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Sun Y, Henderson KJ, Jiang Z, Strzalka JW, Wang J, Shull KR. Effects of Reactive Annealing on the Structure of Poly(methacrylic acid)–Poly(methyl methacrylate) Diblock Copolymer Thin Films. Macromolecules 2011. [DOI: 10.1021/ma201000g] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Yan Sun
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States
| | - Kevin J. Henderson
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
| | - Zhang Jiang
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States
| | - Joseph W. Strzalka
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States
| | - Jin Wang
- Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439, United States
| | - Kenneth R. Shull
- Department of Materials Science and Engineering, Northwestern University, Evanston, Illinois 60208, United States
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