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For: Guo L, Searson PC. Evolution of surface width in electrochemical nucleation and growth. Electrochem commun 2010. [DOI: 10.1016/j.elecom.2010.01.011] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/27/2022]  Open
Number Cited by Other Article(s)
1
Liu L, Schwarzacher W. Slope analysis and scaling analysis of electrodeposited thin films. Electrochem commun 2013. [DOI: 10.1016/j.elecom.2013.01.017] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]  Open
2
Venkatasubramanian R, Jin K, Pesika NS. Use of electrochemical deposition to create randomly rough surfaces and roughness gradients. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2011;27:3261-3265. [PMID: 21395267 DOI: 10.1021/la200245m] [Citation(s) in RCA: 6] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/30/2023]
3
Guo L, Thompson A, Searson PC. The kinetics of copper island growth on ruthenium oxide in perchlorate solution. Electrochim Acta 2010. [DOI: 10.1016/j.electacta.2010.07.034] [Citation(s) in RCA: 10] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/26/2022]
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