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He Y, Wang TL, Zhang M, Wang TW, Wu LF, Zeng L, Wang X, Boubeche M, Wang S, Yan K, Lin SH, Luo H. Discovery and Facile Synthesis of a New Silicon Based Family as Efficient Hydrogen Evolution Reaction Catalysts: A Computational and Experimental Investigation of Metal Monosilicides. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2021; 17:e2006153. [PMID: 33512059 DOI: 10.1002/smll.202006153] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/02/2020] [Revised: 11/17/2020] [Indexed: 06/12/2023]
Abstract
A new family of transition-metal monosilicides (MSi, M = Ti, Mn, Fe, Ru, Ni, Pd, Co, and Rh) electrocatalysts with superior electrocatalytic performance of hydrogen evolution is reported, based on the computational and experimental results. It is proposed that these MSi can be synthesized within several minutes by adopting the arc-melting method. The previously reported RuSi is not only fabricated more readily but eventually explored 8 MSi that can be good hydrogen evolution reaction catalysts. Silicides then can be another promising electrocatalysts family as carbides, wherein carbon has the same electronic configuration as silicon. All explored silicides electrodes exhibited low overpotentials (34-54 mV at 10 mA cm-2 ) with Tafel slopes from 23.6 to 32.3 mV dec-1 , which are comparable to that of the commercial 20 wt% Pt/C (37 mV, 26.1 mV dec-1 ). First-principles calculations demonstrated that the superior performance can be attributed to the high catalytic reactivity per site that can even function at high hydrogen coverages (≈100%) on multiple low surface energy facets. The work sheds light on a new class of electrocatalysts for hydrogen evolution, with earth-abundant and inexpensive silicon-based compounds.
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Affiliation(s)
- Yuan He
- School of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Key Lab of Polymer Composite & Functional Materials, Sun Yat-Sen University, No.135, Xingang Xi Road, Guangzhou, 510275, P. R. China
| | - Tan-Ling Wang
- Department of Materials and Optoelectronic Science & Center of Crystal Research, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan
| | - Man Zhang
- School of Environmental Science and Engineering, Sun Yat-Sen University, Guangzhou, 510275, P. R. China
| | - Ta-Wei Wang
- Department of Materials and Optoelectronic Science & Center of Crystal Research, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan
| | - Li-Fan Wu
- Department of Materials and Optoelectronic Science & Center of Crystal Research, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan
| | - Lingyong Zeng
- School of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Key Lab of Polymer Composite & Functional Materials, Sun Yat-Sen University, No.135, Xingang Xi Road, Guangzhou, 510275, P. R. China
| | - Xiaopeng Wang
- School of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Key Lab of Polymer Composite & Functional Materials, Sun Yat-Sen University, No.135, Xingang Xi Road, Guangzhou, 510275, P. R. China
| | - Mebrouka Boubeche
- School of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Key Lab of Polymer Composite & Functional Materials, Sun Yat-Sen University, No.135, Xingang Xi Road, Guangzhou, 510275, P. R. China
| | - Shu Wang
- School of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Key Lab of Polymer Composite & Functional Materials, Sun Yat-Sen University, No.135, Xingang Xi Road, Guangzhou, 510275, P. R. China
| | - Kai Yan
- School of Environmental Science and Engineering, Sun Yat-Sen University, Guangzhou, 510275, P. R. China
| | - Shi-Hsin Lin
- Department of Materials and Optoelectronic Science & Center of Crystal Research, National Sun Yat-Sen University, Kaohsiung, 80424, Taiwan
| | - Huixia Luo
- School of Materials Science and Engineering, State Key Laboratory of Optoelectronic Materials and Technologies, Key Lab of Polymer Composite & Functional Materials, Sun Yat-Sen University, No.135, Xingang Xi Road, Guangzhou, 510275, P. R. China
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Gira MJ, Tkacz KP, Hampton JR. Physical and electrochemical area determination of electrodeposited Ni, Co, and NiCo thin films. NANO CONVERGENCE 2016; 3:6. [PMID: 28191416 PMCID: PMC5271141 DOI: 10.1186/s40580-016-0063-0] [Citation(s) in RCA: 24] [Impact Index Per Article: 3.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/19/2014] [Accepted: 07/14/2015] [Indexed: 05/05/2023]
Abstract
The surface area of electrodeposited thin films of Ni, Co, and NiCo was evaluated using electrochemical double-layer capacitance, electrochemical area measurements using the [Ru(NH[Formula: see text])[Formula: see text]][Formula: see text]/[Ru(NH[Formula: see text])[Formula: see text]][Formula: see text] redox couple, and topographic atomic force microscopy (AFM) imaging. These three methods were compared to each other for each composition separately and for the entire set of samples regardless of composition. Double-layer capacitance measurements were found to be positively correlated to the roughness factors determined by AFM topography. Electrochemical area measurements were found to be less correlated with measured roughness factors as well as applicable only to two of the three compositions studied. The results indicate that in situ double-layer capacitance measurements are a practical, versatile technique for estimating the accessible surface area of a metal sample.
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Affiliation(s)
- Matthew J. Gira
- Department of Physics, Hope College, Holland, MI 49423 USA
- Department of Chemistry, Hope College, Holland, MI 49423 USA
| | - Kevin P. Tkacz
- Department of Physics, Hope College, Holland, MI 49423 USA
- Present Address: Department of Chemical Engineering and Materials Science, University of California, Irvine, CA 92697 USA
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