Fully photodegradable block copolymer nanoparticles for dual release of cargo and radicals

RAFT-mediated polymerization-induced self-assembly (RAFT-PISA): current status and future directions

Polymerization-induced self-assembly (PISA) combines polymerization and self-assembly in a single step with distinct efficiency that has set it apart from the conventional solution self-assembly processes. PISA holds great promise for large-scale production, not only because of its efficient process for producing nano/micro-particles with high solid content, but also thanks to the facile control over the particle size and morphology. Since its invention, many research groups around the world have developed new and creative approaches to broaden the scope of PISA initiations, morphologies and applications, etc. The growing interest in PISA is certainly reflected in the increasing number of publications over the past few years, and in this review, we aim to summarize these recent advances in the emerging aspects of RAFT-mediated PISA. These include (1) non-thermal initiation processes, such as photo-, enzyme-, redox- and ultrasound-initiation; the achievements of (2) high-order structures, (3) hybrid materials and (4) stimuli-responsive nano-objects by design and adopting new monomers and new processes; (5) the efforts in the realization of upscale production by utilization of high throughput technologies, and finally the (6) applications of current PISA nano-objects in different fields and (7) its future directions.