Micropatterning of Ni particles on a BaTiO3 green sheet using a self-assembled monolayer

Evaporative lithographic patterning of binary colloidal films

Evaporative lithography offers a promising new route for patterning a broad array of soft materials. In this approach, a mask is placed above a drying film to create regions of free and hindered evaporation, which drive fluid convection and entrained particles to regions of highest evaporative flux. We show that binary colloidal films exhibit remarkable pattern formation when subjected to a periodic evaporative landscape during drying.

Marangoni effects on evaporative lithographic patterning of colloidal films

We investigate the effects of Marangoni stresses on the evaporative lithographic patterning of colloidal films (Harris, D. J.; Hu, H.; Conrad, J. C.; Lewis, J. A. Phys. Rev. Lett. 2007, 98 (14), 148301). Films are dried beneath a mask that induces periodically varying regions of free and hindered evaporation. Direct imaging reveals that silica microspheres suspended within an organic solvent exhibit recirculating flows induced by temperature and surface tension gradients that arise during drying. The films display remarkable pattern formation with a majority of the particles deposited in the masked regions. Above a critical colloid volume fraction, recirculating flows are suppressed, leading to particle deposition in unmasked regions of high evaporative flux.

Patterning colloidal films via evaporative lithography

We investigate evaporative lithography as a route for patterning colloidal films. Films are dried beneath a mask that induces periodic variations between regions of free and hindered evaporation. Direct imaging reveals that particles segregate laterally within the film, as fluid and entrained particles migrate towards regions of higher evaporative flux. The films exhibit remarkable pattern formation that can be regulated by tuning the initial suspension composition, separation distance between the mask and underlying film, and mask geometry.

Directed fabrication of radially stacked multifunctional oxide heterostructures using soft electron-beam lithography

A versatile patterning approach based on electron-beam lithography (eBL) and solution deposition, termed soft-eBL, has been developed to fabricate radially stacked heterostructures of multifunctional oxides from their sol precursors. Well-defined nanorings of lead zirconate titanate (PZT) are fabricated on a variety of substrates such as noble metals (e.g., Au), semiconductors (e.g., Si), and oxide single crystals (e.g., SrTiO3), which were previously functionalized with appropriate self-assembled monolayers (SAMs). The undercut in the double-layer eBL resist and substrate functionalization with the SAM treatment play a vital role in the formation of the ring structures. The nanorings are then used as building block "containers" and ring-reservoirs are filled with a second sol (e.g., CoFe2O4) to form radially stacked composite ceramic heterostructures. The approach presented here does not require either feature alignment to realize heterostructures or the etching of ceramics, and is amenable to a variety of radially stacked composite heterostructures.