chen
- Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Chinese Academy of Sciences, University of Science and Technology of China, Hefei, 230031, P. R. China
| | - Chaoyang Tan
- Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Gang Li
- Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Lijie Chen
- Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Hanlin Zhang
- Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Shiqi Yin
- Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
| | - Ming Li
- Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Chinese Academy of Sciences, University of Science and Technology of China, Hefei, 230031, P. R. China
| | - Liang Li
- Institutes of Physical Science and Information Technology, Anhui University, Hefei, 230601, P. R. China
- Photoelectric Conversion Energy Materials and Devices Key Laboratory of Anhui Province, Anhui University, Hefei, 230601, P. R. China
| | - Guanghai Li
- Key Laboratory of Materials Physics, Anhui Key Laboratory of Nanomaterials and Nanotechnology, Institute of Solid State Physics, Chinese Academy of Sciences, University of Science and Technology of China, Hefei, 230031, P. R. China
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Hooshmand-Ziafi H, Hassani K, Motallebi-Araghi M, Dashtdar M. Digital speckle shearography setup to measure the field-induced strain map in piezoelectric materials. THE REVIEW OF SCIENTIFIC INSTRUMENTS 2020; 91:113901. [PMID: 33261419 DOI: 10.1063/5.0021807] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/14/2020] [Accepted: 10/20/2020] [Indexed: 06/12/2023]
Abstract
Residual or induced strains are important factors in the performance of electronic devices, actuators, and sensors. In this paper, we report the application of digital speckle shearography to obtain the two-dimensional field-induced out-of-plane strain maps in a piezoelectric slab under a varying electric field. Both the free-standing and loaded (pinned) states are investigated. The results show field-dependent strain maps with parabolic profiles on the order of 10-4 and 10-3 in the free-standing and pinned states, respectively, in agreement with typical values for piezoelectric ceramics. This study provides a simple, non-destructive, and full-field method to characterize these materials.
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Affiliation(s)
- Helia Hooshmand-Ziafi
- Department of Physics, Shahid Beheshti University, G. C., Evin, Tehran 19839-69411, Iran
| | - Khosrow Hassani
- Department of Physics, University of Tehran, North Kargar Ave., Tehran 1439955961, Iran
| | | | - Masoomeh Dashtdar
- Department of Physics, Shahid Beheshti University, G. C., Evin, Tehran 19839-69411, Iran
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Zhou Q, Liu L, Liu Q, Wang Z, Gao C, Liu Y, Ye H. Highly Selective Adsorption on SiSe Monolayer and Effect of Strain Engineering: A DFT Study. SENSORS (BASEL, SWITZERLAND) 2020; 20:E977. [PMID: 32059398 PMCID: PMC7070421 DOI: 10.3390/s20040977] [Citation(s) in RCA: 5] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 12/16/2019] [Revised: 02/04/2020] [Accepted: 02/05/2020] [Indexed: 11/18/2022]
Abstract
The adsorption types of ten kinds of gas molecules (O2, NH3, SO2, CH4, NO, H2S, H2, CO, CO2, and NO2) on the surface of SiSe monolayer are analyzed by the density-functional theory (DFT) calculation based on adsorption energy, charge density difference (CDD), electron localization function (ELF), and band structure. It shows high selective adsorption on SiSe monolayer that some gas molecules like SO2, NO, and NO2 are chemically adsorbed, while the NH3 molecule is physically adsorbed, the rest of the molecules are weakly adsorbed. Moreover, stress is applied to the SiSe monolayer to improve the adsorption strength of NH3. It has a tendency of increment with the increase of compressive stress. The strongest physical adsorption energy (-0.426 eV) is obtained when 2% compressive stress is added to the substrate in zigzag direction. The simple desorption is realized by decreasing the stress. Furthermore, based on the similar adsorption energy between SO2 and NH3 molecules, the co-adsorption of these two gases are studied. The results show that SO2 will promote the detection of NH3 in the case of SO2-NH3/SiSe configuration. Therefore, SiSe monolayer is a good candidate for NH3 sensing with strain engineering.
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Affiliation(s)
- Quan Zhou
- Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China; (Q.Z.); (L.L.); (Q.L.); (Z.W.); (C.G.); (Y.L.)
| | - Lian Liu
- Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China; (Q.Z.); (L.L.); (Q.L.); (Z.W.); (C.G.); (Y.L.)
| | - Qipeng Liu
- Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China; (Q.Z.); (L.L.); (Q.L.); (Z.W.); (C.G.); (Y.L.)
| | - Zeping Wang
- Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China; (Q.Z.); (L.L.); (Q.L.); (Z.W.); (C.G.); (Y.L.)
| | - Chenshan Gao
- Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China; (Q.Z.); (L.L.); (Q.L.); (Z.W.); (C.G.); (Y.L.)
| | - Yufei Liu
- Key Laboratory of Optoelectronic Technology & Systems, Education Ministry of China, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China; (Q.Z.); (L.L.); (Q.L.); (Z.W.); (C.G.); (Y.L.)
- Centre for Intelligent Sensing Technology, College of Optoelectronic Engineering, Chongqing University, Chongqing 400044, China
| | - Huaiyu Ye
- School of Microelectronics, Southern University of Science and Technology, Shenzhen 518055, China
- Shenzhen Institute of Wide-Bandgap Semiconductors, No.1088, Xueyuan Rd., Xili, Nanshan District, Shenzhen 518055, Guangdong, China
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