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For: Okamoto K, Kozawa T, Saeki A, Yoshida Y, Tagawa S. Subpicosecond pulse radiolysis in liquid methyl-substituted benzene derivatives. Radiat Phys Chem Oxf Engl 1993 2007. [DOI: 10.1016/j.radphyschem.2006.06.001] [Citation(s) in RCA: 43] [Impact Index Per Article: 2.5] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Number Cited by Other Article(s)
1
Manassir M, Pakiari AH. An electronic properties investigation to interpret the substituent constants of monosubstituted benzene derivatives. J Mol Graph Model 2019;92:201-207. [PMID: 31386947 DOI: 10.1016/j.jmgm.2019.07.017] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 05/15/2019] [Revised: 07/30/2019] [Accepted: 07/30/2019] [Indexed: 11/25/2022]
2
Huang R, Zhang H, Li W, He Z, Wang L, Jia Q, Lu Y. Proposition of a femtosecond pulse radiolysis with terahertz probe pulses. Radiat Phys Chem Oxf Engl 1993 2019. [DOI: 10.1016/j.radphyschem.2018.12.004] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/24/2022]
3
Kozawa T, Santillan JJ, Itani T. Challenges in Development of Sub-10 nm Resist Materials. J PHOTOPOLYM SCI TEC 2016. [DOI: 10.2494/photopolymer.29.717] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
4
Kozawa T, Santillan JJ, Itani T. Relationship between Thermalization Distance and Line Edge Roughness in Sub-10 nm Fabrication Using Extreme Ultraviolet Lithography. J PHOTOPOLYM SCI TEC 2015. [DOI: 10.2494/photopolymer.28.669] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
5
Baidak A, Badali M, LaVerne JA. Role of the Low-Energy Excited States in the Radiolysis of Aromatic Liquids. J Phys Chem A 2011;115:7418-27. [DOI: 10.1021/jp202802a] [Citation(s) in RCA: 13] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
6
Kozawa T, Tagawa S. Determination of Optimum Thermalization Distance Based on Trade-off Relationship between Resolution, Line Edge Roughness and Sensitivity of Chemically Amplified Extreme Ultraviolet Resists. J PHOTOPOLYM SCI TEC 2011. [DOI: 10.2494/photopolymer.24.137] [Citation(s) in RCA: 9] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
7
Wojnárovits L, Takács E. Irradiation treatment of azo dye containing wastewater: An overview. Radiat Phys Chem Oxf Engl 1993 2008. [DOI: 10.1016/j.radphyschem.2007.05.003] [Citation(s) in RCA: 139] [Impact Index Per Article: 8.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
8
Kozawa T, Tagawa S, Santillan JJ, Itani T. Impact of Nonconstant Diffusion Coefficient on Latent Image Quality in 22 nm Fabrication using Extreme Ultraviolet Lithography. J PHOTOPOLYM SCI TEC 2008. [DOI: 10.2494/photopolymer.21.421] [Citation(s) in RCA: 25] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
9
Acid distribution in chemically amplified extreme ultraviolet resist. ACTA ACUST UNITED AC 2007. [DOI: 10.1116/1.2794063] [Citation(s) in RCA: 121] [Impact Index Per Article: 7.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/17/2022]
10
Kozawa T, Tagawa S, Kai T, Shimokawa T. Sensitization Distance and Acid Generation Efficiency in a Model System of Chemically Amplified Electron Beam Resist with Methacrylate Backbone Polymer. J PHOTOPOLYM SCI TEC 2007. [DOI: 10.2494/photopolymer.20.577] [Citation(s) in RCA: 52] [Impact Index Per Article: 3.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/09/2022]
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