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Lin C, Zhang Z, Dai Z, Wu M, Liu S, Chen J, Hua C, Lu Y, Zhang F, Lou H, Dong H, Zeng Q, Ma J, Pi X, Zhou D, Wu Y, Tian H, Rappe AM, Ren Z, Han G. Solution epitaxy of polarization-gradient ferroelectric oxide films with colossal photovoltaic current. Nat Commun 2023; 14:2341. [PMID: 37095113 PMCID: PMC10126087 DOI: 10.1038/s41467-023-37823-z] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 11/17/2021] [Accepted: 03/27/2023] [Indexed: 04/26/2023] Open
Abstract
Solution growth of single-crystal ferroelectric oxide films has long been pursued for the low-cost development of high-performance electronic and optoelectronic devices. However, the established principles of vapor-phase epitaxy cannot be directly applied to solution epitaxy, as the interactions between the substrates and the grown materials in solution are quite different. Here, we report the successful epitaxy of single-domain ferroelectric oxide films on Nb-doped SrTiO3 single-crystal substrates by solution reaction at a low temperature of ~200 oC. The epitaxy is mainly driven by an electronic polarization screening effect at the interface between the substrates and the as-grown ferroelectric oxide films, which is realized by the electrons from the doped substrates. Atomic-level characterization reveals a nontrivial polarization gradient throughout the films in a long range up to ~500 nm because of a possible structural transition from the monoclinic phase to the tetragonal phase. This polarization gradient generates an extremely high photovoltaic short-circuit current density of ~2.153 mA/cm2 and open-circuit voltage of ~1.15 V under 375 nm light illumination with power intensity of 500 mW/cm2, corresponding to the highest photoresponsivity of ~4.306×10-3 A/W among all known ferroelectrics. Our results establish a general low-temperature solution route to produce single-crystal gradient films of ferroelectric oxides and thus open the avenue for their broad applications in self-powered photo-detectors, photovoltaic and optoelectronic devices.
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Affiliation(s)
- Chen Lin
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
| | - Zijun Zhang
- Center of Electron Microscope, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
| | - Zhenbang Dai
- Department of Chemistry, University of Pennsylvania, Philadelphia, PA, 19104-6323, USA
- Oden Institute for Computational Engineering and Sciences, The University of Texas at Austin, Austin, Texas, 78712, USA
| | - Mengjiao Wu
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
| | - Shi Liu
- Key Laboratory for Quantum Materials of Zhejiang Province, Department of Physics, School of Science, Westlake University, Hangzhou, 310024, China
| | - Jialu Chen
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
| | - Chenqiang Hua
- Zhejiang Province Key Laboratory of Quantum Technology and Device, Department of physics, Zhejiang University, Hangzhou, 310027, China
| | - Yunhao Lu
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
- Zhejiang Province Key Laboratory of Quantum Technology and Device, Department of physics, Zhejiang University, Hangzhou, 310027, China
| | - Fei Zhang
- Center for High Pressure Science and Technology Advanced Research, Shanghai, 201203, China
| | - Hongbo Lou
- Center for High Pressure Science and Technology Advanced Research, Shanghai, 201203, China
| | - Hongliang Dong
- Center for High Pressure Science and Technology Advanced Research, Shanghai, 201203, China
| | - Qiaoshi Zeng
- Center for High Pressure Science and Technology Advanced Research, Shanghai, 201203, China
| | - Jing Ma
- State Key Lab of New Ceramics and Fine Processing, School of Materials Science and Engineering, Tsinghua University, Beijing, 100091, China
| | - Xiaodong Pi
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
- Institute of Advanced Semiconductors & Zhejiang Provincial Key Laboratory of Power Semiconductor Materials and Devices, ZJU-Hangzhou Global Scientific and Technological Innovation Center, Zhejiang University, Hangzhou, 311215, China
| | - Dikui Zhou
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
- Research Center for Intelligent Sensing, Zhejiang Lab, Hangzhou, 311100, China
| | - Yongjun Wu
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China
- Research Center for Intelligent Sensing, Zhejiang Lab, Hangzhou, 311100, China
| | - He Tian
- Center of Electron Microscope, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.
| | - Andrew M Rappe
- Department of Chemistry, University of Pennsylvania, Philadelphia, PA, 19104-6323, USA
| | - Zhaohui Ren
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.
- Research Center for Intelligent Sensing, Zhejiang Lab, Hangzhou, 311100, China.
| | - Gaorong Han
- State Key Laboratory of Silicon and Advanced Semiconductor Materials, School of Materials Science and Engineering, Zhejiang University, Hangzhou, 310027, China.
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Gogoi L, Gao W, Ajayan PM, Deb P. Quantum magnetic phenomena in engineered heterointerface of low-dimensional van der Waals and non-van der Waals materials. Phys Chem Chem Phys 2023; 25:1430-1456. [PMID: 36601788 DOI: 10.1039/d2cp05228h] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/24/2022]
Abstract
Investigating magnetic phenomena at the microscopic level has emerged as an indispensable research domain in the field of low-dimensional magnetic materials. Understanding quantum phenomena that mediate the magnetic interactions in dimensionally confined materials is crucial from the perspective of designing cheaper, compact, and energy-efficient next-generation spintronic devices. The infrequent occurrence of intrinsic long-range magnetic order in dimensionally confined materials hinders the advancement of this domain. Hence, introducing and controlling the ferromagnetic character in two-dimensional materials is important for further prospective studies. The interface in a heterostructure significantly contributes to modulating its collective magnetic properties. Quantum phenomena occurring at the interface of engineered heterostructures can enhance or suppress magnetization of the system and introduce magnetic character to a native non-magnetic system. Considering most 2D magnetic materials are used as stacks with other materials in nanoscale devices, the methods to control the magnetism in a heterostructure and understanding the corresponding mechanism are crucial for promising spintronic and other functional applications. This review highlights the effect of electric polarization of the adjacent layer, changed structural configuration at the vicinity of the interface, natural strain induced by lattice mismatch, and exchange interaction in the interfacial region in modulating the magnetism of heterostructures of van der Waals and non-van der Waals materials. Further, prospects of interface-engineered magnetism in spin-dependent device applications are also discussed.
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Affiliation(s)
- Liyenda Gogoi
- Advanced Functional Materials Laboratory, Department of Physics, Tezpur University (Central University), Tezpur, 784028, India.
| | - Weibo Gao
- Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, 637371, Singapore
| | - Pulickel M Ajayan
- Benjamin M. and Mary Greenwood Anderson Professor of Engineering, Department of Materials Science and NanoEngineering, Rice University, 6100 Main Street, Houston, Texas 77005, USA.
| | - Pritam Deb
- Advanced Functional Materials Laboratory, Department of Physics, Tezpur University (Central University), Tezpur, 784028, India.
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