Dewetting behavior of self-assembled films of polystyrene-b-poly(methyl methacrylate) induced by solvent vapor annealing

Dewetting Behavior of Random Copolymer Films Induced by Solvent Vapor Annealing

In recent years, the dewetting behavior of block copolymer films has been studied a lot, but that of random copolymer films was rarely studied. In this study, effects of film thickness and solvent vapor annealing duration (0 s-24 h) on the dewetting behavior of the spin-coated poly(styrene-co-acrylonitrile) (SAN) random copolymer films were mainly investigated by atomic force microscopy and contact angle method for the first time. The film thicknesses of the SAN films prepared at different concentrations were characterized by X-ray reflectometry to be 6-34 nm. With the annealing of acetone vapor, the SAN films first appear holes and then rupture into droplets which fuse and break periodically. The periodic evolutions of the droplets are due to the preferred affinity of acetone molecules with the AN segments and the change of surface energy. This phenomenon is different from the single evolutions in the spin-coated polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) block copolymer films. This illustrates the interactions between AN segments and the substrate are stronger than those between PMMA segments and the substrate in the spin-coated films.