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For: Ma T, Zhang S, Xu Y, Tan B, Li W, Ji J, Guo L. Unraveling the surface behavior of amino acids on Cu wiring in chemical mechanical polishing of barrier layers: A combination of experiments and ReaxFF MD. J Mol Liq 2021. [DOI: 10.1016/j.molliq.2021.117307] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/18/2022]
Number Cited by Other Article(s)
1
Liu D, Zhang Z, Feng J, Yu Z, Meng F, Shi C, Xu G, Shi S, Liu W. Environment-friendly chemical mechanical polishing for copper with atomic surface confirmed by transmission electron microscopy. Colloids Surf A Physicochem Eng Asp 2023. [DOI: 10.1016/j.colsurfa.2022.130500] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/06/2022]
2
Application of an optimized alkaline cleaning solution for inhibitor removal during the post-CMP process: performance evaluation and mechanism analysis. J Mol Liq 2022. [DOI: 10.1016/j.molliq.2022.120892] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
3
Li W, Ma T, Tan B, Zhang S, Yan M, Ji J, Wang F, Du H, Wang X. The effect of structural properties of benzo derivative on the inhibition performance for copper corrosion in alkaline medium: Experimental and theoretical investigations. Colloids Surf A Physicochem Eng Asp 2022. [DOI: 10.1016/j.colsurfa.2022.129531] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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