Tris(trimethylsilyl)silyl versus tris(trimethylsilyl)germyl: Radical reactivity and oxidation ability

Metal-free reductive desulfurization of C-sp3-substituted thiols using phosphite catalysis

Phosphines and phosphites are critical tools for non-metal desulfurative methodologies due to the strength of the P[double bond, length as m-dash]S bond. An overarching premise in these methods has been that stoichiometric (or excess) P(iii) reagent is required for reactivity. Despite decades of research, a desulfurative process that is catalytic in phosphine/phosphite has not been reported. Here, we report the successful merging of two thermal radical processes: the desulfurization of unactivated and activated alkyl thiols and the reduction of P(v) = S to P(iii) by reaction with a silyl radical species. We employ catalytic trimethyl phosphite, catalytic azo-bis(cyclohexyl)nitrile, and two equivalents of tris(trimethylsilyl)silane as the stoichiometric reductant and sulfur atom scavenger. This method is tolerant of common organic functional groups and affords products in good to excellent yields.

Photocatalytic Generations of Secondary and Tertiary Silyl Radicals from Silylboranes Using an Alkoxide Cocatalyst

Silyl radicals are valuable species to prepare diverse organosilicon compounds. However, unlike stable tertiary silyl radicals, the use of secondary silyl radicals has been problematic in silylation reactions due to their instability. Here, we present photocatalytic in situ generations of both secondary and tertiary silyl radicals by one-electron oxidation of ate complexes, formed from silylboranes and an alkoxide cocatalyst, achieving highly efficient hydrosilylation and deuterosilylation of electron-rich alkenes and dienes as well as electron-deficient alkenes. The theoretical studies show that anionic borate complexes activated with an alkoxide have lower oxidation potentials than neutral borate complexes, allowing the formation of secondary silyl radicals. The calculated reaction pathways reveal that anionic conditions using the conjugate acid-base pair of NaOEt (cocatalyst) and EtOH (solvent) are the key to expanding the scope of silyl radicals and alkenes.

Moving Towards a Finer Way of Light-Cured Resin-Based Restorative Dental Materials: Recent Advances in Photoinitiating Systems Based on Iodonium Salts

The photoinduced polymerization of monomers is currently an essential tool in various industries. The photopolymerization process plays an increasingly important role in biomedical applications. It is especially used in the production of dental composites. It also exhibits unique properties, such as a short time of polymerization of composites (up to a few seconds), low energy consumption, and spatial resolution (polymerization only in irradiated areas). This paper describes a short overview of the history and classification of different typical monomers and photoinitiating systems such as bimolecular photoinitiator system containing camphorquinone and aromatic amine, 1-phenyl-1,2-propanedione, phosphine derivatives, germanium derivatives, hexaarylbiimidazole derivatives, silane-based derivatives and thioxanthone derivatives used in the production of dental composites with their limitations and disadvantages. Moreover, this article represents the challenges faced when using the latest inventions in the field of dental materials, with a particular focus on photoinitiating systems based on iodonium salts. The beneficial properties of dental composites cured using initiation systems based on iodonium salts have been demonstrated.

Tris(trimethylsilyl)silane as a co-initiator for dental adhesive: Photo-polymerization kinetics and dynamic mechanical property

OBJECTIVES

The purpose of this study was to evaluate the polymerization behavior of a model dentin adhesive with tris(trimethylsilyl)silane (TTMSS) as a co-initiator, and to investigate the polymerization kinetics and mechanical properties of copolymers in dry and wet conditions.

METHODS

A co-monomer mixture based on HEMA/BisGMA (45/55, w/w) was used as a model dentin adhesive. The photoinitiator system included camphorquinone (CQ) as the photosensitizer and the co-initiator was ethyl-4-(dimethylamino) benzoate (EDMAB) or TTMSS. Iodonium salt, diphenyliodonium hexafluorophosphate (DPIHP) serving as a catalyst, was selectively added into the adhesive formulations. The control and the experimental formulations were characterized with regard to the degree of conversion (DC) and dynamic mechanical properties under dry and wet conditions.

RESULTS

In two-component photoinitiator system (CQ/TTMSS), with an increase of TTMSS concentration, the polymerization rate and DC of CC double bond increased, and showed a dependence on the irradiation time and curing light intensity. The copolymers that contained the three-component photoinitiator system (CQ/TTMSS/DPIHP) showed similar dynamic mechanical properties, under both dry and wet conditions, to the EDMAB-containing system.

SIGNIFICANCE

The DC of formulations using TTMSS as co-initiator showed a strong dependence on irradiation time. With the addition of TTMSS, the maximum polymerization rate can be adjusted and the network structure became more homogenous. The results indicated that the TTMSS could be used as a substitute for amine-type co-initiator in visible-light induced free radical polymerization of methacrylate-based dentin adhesives.

Shining a light on an adaptable photoinitiator: advances in photopolymerizations initiated by thioxanthones

This review focuses on the advancements and progress in photoinitiated polymerization techniques mediated by thioxanthone (TX) and its derivatives.

Tris(trimethylsilyl)silane and visible-light irradiation: a new metal- and additive-free photochemical process for the synthesis of indoles and oxindoles

A combined tris(trimethylsilyl)silane and visible-light-promoted intramolecular reductive cyclization protocol for the synthesis of indoles and oxindoles has been developed.

Hexadecadienyl monolayers on hydrogen-terminated Si(111): faster monolayer formation and improved surface coverage using the enyne moiety

To further improve the coverage of organic monolayers on hydrogen-terminated silicon (H-Si) surfaces with respect to the hitherto best agents (1-alkynes), it was hypothesized that enynes (H-C≡C-HC═CH-R) would be even better reagents for dense monolayer formation. To investigate whether the increased delocalization of β-carbon radicals by the enyne functionality indeed lowers the activation barrier, the kinetics of monolayer formation by hexadec-3-en-1-yne and 1-hexadecyne on H-Si(111) were followed by studying partially incomplete monolayers. Ellipsometry and static contact angle measurements indeed showed a faster increase of layer thickness and hydrophobicity for the hexadec-3-en-1-yne-derived monolayers. This more rapid monolayer formation was supported by IRRAS and XPS measurements that for the enyne show a faster increase of the CH2 stretching bands and the amount of carbon at the surface (C/Si ratio), respectively. Monolayer formation at room temperature yielded plateau values for hexadec-3-en-1-yne and 1-hexadecyne after 8 and 16 h, respectively. Additional experiments were performed for 16 h at 80° to ensure full completion of the layers, which allows comparison of the quality of both layers. Ellipsometry thicknesses (2.0 nm) and contact angles (111-112°) indicated a high quality of both layers. XPS, in combination with DFT calculations, revealed terminal attachment of hexadec-3-en-1-yne to the H-Si surface, leading to dienyl monolayers. Moreover, analysis of the Si2p region showed no surface oxidation. Quantitative XPS measurements, obtained via rotating Si samples, showed a higher surface coverage for C16 dienyl layers than for C16 alkenyl layers (63% vs 59%). The dense packing of the layers was confirmed by IRRAS and NEXAFS results. Molecular mechanics simulations were undertaken to understand the differences in reactivity and surface coverage. Alkenyl layers show more favorable packing energies for surface coverages up to 50-55%. At higher coverages, this packing energy rises quickly, and there the dienyl packing becomes more favorable. When the binding energies are included the difference becomes more pronounced, and dense packing of dienyl layers becomes more favorable by 2-3 kcal/mol. These combined data show that enynes provide the highest-quality organic monolayers reported on H-Si up to now.

Recent applications of the (TMS)3SiH radical-based reagent

This review article focuses on the recent applications of tris(trimethylsilyl)silane as a radical-based reagent in organic chemistry. Numerous examples of the successful use of (TMS)(3)SiH in radical reductions, hydrosilylation and consecutive radical reactions are given. The use of (TMS)(3)SiH allows reactions to be carried out under mild conditions with excellent yields of products and remarkable chemo-, regio-, and stereoselectivity. The strategic role of (TMS)(3)SiH in polymerization is underlined with emphasis on the photo-induced radical polymerization of olefins and photo-promoted cationic polymerization of epoxides.

Kinetic and mechanistic studies of the reactions of diarylgermylenes and tetraaryldigermenes with carbon tetrachloride

The mechanisms of the reactions of diphenylgermylene (GePh2) with CCl4 in hydrocarbon solvents and in THF solution have been studied, employing 3,4-dimethyl-1,1-diphenylgermacyclopent-3-ene (6a) and 1,1-diphenylgermacyclobutane (17) as photochemical precursors to GePh2. In hydrocarbon solvents, the reaction produces Ph2GeCl2 (10) and Ph2Ge(Cl)CCl3 (12) in a ratio of 10:12 ≈ 7, along with a variety of other radical-derived products and small amounts of Ph2GeH(D)Cl (11), which is formed partly by reaction of GePh2 with adventitious HCl. The reaction is much cleaner in THF, where 12 is formed as the major product (10:12 ≈ 0.8); a similar product distribution is obtained in hexanes containing 0.05 mol/L THF, while 12 is the exclusive product in hexanes containing 3 mmol/L NEt3. Rate constants for the reactions of CCl4 with GePh2 and five ring-substituted derivatives were determined by laser flash photolysis, as well as Arrhenius parameters for reaction of the parent (GePh2), in the two solvents. The reactions of GePh2 with CCl4 and CHCl3 have also been studied in 3-methylpentane solution at 78–90 K. Different reaction mechanisms are clearly operative in hydrocarbon and complexing solvents, but both involve modest charge donation from germanium to the substrate in the transition state for the rate-determining step. For the reaction in hydrocarbon solvents, the data are consistent with inner-sphere electron transfer following or in concert with weak Lewis acid–base complexation. A similar mechanism is proposed for the reaction in THF solution, in competition with a second involving nucleophilic attack of the germylene–THF complex at a chlorine atom of the substrate. Rate constants were also determined for reaction of CCl4 with the corresponding tetraaryldigermenes at low halocarbon concentrations in hexanes, along with Arrhenius parameters for the parent (Ge2Ph4). These reactions also proceed via initial Cl-atom abstraction, based on the identity of the products formed in the reaction of CCl4 with tetramesityldigermene.

Recent advances in sunlight induced polymerization: role of new photoinitiating systems based on the silyl radical chemistry

Silyl radical chemistry opens new opportunities for photoinitiating systems for sunlight polymerization.