Estrada TG, Walker AV. Cuprous or cupric? How substrate polarity can select for different phases of copper sulfide films in chemical bath deposition.
J Chem Phys 2021;
154:144704. [PMID:
33858158 DOI:
10.1063/5.0046062]
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Abstract
Copper sulfides have many applications from thermoelectrics to biotechnology. While the properties of different copper sulfide phases are well understood, controlling the deposited copper sulfide stoichiometry remains a significant challenge, especially in solution-phase synthesis techniques. In this work, we investigate the chemical bath deposition of CuxS on functionalized self-assembled monolayers (SAMs). Time-of-flight mass spectrometry, Raman spectroscopy, and x-ray photoelectron spectroscopy are employed to analyze the deposited films. We show that the use of thiourea as a sulfur source leads to the deposition of different copper sulfide phases and is controlled by the interaction of sulfur-containing ions in solution with the functionalized SAMs. For -COOH terminated SAMs, copper sulfide deposition is controlled by the surface polarity of the substrate. At the bath pH used in these experiments, the -COOH terminal groups are deprotonated. The resulting -COO- terminated SAM surface repels negatively charged sulfur-containing ions, leading to the deposition of Cu2S. For -CH3 terminated SAMs, which are non-polar, there is no specific interaction between the SAM terminal group and sulfur-containing ions and CuS is deposited. For -OH terminated SAMs, which have a polar terminal group, there are two competing effects: the repulsion of S-containing ions by the small negative charge of the terminal -OH group and the increase in the concentration of sulfur-containing ions in solution as the bath pH increases. This competition leads to the deposit stoichiometry changing from Cu2S at pH 9 to CuS at pH 12.
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