Pitting corrosion of Al and Al–Cu alloys by ClO4− ions in neutral sulphate solutions

Microstructural and Electrochemical Study: Pitting Corrosion Mechanism on A390 Al-Si Alloy and Ce-Mo Treatment as a Better Corrosion Protection

Sulfuric acid anodizing assisted by a hydrothermal sealing with inhibitors [Ce3+-Mo6+] was used to prevent pitting corrosion on spray-deposited hypereutectic Al-Si alloy (A390). An investigation concerning the evaluation of pitting corrosion resistance on the anodic oxide thin film with ions incorporated was carried out in NaCl solution using electrochemical measurements (i.e., potentiodynamic polarization and electrochemical impedance spectroscopy, EIS). The influence of Si phase morphology and size on the growth mechanism of an anodic oxide film was characterized by scanning electron microscopy (SEM) and X-ray diffraction (XRD). The results were then compared with those for its equivalent IM390 alloy (Al-17Si-4.5Cu-0.6Mg) produced through a conventional process ingot metallurgy, IM. The electrochemical findings indicate that sulfuric acid anodizing followed by a simple hot water sealing treatment was ineffective. In this manner, an intense attack was localized by pitting corrosion that occurred on the anodic oxide film in less than three days, as denoted by characteristic changes in the EIS spectra at the lowest frequencies. Improved results were achieved for Ce-Mo surface modification, which can provide better corrosion resistance on the aluminum alloys because no signs of pits were observed during the corrosion testing.

A Concentrated AlCl3-Diglyme Electrolyte for Hard and Corrosion-Resistant Aluminum Electrodeposits

A concentrated aluminum chloride (AlCl₃)-diglyme (G2) electrolyte is used to prepare hard and corrosion-resistant aluminum (Al) electrodeposited films. The Al electrodeposits obtained from the electrolyte with an AlCl₃/G2 molar ratio x = 0.4 showed a void-free microstructure composed of spherical particles, in stark contrast to flake-like morphologies with micro-voids for lower x. Neutral complexes rarely exist in the x = 0.4 electrolyte, resulting in a relatively high conductivity despite the high concentration and high viscosity. Nanoindentation measurements for the Al deposits with >99% purity revealed that the nanohardness was 2.86 GPa, three times higher than that for Al materials produced through electrodeposition from a well-known ionic liquid bath or through severe plastic deformation. Additionally, the void-free Al deposits had a <100> preferential crystal orientation, which accounted for better resistance to free corrosion and pitting corrosion. Discussions about the compact microstructure and <100> crystal orientation of deposits obtained only from the x = 0.4 concentrated electrolyte are also presented.

Corrosion Behavior of Commercial Aluminum Alloy Processed by Equal Channel Angular Pressing

A commercial aluminum alloy was subjected to severe plastic deformation through equal channel angular pressing (ECAP). The alloy contains a low volume fraction ofα-AlFeSi located essentially at the grain boundaries. The corrosion behavior of the ECAP’ed alloy was investigated in NaCl solution using potentiodynamic polarization and immersion tests. The effects of scan rate and NaCl concentration on the alloy susceptibility to corrosion were also studied. The results obtained were compared with those of the nonpressed alloy. ECAP leads to an intensive grain refinement accompanied by an increased dislocation density. All electrochemical tests confirm that corrosion resistance of the alloy remarkably diminished with increasing the ECAP number of passes. This is presumably due to the breakdown of theα-AlFeSi after ECAP leading to higher number of galvanic cells and enhanced dissolution of the aluminum matrix.

Uniform and Pitting Corrosion Processes of Al, Al-6061, Al-Zn and Al-Cu Alloys Exposed to SCN- Solutions and the Effect of Some Inorganic Anions

The effect of the alloying elements and some inorganic inhibitors (WO4 2-, MoO4 2-, SiO3 2- and CrO4 2- anions) on the uniform and pitting corrosion characteristics of Al-6061, Al-4.5% Cu, Al-7.5% Cu, Al-6% Zn and Al-12% Zn alloys were studied in 0.04M KSCN solution. Susceptibility of the tested alloys towards pitting corrosion was investigated using transient (potentiostatic and galvanostatic) measurements. An independent method of chemical analysis, namely ICP-AES (inductively coupled plasma atomic emission spectroscopy) was also used to study the effect of the alloying elements and the tested inorganic anions on the uniform corrosion of these materials. Results obtained were compared with pure Al. ICP measurements revealed that the alloyed Cu and alloyed Zn enhance uniform corrosion of the Al samples, while WO4 2-, MoO4 2-, SiO3 2- and CrO4 2- anions suppressed it. Transient measurements showed that nucleation of pit takes place after an incubation time (t i). The rate of pit initiation and growth (t i -1 ) increased with increase in SCN- concentration, applied anodic current, applied anodic potential and solution temperature. This rate of pit initiation and growth decreased in presence of inorganic inhibitors to an extent depending on the concentration and type of the introduced inhibitor. Alloyed Zn was found to accelerate pitting attack, while alloyed Cu suppressed it. Among the tested Al alloys, Al-6061 presented the highest resistance towards uniform and pitting corrosion processes. SiO3 2- and CrO4 2- were the most efficient anions in inhibiting uniform and pitting corrosion processes of Al in these solutions.