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For: Kondo K, Tanaka Z, Monden T. Shape evolution of electrodeposited bumps with additive. Electrochim Acta 1999. [DOI: 10.1016/s0013-4686(99)00072-9] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/18/2022]
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Cho SK, Kim JJ. A Study on the Deposit Uniformity and Profile of Cu Electroplated in Miniaturized, Laboratory-Scale Through Mask Plating Cell for Printed Circuit Board (PCBs) Fabrication. KOREAN CHEMICAL ENGINEERING RESEARCH 2016. [DOI: 10.9713/kcer.2016.54.1.108] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
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