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Li J, Ma H, Wu D, Li X, Zhao Y, Zhang Y, Du B, Wei Q. A label-free electrochemiluminescence immunosensor based on KNbO3–Au nanoparticles@Bi2S3 for the detection of prostate specific antigen. Biosens Bioelectron 2015; 74:104-12. [DOI: 10.1016/j.bios.2015.06.027] [Citation(s) in RCA: 31] [Impact Index Per Article: 3.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 03/30/2015] [Revised: 06/11/2015] [Accepted: 06/12/2015] [Indexed: 12/16/2022]
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2
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Chen Y, Wang L, Pradel A, Ribes M, Record MC. A voltammetric study of the underpotential deposition of cobalt and antimony on gold. J Electroanal Chem (Lausanne) 2014. [DOI: 10.1016/j.jelechem.2014.03.025] [Citation(s) in RCA: 7] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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3
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Lu Y, Jia J, Yi G. Selective growth and photoelectrochemical properties of Bi2S3 thin films on functionalized self-assembled monolayers. CrystEngComm 2012. [DOI: 10.1039/c2ce06713g] [Citation(s) in RCA: 31] [Impact Index Per Article: 2.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/06/2023]
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4
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Liang X, Zhang Q, Lay MD, Stickney JL. Growth of Ge nanofilms using electrochemical atomic layer deposition, with a "bait and switch" surface-limited reaction. J Am Chem Soc 2011; 133:8199-204. [PMID: 21539385 DOI: 10.1021/ja109398t] [Citation(s) in RCA: 14] [Impact Index Per Article: 1.1] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
Ge nanofilms were deposited from aqueous solutions using the electrochemical analog of atomic layer deposition (ALD). Direct electrodeposition of Ge from an aqueous solution is self-limited to a few monolayers, depending on the pH. This report describes an E-ALD process for the growth of Ge films from aqueous solutions. The E-ALD cycle involved inducing a Ge atomic layer to deposit on a Te atomic layer formed on Ge, via underpotential deposition (UPD). The Te atomic layer was then reductively stripped from the deposit, leaving the Ge and completing the cycle. The Te atomic layer was bait for Ge deposition, after which the Te was switched out, reduced to a soluble telluride, leaving the Ge (one "bait and switch" cycle). Deposit thickness was a linear function of the number of cycles. Raman spectra indicated formation of an amorphous Ge film, consistent with the absence of a XRD pattern. Films were more stable and homogeneous when formed on Cu substrates, than on Au, due to a larger hydrogen overpotential, and the corresponding lower tendency to form bubbles.
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Affiliation(s)
- Xuehai Liang
- Department of Chemistry, The University of Georgia, Athens, Georgia 30602, USA
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One-step electrochemical preparation of the ternary (BixSb1−x)2Te3 thin films on Au(111): Composition-dependent growth and characterization studies. Electrochim Acta 2010. [DOI: 10.1016/j.electacta.2010.06.051] [Citation(s) in RCA: 8] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
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6
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Zhu W, Liu X, Liu H, Tong D, Yang J, Peng J. Coaxial Heterogeneous Structure of TiO2 Nanotube Arrays with CdS as a Superthin Coating Synthesized via Modified Electrochemical Atomic Layer Deposition. J Am Chem Soc 2010; 132:12619-26. [DOI: 10.1021/ja1025112] [Citation(s) in RCA: 151] [Impact Index Per Article: 10.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
Affiliation(s)
- Wen Zhu
- State Key Laboratory of Material Processing and Die & Mould Technology, Huazhong University of Science & Technology, Wuhan 430074, People’s Republic of China
| | - Xi Liu
- State Key Laboratory of Material Processing and Die & Mould Technology, Huazhong University of Science & Technology, Wuhan 430074, People’s Republic of China
| | - Huiqiong Liu
- State Key Laboratory of Material Processing and Die & Mould Technology, Huazhong University of Science & Technology, Wuhan 430074, People’s Republic of China
| | - Dali Tong
- State Key Laboratory of Material Processing and Die & Mould Technology, Huazhong University of Science & Technology, Wuhan 430074, People’s Republic of China
| | - Junyou Yang
- State Key Laboratory of Material Processing and Die & Mould Technology, Huazhong University of Science & Technology, Wuhan 430074, People’s Republic of China
| | - Jiangying Peng
- State Key Laboratory of Material Processing and Die & Mould Technology, Huazhong University of Science & Technology, Wuhan 430074, People’s Republic of China
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Erdoğan İY, Demir Ü. Synthesis and characterization of Sb2Te3 nanofilms via electrochemical co-deposition method. J Electroanal Chem (Lausanne) 2009. [DOI: 10.1016/j.jelechem.2009.06.010] [Citation(s) in RCA: 35] [Impact Index Per Article: 2.3] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/20/2022]
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8
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The underpotential deposition of Bi2Te3−ySey thin films by an electrochemical co-deposition method. Electrochim Acta 2009. [DOI: 10.1016/j.electacta.2008.09.059] [Citation(s) in RCA: 31] [Impact Index Per Article: 2.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022]
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9
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Jana A, Bhattacharya C, Sinha S, Datta J. Study of the optimal condition for electroplating of Bi2S3 thin films and their photoelectrochemical characteristics. J Solid State Electrochem 2008. [DOI: 10.1007/s10008-008-0679-z] [Citation(s) in RCA: 31] [Impact Index Per Article: 1.9] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/21/2022]
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10
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Banga DO, Vaidyanathan R, Xuehai L, Stickney JL, Cox S, Happeck U. Formation of PbTe nanofilms by electrochemical atomic layer deposition (ALD). Electrochim Acta 2008. [DOI: 10.1016/j.electacta.2008.02.108] [Citation(s) in RCA: 32] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
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Zhu W, Yang JY, Zhou DX, Xiao CJ, Duan XK. Electrochemical aspects and structure characterization of VA-VIA compound semiconductor Bi2Te3/Sb2Te3 superlattice thin films via electrochemical atomic layer epitaxy. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2008; 24:5919-5924. [PMID: 18452317 DOI: 10.1021/la8001064] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/26/2023]
Abstract
This paper concerns the electrochemical atom-by-atom growth of VA-VIA compound semiconductor thin film superlattice structures using electrochemical atomic layer epitaxy. The combination of the Bi2Te3 and Sb2Te3 programs and Bi2Te3/Sb2Te3 thin film superlattice with 18 periods, where each period involved 21 cycles of Bi2Te3 followed by 21 cycles of Sb2Te3, is reported here. According to the angular distance between the satellite and the Bragg peak, a period of 23 nm for the superlattice was indicated from the X-ray diffraction (XRD) spectrum. An overall composition of Bi 0.25Sb0.16Te0.58, suggesting the 2:3 stoichiometric ratio of total content of Bi and Sb to Te, as expected for the format of the Bi2Te3/Sb2Te3 compound, was further verified by energy dispersive X-ray quantitative analysis. Both field-emission scanning electron microscopy and XRD data indicated the deposit grows by a complex mechanism involving some 3D nucleation and growth in parallel with underpotential deposition. The optical band gap of the deposited superlattice film was determined as 0.15 eV by Fourier transform infrared spectroscopy and depicts an allowed direct type of transition. Raman spectrum observation with annealed and unannealed superlattice sample showed that the LIF mode has presented, suggesting a perfect AB/CB bonding in the superlattice interface.
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Affiliation(s)
- Wen Zhu
- State Key Laboratory of Material Processing and Die & Mould Technology, Wuhan 430074, People's Republic of China.
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Zhu W, Yang J, Zhou D, Xiao C, Duan X. Electrochemical atom-by-atom growth of highly uniform thin sheets of thermoelectric bismuth telluride via the route of ECALE. J Electroanal Chem (Lausanne) 2008. [DOI: 10.1016/j.jelechem.2007.11.014] [Citation(s) in RCA: 19] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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13
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Electrochemical characterization of the underpotential deposition of tellurium on Au electrode. Electrochim Acta 2007. [DOI: 10.1016/j.electacta.2006.10.028] [Citation(s) in RCA: 29] [Impact Index Per Article: 1.7] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022]
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Rabchinskii SM, Bagaev SI, Strel’tsov EA. Cadmium atomic layers on tellurium electrodes. RUSS J ELECTROCHEM+ 2006. [DOI: 10.1134/s1023193506080039] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/22/2022]
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Bondarenko AS, Ragoisha GA, Osipovich NP, Streltsov EA. Multiparametric electrochemical characterisation of Te–Cu–Pb atomic three-layer structure deposition on polycrystalline gold. Electrochem commun 2006. [DOI: 10.1016/j.elecom.2006.03.033] [Citation(s) in RCA: 22] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/25/2022] Open
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Yang J, Zhu W, Gao X, Bao S, Fan X, Duan X, Hou J. Formation and Characterization of Sb2Te3 Nanofilms on Pt by Electrochemical Atomic Layer Epitaxy. J Phys Chem B 2006; 110:4599-604. [PMID: 16526690 DOI: 10.1021/jp0565498] [Citation(s) in RCA: 62] [Impact Index Per Article: 3.4] [Reference Citation Analysis] [Abstract] [MESH Headings] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
A nanocrystalline Sb2Te3 VA-VIA group compound thin film was grown via the route of electrochemical atomic layer epitaxy (ECALE) in this work for the first time. The electrochemical behavior of Te and Sb on Pt, Te on Sb-covered Pt, and Sb on Te-covered Pt was studied by methods of cyclic voltammetry, anode potentiodynamic scanning, and coulometry. A steady deposition of the Sb2Te3 compound could be attained after negatively stepped adjusting of the UPD potentials of Sb and Te on Pt in each of the first 40 depositing cycles. The structure of the deposit was proven to be the Sb2Te3 compound by X-ray diffraction. The 2:3 stoichiometric ratio of Sb to Te was verified by EDX quantitative analysis, which is consistent with the result of coulometric analysis. A nanocystalline microstructure was observed for the Sb2Te3 deposits, and the average grain size is about 20 nm. Cross-sectional SEM observation shows an interface layer about 19 nm in thickness sandwiched between the Sb2Te3 nanocrystalline deposit and the Pt substrate surface. The optical band gap of the deposited Sb2Te3 film was determined as 0.42 eV by FTIR spectroscopy and it is blueshifted in comparison with that of the bulk Sb2Te3 single crystal because of its nanocrystalline microstructure.
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Affiliation(s)
- Junyou Yang
- State Key Lab for Plastic Forming Simulation and Dies & Mould Technology, School of Materials Science and Engineering, Huazhong University of Science and Technology, Wuhan 430074, P R China.
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Zhu W, Yang J, Hou J, Gao X, Bao S, Fan X. Optimization of the formation of bismuth telluride thin film by using ECALE. J Electroanal Chem (Lausanne) 2005. [DOI: 10.1016/j.jelechem.2005.07.016] [Citation(s) in RCA: 27] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/28/2022]
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Zhu W, Yang J, Gao X, Hou J, Bao S, Fan X. The underpotential deposition of bismuth and tellurium on cold rolled silver substrate by ECALE. Electrochim Acta 2005. [DOI: 10.1016/j.electacta.2005.03.028] [Citation(s) in RCA: 23] [Impact Index Per Article: 1.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/15/2022]
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Effect of potential on bismuth telluride thin film growth by electrochemical atomic layer epitaxy. Electrochim Acta 2005. [DOI: 10.1016/j.electacta.2005.01.003] [Citation(s) in RCA: 41] [Impact Index Per Article: 2.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/23/2022]
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Rabchynski SM, Ivanou DK, Streltsov EA. Photoelectrochemical formation of indium and cadmium selenide nanoparticles through Se electrode precursor. Electrochem commun 2004. [DOI: 10.1016/j.elecom.2004.07.019] [Citation(s) in RCA: 11] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/26/2022] Open
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Garland J, Assiongbon K, Pettit C, Emery S, Roy D. Kinetic analysis of electrosorption using fast Fourier transform electrochemical impedance spectroscopy: underpotential deposition of Bi3+ in the presence of coadsorbing ClO4− on gold. Electrochim Acta 2002. [DOI: 10.1016/s0013-4686(02)00437-1] [Citation(s) in RCA: 33] [Impact Index Per Article: 1.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]
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