Photochemical transformations of 5-methyltetrazole. Matrix isolation FTIR and DFT studies

UV photolysis of thiourea and its N-methylated derivative in cryogenic matrices

Exploration of the photolytic dynamics of sulfurous compounds is essential, eventually contributing not only to our comprehension of their fundamental organic chemistry but also shedding light on astrophysical implications. This study aims to investigate two astrochemically relevant sulfur-containing molecules, namely, thiourea (TU) and its N-methylated counterpart, N-methyl thiourea (NMTU), in cryogenic matrices. These molecules were deposited both in solid Ar and in a quantum host, specifically in solid para-H2 matrices, with the latter exhibiting unique properties. The deposited matrices were exposed to a series of UV laser irradiation at various wavelengths to investigate the decomposition paths of TU and NMTU. As a result of the UV photolysis, a plethora of degradation products could be observed in every case. Based on the presence of these product molecules, some considerations can be made regarding the decomposition mechanism of the parent molecules. The use of different matrices allowed for assessing their influence on the decay mechanism, while applying tunable laser light provided insights into the wavelength dependency of the processes.

Photodegradation of bis(1H-tetrazol-5-yl)amine (H2BTA), a high nitrogen content tetrazole-based energetic compound in water

Tetrazoles have wide industrial applications, notably in the pharmaceutical industry. Tetrazole derivatives such as bis(1H-tetrazol-5-yl)amine (H₂BTA) have recently been considered by the defense industry as high nitrogen composite propellants. Photodegradation studies under solar simulating conditions showed that H₂BTA was partially degraded in water, while it was completely degraded under UV light at 254 nm. When H₂BTA (0.35 mM) was irradiated with simulated sunlight at pH 3.65, there was a 1-day lag phase before the chemical started to degrade, reaching 43.5% degradation after 7 d. However, when pH increased to 5.76, it degraded without lag phase, suggesting that an HBTA^- anion was involved in the initial degradation of the chemical. 5-Aminotetrazole (5-AT) was identified as a final degradation product and N-(1H-tetrazol-5-yl)formamide(T(5 yl)FA) and 1H-tetrazol-5-ylcarbamic acid (T(5 yl)CA) as intermediate products. At λ = 254 nm, H₂BTA disappeared rapidly, resulting in the loss of 94% after 65 min. 5-AT was detected together with several transient products including N-(1H-tetrazol-5-yl)carbamohydrazonic acid (T(5 yl)CHA) and T(5 yl)FA. Kinetic studies and products analysis revealed that H₂BTA photodegraded via two initial routes. One route (a) marked by the initial loss of HN₃ and another (b) marked by the initial loss of N_2. Route a) was characteristics for irradiation with simulated sunlight; however, routes a) and b) proceeded simultaneously under UV light. 5-AT eventually degraded to presumably give N₂ and/or HN₃ under UV light. Understanding the photodegradation pathway of H₂BTA under simulated sunlight can help in providing the basis for natural attenuation assessment of the chemical in contaminated aquatic environments.

Direct Wavelength-Selective Optical and Electron-Beam Lithography of Functional Inorganic Nanomaterials

Direct optical lithography of functional inorganic nanomaterials (DOLFIN) is a photoresist-free method for high-resolution patterning of inorganic nanocrystals (NCs) that has been demonstrated using deep UV (DUV, 254 nm) photons. Here, we expand the versatility of DOLFIN by designing a series of photochemically active NC surface ligands for direct patterning using various photon energies including DUV, near-UV (i-line, 365 nm), blue (h-line, 405 nm), and visible (450 nm) light. We show that the exposure dose for DOLFIN can be ∼30 mJ/cm², which is small compared to most commercial photopolymer resists. Patterned nanomaterials can serve as highly robust optical diffraction gratings. We also introduce a general approach for resist-free direct electron-beam lithography of functional inorganic nanomaterials (DELFIN) which enables all-inorganic NC patterns with feature size down to 30 nm, while preserving the optical and electronic properties of patterned NCs. The designed ligand chemistries and patterning techniques offer a versatile platform for nano- and micron-scale additive manufacturing, complementing the existing toolbox for device fabrication.

Conformational behaviour, photochemistry and flash vacuum pyrolysis of a 2-(1H-tetrazol-1-yl)thiophene

The conformational and photochemical behaviour of a 2-(1H-tetrazol-1-yl)thiophene was studied using low-temperature matrix isolation infrared spectroscopy and theoretical calculations. FVP of 2-(1H-tetrazol-1-yl)thiophene afforded new thieno-fused heterocycles.

A combined experimental and theoretical study of the tautomeric and conformational properties of (5-phenyl-tetrazol-2-yl)-acetic acid methyl ester

The tautomeric and conformational properties of a new tetrazole derivative are studied in a combined approach that includes the analysis of the experimental vibrational data together with theoretical calculation methods, especially in terms of natural bond orbital (NBO) population analysis. Moreover, the molecular and crystal structure was determined by single crystal X-ray diffraction. The compound crystallized as the 2-tautomeric form, monoclinic space group P21/c with Z=4, a=10.0630(14), b=8.2879(11), c=12.8375(18) Å, β=105.546(3)°, V=1031.5(2) Å(3). The tetrazole and phenyl rings are coplanar with the acetate group oriented perpendicular to the plane. The NBO analysis showed that delocalizing interactions of the lpp(N2) lone pair orbital contributes to a strong resonance interactions with both adjacent π(∗)(N3N4) and π(∗)(N1C5) antibonding orbitals of the tetrazole group.