Direct observation of size-selected Ni nanoclusters soft-landed on a Si(111)-(7×7) surface

Geometry control of size selected Pt clusters bound to Si substrate surface by cluster impact deposition

Geometry of platinum clusters, Pt_N (N = 30-71), supported on a silicon substrate was investigated, aiming to control the geometry. The supported clusters were prepared by the impact of size-selected Pt_N ⁺ onto the substrate at a given collision energy (cluster-impact deposition), and their geometry was observed by means of a scanning-tunneling microscope. Even at the collision energy of 1 eV per Pt atom, sufficiently strong Pt-Si interaction between Pt_N (N = 30 and 45) and the Si substrate allows them to be supported as close-packed monatomic-layered Pt disks, while at N = 60, multilayered shapes exist besides the monatomic-layered shape, the fraction of which increases at N = 71. When the collision energy is increased, Si atoms located at the interface between the cluster and Si substrate dissolve into the cluster, and with further increase in the collision energy, the Pt-Si cluster is partially implanted into the substrate. The transition in the shape of the supported clusters with the collision energy and the cluster size was explained according to the deformation of the clusters and the substrate surface by the cluster impact. It is proposed that the momentum of Pt_N ⁺ per its cross section is a good index to control the geometry in the case of strong cluster-support interaction such as Pt and Si.

Soft- and reactive landing of ions onto surfaces: Concepts and applications

Soft- and reactive landing of mass-selected ions is gaining attention as a promising approach for the precisely-controlled preparation of materials on surfaces that are not amenable to deposition using conventional methods. A broad range of ionization sources and mass filters are available that make ion soft-landing a versatile tool for surface modification using beams of hyperthermal (<100 eV) ions. The ability to select the mass-to-charge ratio of the ion, its kinetic energy and charge state, along with precise control of the size, shape, and position of the ion beam on the deposition target distinguishes ion soft landing from other surface modification techniques. Soft- and reactive landing have been used to prepare interfaces for practical applications as well as precisely-defined model surfaces for fundamental investigations in chemistry, physics, and materials science. For instance, soft- and reactive landing have been applied to study the surface chemistry of ions isolated in the gas-phase, prepare arrays of proteins for high-throughput biological screening, produce novel carbon-based and polymer materials, enrich the secondary structure of peptides and the chirality of organic molecules, immobilize electrochemically-active proteins and organometallics on electrodes, create thin films of complex molecules, and immobilize catalytically active organometallics as well as ligated metal clusters. In addition, soft landing has enabled investigation of the size-dependent behavior of bare metal clusters in the critical subnanometer size regime where chemical and physical properties do not scale predictably with size. The morphology, aggregation, and immobilization of larger bare metal nanoparticles, which are directly relevant to the design of catalysts as well as improved memory and electronic devices, have also been studied using ion soft landing. This review article begins in section 1 with a brief introduction to the existing applications of ion soft- and reactive landing. Section 2 provides an overview of the ionization sources and mass filters that have been used to date for soft landing of mass-selected ions. A discussion of the competing processes that occur during ion deposition as well as the types of ions and surfaces that have been investigated follows in section 3. Section 4 discusses the physical phenomena that occur during and after ion soft landing, including retention and reduction of ionic charge along with factors that impact the efficiency of ion deposition. The influence of soft landing on the secondary structure and biological activity of complex ions is addressed in section 5. Lastly, an overview of the structure and mobility as well as the catalytic, optical, magnetic, and redox properties of bare ionic clusters and nanoparticles deposited onto surfaces is presented in section 6.

Unisized two-dimensional platinum clusters on silicon(111)-7x7 surface observed with scanning tunneling microscope

Uni-sized platinum clusters (size range of 5-40) on a silicon(111)-7 x 7 surface were prepared by depositing size-selected platinum cluster ions on the silicon surface at the collision energy of 1.5 eV per atom at room temperature. The surface thus prepared was observed by means of a scanning tunneling microscope (STM) at the temperature of 77 K under an ambient pressure less than 5 x 10(-9) Pa. The STM images observed at different cluster sizes revealed that (1) the clusters are flattened and stuck to the surface with a chemical-bond akin to platinum silicide, (2) every platinum atom occupies preferentially the most reactive sites distributed within a diameter of approximately 2 nm on the silicon surface at a cluster size up to 20, and above this size, the diameter of the cluster increases with the size, and (3) the sticking probability of an incoming cluster ion on the surface increases with the cluster size and reaches nearly unity at a size larger than 20.

Electronic structures of size-selected single-layered platinum clusters on silicon(111)-7×7 surface at a single cluster level by tunneling spectroscopy

Tunneling spectra of size-selected single-layered platinum clusters (size range of 5-40) deposited on a silicon(111)-7x7 surface were measured individually at a temperature of 77 K by means of a scanning tunneling microscope (STM), and the local electronic densities of states of individual clusters were derived from their tunneling spectra measured by placing an STM tip on the clusters. In a bias-voltage (V(s)) range from -3 to 3 V, each tunneling spectrum exhibits several peaks assignable to electronic states associated with 5d states of a constituent platinum atom and an energy gap of 0.1-0.6 eV in the vicinity of V(s)=0. Even when platinum cluster ions having the same size were deposited on the silicon(111)-7x7 surface, the tunneling spectra and the energy gaps of the deposited clusters are not all the same but can be classified in shape into several different groups; this finding is consistent with the observation of the geometrical structures of platinum clusters on the silicon(111)-7x7 surface. The mean energy gap of approximately 0.4 eV drops to approximately 0.25 eV at the size of 20 and then decreases gradually as the size increases, consistent with our previous finding that the cluster diameter remains unchanged, but the number density of Pt atoms increases below the size of 20 while the diameter increases, but the density does not change above it. It is concluded that the mean energy gap tends to decrease gradually with the mean cluster diameter. The dependence of the mean energy gap on the mean Pt-Pt distance shows that the mean energy gap decreases sharply when the mean Pt-Pt distance exceeds that of a platinum metal (0.28 nm).