Formation of nanostructured metallic glass thin films upon sputtering

Nanomechanical and Microstructural Characterization of Biocompatible TiAu Thin Films Grown on Glass and Ti6Al4V Substrates

Ti-Au intermetallic-based material systems are being extensively studied as next-generation thin film coatings to extend the lifetime of implant devices. These coatings are being developed for application to the articulating surfaces of total joint implants and, therefore, must have excellent biocompatibility combined with superior mechanical hardness and wear resistance. However, these key characteristics of Ti-Au coatings are heavily dependent upon factors such as the surface properties and temperature of the underlying substrate during thin film deposition. In this work, Ti3Au thin films were deposited by magnetron sputtering on both glass and Ti6Al4V substrates at an ambient and elevated substrate temperature of 275 °C. These films were studied for their mechanical properties by the nanoindentation technique in both variable load and fixed load mode using a Berkovich tip. XRD patterns and cross-sectional SEM images detail the microstructure, while AFM images present the surface morphologies of these Ti3Au thin films. The biocompatibility potential of the films is assessed by cytotoxicity tests in L929 mouse fibroblast cells using Alamar blue assay, while leached ion concentrations in the film extracts are quantified using ICPOEMS. The standard deviation for hardness of films deposited on glass substrates is ∼4 times lower than that on Ti6Al4V substrates and is correlated with a corresponding increase in surface roughness from 2 nm for glass to 40 nm for Ti6Al4V substrates. Elevating substrate temperature leads to an increase in film hardness from 5.1 to 8.9 GPa and is related to the development of a superhard β phase of the Ti3Au intermetallic. The standard deviation of this peak mechanical hardness value is reduced by ∼3 times when measured in fixed load mode compared to the variable load mode due to the effect of nanoindentation tip penetration depth. All tested Ti-Au thin films also exhibit excellent biocompatibility against L929 fibroblast cells, as viability levels are above 95% and leached Ti, Al, V, and Au ion concentrations are below 0.1 ppm. Overall, this work demonstrates a novel Ti3Au thin film system with a unique combination of high hardness and excellent biocompatibility with potential to be developed into a new wear-resistant coating to extend the lifetime of articulating total joint implants.

Au-Based Thin-Film Metallic Glasses for Propagating Surface Plasmon Resonance-Based Sensor Applications

We deposited Au-Cu-Si, an Au-based thin-film metallic glass (TFMG) of ∼50 nm thickness, as the activation layer for propagating surface plasmon resonance (PSPR)-based sensors on a BK7 glass substrate to substitute the commonly used gold layer. The film composition was tuned to yield the maximum Au content (∼65 at %), while the structure remained amorphous. The results showed that the Au-based TFMG could support surface plasmon resonance and gave rise to the extinction in the angle-resolved reflection spectrum. Using deionized water and ethyl alcohol with the refractive index difference of ∼0.03 as the analytes, the angle shift given by Au-based TFMG was 4° compared to 5° given by the Au film. Hence, Au-based TFMG is feasible to be used as the activation layer in PSPR-based sensors. Compared to the Au film, Au-based TFMG has the advantages of being less expensive, lacking grain boundary scattering, better adhesion to the substrate, and higher resistance to scratch and corrosion because of its amorphous structure with excellent mechanical properties.

Magnetron sputtered magnesium-based thin film metallic glasses for bioimplants

Mg-based thin film metallic glasses (TFMGs) can viably decrease stress shielding caused by mismatch of the modulus of elasticity between the implant material and human bone. Here, Mg-based TFMGs were fabricated onto implantable substrates by ion assisted pulsed DC magnetron sputtering. The microstructure assessment and the impact of the principle constituents of the coatings were determined utilizing an x-ray diffractometer, a transmission electron microscope, and x-ray photoelectron spectroscopy. The hardness of these thin films was estimated to be 5.1 GPa. In vitro degradation tests including electrochemical studies and immersion tests in simulated body fluid revealed that the presence of zinc could raise the corrosion resistance of Mg-based TFMG. Indirect in vitro cytotoxicity using L929 fibroblast cells revealed that the TFMGs did not induce any toxicity in cells. Biomineralization experiments using Saos-2 cells promoted the formation of calcium phosphate on its surface.

Electrical and Optical Properties of Co75Si15B10 Metallic Glass Nanometric Thin Films

Co-based (Co₇₅Si₁₅B₁₀) thin-film metallic glass (TFMG) with nanometric thicknesses (100~300 nm) was investigated for its structural, electrical, and optical properties. The TFMG structure was examined using scanning electron microscopy and X-ray diffraction, while electrical properties were examined using inductance/capacitance/resistance spectroscopy, cyclic voltammetry, and Hall effect measurements. In addition, optical absorption/reflection/transmittance measurements were performed to examine optical properties. Results revealed that Co-based TFMGs, which have an amorphous structure without surface defects, behave like a dielectric material, with higher resistivity and much lower carrier concentration than pure cobalt (Co) thin films of the same thickness, despite its mobility being modestly larger than its Co counterparts. Meanwhile, the optical investigation of TFMG enabled us to determine the complex relative permittivity (complex relative dielectric constant) ϵr˜ at a visible wavelength (632.8 nm). Moreover, unlike normal metals, TFMGs exhibited a large positive value of the real part of ϵr˜, while exhibiting properties of substantial absorption of light (absorption coefficient α). It was also found that the Co-based TFMG gained optical transparency for thicknesses less than 5 nm. TFMGs demonstrated the nearly thickness-independent properties of the electrical and optical parameters probed, a feature of high-index, dielectric-like material with negligible size effects, which may have applications in micrometer-scaled optoelectronic and magneto-optical devices.

Novel electrical transport properties of native Fe-Nb oxide layers leading to unilateral conductivity of a refractory metallic glass

Fe-based metallic glasses (also called amorphous alloys) are known to have high hardness and high wear resistance. Here we study and present a Fe-Nb amorphous material with an unusual type of electrical conductivity behavior. The electrical transport properties of Fe-Nb oxide layers were studied by measuring local current-voltage characteristics by the atomic-force microscopy technique. At certain voltage levels the samples containing native oxides showed clearly asymmetrical conductivity relative to polarity of the applied potential. Fe-Nb metallic glassy surface oxide film growth process was monitored at ambient conditions. The growth rate keeps constant during the initial 2.5 hours. After that the growth rate drastically decreases and becomes almost zero while the final oxide thickness is 1.0-1.5 nm. The Fe-Nb film sample annealed for 15 minutes at 300 °C demonstrates several times larger oxide thickness and becomes an insulator. X-ray photoelectron spectroscopy was used to characterize the oxidation states in the surface amorphous oxides. This material can be readily applied as inexpensive nanoscale tunnel diode operating at the commonly utilized voltage of ±5 V.