Enhanced CMOS image sensor by flexible 3D nanocone anti-reflection film

Flexible Thin Film Functionalized by Initiative Dust Removal and Anti-Fogging for Optical Device Applications

The deposition of dust and condensation of fog will block the scattering and transmission of light, thus affecting the performance of optical devices. In this work, flexible polyethylene terephthalate (PET) foil functionalized by active dust removal and anti-fogging characteristics is realized which combines electrodynamic screen (EDS) and electro-heating devices. In lieu of traditional measurement methods of dust removal efficiency, the PSNR is employed to characterize the dust removal efficiency of the film for the first time. The results show that both dust removal and anti-fogging improve the image quality, in which the dust removal increases the PSNR from 28.1 dB to 34.2 dB and the anti-fogging function realizes a film temperature rise of 16.7 ∘C in 5 min, reaching a maximum of 41.3 ∘C. According to the high sensitivity of the PSNR, we propose a fully automatic CIS film-driven algorithm, and its feasibility has been demonstrated.

Broadband responsivity enhancement of Si photodiodes by a plasmonic antireflection bilayer

Randomly distributed plasmonic Ag nanoparticles (NPs) with various sizes were fabricated by a reflow process to an island-shaped Ag thin-film deposited on a Si photodiode. These NPs conformally enclosed by an antireflective (AR)-type SiN_x/SiO₂ bilayer reveal significantly diminished reflectance in a broad wavelength (500 nm - 1100 nm) as compared to the cases of Ag NPs or SiO₂ layer enclosing Ag NPs on the Si substrate. Accordingly, the forward scattering and the total reflection along with wide-angle interference in between the dielectric bilayer incorporating the Ag NPs induce highly increased light absorption in the Si substrate. The fabricated Si photodiode adopting the plasmonic AR bilayer shows the responsivity peak value of 0.72 A/W at 835 nm wavelength and significant responsivity enhancement up to 40% relative to a bare Si photodiode in a wavelength range of 500 nm to 1000 nm.

Scalable Production of Mechanically Robust Antireflection Film for Omnidirectional Enhanced Flexible Thin Film Solar Cells

Antireflection (AR) at the interface between the air and incident window material is paramount to boost the performance of photovoltaic devices. 3D nanostructures have attracted tremendous interest to reduce reflection, while the structure is vulnerable to the harsh outdoor environment. Thus the AR film with improved mechanical property is desirable in an industrial application. Herein, a scalable production of flexible AR films is proposed with microsized structures by roll-to-roll imprinting process, which possesses hydrophobic property and much improved robustness. The AR films can be potentially used for a wide range of photovoltaic devices whether based on rigid or flexible substrates. As a demonstration, the AR films are integrated with commercial Si-based triple-junction thin film solar cells. The AR film works as an effective tool to control the light travel path and utilize the light inward more efficiently by exciting hybrid optical modes, which results in a broadband and omnidirectional enhanced performance.