Pushing the boundaries of local oxidation nanolithography: Short timescales and high speeds

Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications

Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.

Damped two-axis axially collocated flexure hinge

Broadband motion control in flexure-based stages can benefit from passive damping enhancement at their flexible structures. This paper develops a damped two-axis axially collocated (2-AC) flexure hinge with damping-enabling hybrid inserts and analytically derives its loss factor model based on hybrid (empirical and analytical) compliance modeling and shearing damping modeling. The analytical loss factor model is verified by finite element analysis. It is seen that the geometric parameters of the diameter and slope angle of the insert are sensitive to the hinge's loss factor based on the theoretical loss factor model, especially in low-frequency and resonant zone. The actual experiments and finite element simulation indicate that embedding the hybrid inserts into the 2-AC flexure hinge can improve the damping performance of the hinge.

Real-time nanofabrication with high-speed atomic force microscopy

The ability to follow nanoscale processes in real-time has obvious benefits for the future of material science. In particular, the ability to evaluate the success of fabrication processes in situ would be an advantage for many in the semiconductor industry. We report on the application of a previously described high-speed atomic force microscope (AFM) for nanofabrication. The specific fabrication method presented here concerns the modification of a silicon surface by locally oxidizing the region in the vicinity of the AFM tip. Oxide features were fabricated during imaging, with relative tip-sample velocities of up to 10 cm s(-1), and with a data capture rate of 15 fps.

Electro-oxidative nanopatterning of silane monolayers on boron-doped diamond electrodes

Oxidized boron-doped diamond (BDD) electrodes were coated with a monolayer of n-octadecyltrichlorosilane as well as of other silanes. Scanning force microscopy was applied to pattern these monolayers, utilizing doped diamond-coated conductive probes. Patterns were generated on the nanometer scale, and conditions for the patterning process were quantified with regard to humidity and potential bias. It was observed that a sample bias of 3-3.5 V and a relative humidity >70% are necessary to generate reproducible and stable patterns. At potentials and relative humidities below these values, no or incomplete removal of the monolayer occurred. The results show that electro-oxidative patterning is an expedient way for the generation of nanostructures on chemically modified BDD.