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For: Ma F, Han Y, Dong S, Miao M, Zheng J, Wu J, Han C, Zhu K. Investigation of ESD protection strategy in high voltage Bipolar–CMOS–DMOS process. Microelectronics Reliability 2012;52:1640-4. [DOI: 10.1016/j.microrel.2011.11.011] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/08/2023]

For:	Ma F, Han Y, Dong S, Miao M, Zheng J, Wu J, Han C, Zhu K. Investigation of ESD protection strategy in high voltage Bipolar–CMOS–DMOS process. Microelectronics Reliability 2012;52:1640-4. [DOI: 10.1016/j.microrel.2011.11.011] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 02/08/2023]

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(The first 100,000 artilces are displayed in RCA.)