Radiotracer study of the adsorption of Cl− and HSO4− ions on a porous gold electrode and on underpotential deposited metals on gold

Kinetics of reduction of aqueous hexaammineruthenium(III) ion at Pt and Au microelectrodes: electrolyte, temperature, and pressure effects

Rate constants kel obtained by impedance spectroscopy for the reduction of Ru(NH3)6(3+) at polycrystalline Pt and Au ultramicroelectrodes depend strongly on the identity and concentration of the anion present in the order CF3SO3(-) < Cl(-) < ClO4(-), but not on the cation of the supporting electrolyte (Na(+), K(+), H(+)). For Cl(-) as the sole anion present, kel is directly proportional to the total [Cl(-)], such that kel would be zero if Cl(-) were hypothetically absent, indicating that Cl(-) is directly involved in mediation of the Ru(NH3)6(3+/2+) electron transfer. For CF3SO3(-) as the sole counterion, the dependence of kel on the total [CF3SO3(-)] is not linear, possibly because blocking of the available electrode surface becomes dominant at high triflate concentrations. Volumes of activation ΔVel(⧧) for reduction of Ru(NH3)6(3+) at an electrode in presence of Cl(-) or CF3SO3(-) are much more negative than predictions based on theory (Swaddle, T. W. Chem. Rev.2005, 105, 2573) that has been successful with other electron transfer reactions but which does not take into account the involvement of the anions in the activation process. The strongly negative ΔVel(⧧) values probably reflect solvation increases peculiar to activation processes of Ru(III/II) am(m)ine complexes, possibly together with promotion of desorption of surface-blocking Cl(-) or CF3SO3(-) from electrodes by applied pressure. Frumkin corrections for Ru(NH3)6(3+) within the diffuse double layer would make ΔVel(⧧) even more negative than is observed, although the corrections would be small. The strongly negative ΔVel(⧧) values are inconsistent with reduction of Ru(NH3)6(3+) in direct contact with the metallic electrode surface, which would entail substantial dehydration of both the electrode and Ru(NH3)6(3+). Reduction of Ru(NH3)6(3+) can be regarded as taking place in hard contact with adsorbed water at the outer Helmholtz plane.

Adsorption of dodecyltrimethylammonium bromide and sodium bromide on gold studied by liquid chromatography and flow adsorption microcalorimetry

Here, we report on a new aspect of the adsorption of Br- on the surface of gold. The adsorption of dodecyltrimethylammonium bromide (C12TABr) from aqueous solutions onto macroporous gold particles was studied by continuous flow frontal analysis solid/liquid chromatography and flow adsorption microcalorimetry. The material balance and enthalpy balance of adsorption and the change in the solution pH were measured simultaneously. Initially, Br- is irreversibly bound to high-affinity surface sites counterbalanced by the adsorption of H+ from the aqueous phase. The surface speciation is accompanied by the formation of C12TAOH, which in turn results in a significant pH increase in the bulk solution. The net process was found to be strongly exothermic (-280 kJ.mol(-1)), which is indicative of the occurrence of chemisorption. The specific adsorption of Br- is followed by the reversible adsorption of C12TABr to produce a firmly bound monolayer in a head-to-surface arrangement (-53 kJ.mol(-1)). In a relatively narrow range of the surface coverage, various composite structures may develop on the top layer and eventually transform to full-cylindrical surface aggregates. The surface aggregation was found to be reversible, with an enthalpy change of -11 kJ.mol(-1). The importance of the specific binding of Br- to the surface of gold was confirmed by measurement of the initial adsorption of NaBr on the microparticles. The initial adsorption was found to be irreversible, with an enthalpy change of approximately -240 kJ.mol(-1). This process involved the formation of an AuBr-/H+ electric double layer at the gold/water interface, accompanied by a dramatic increase in the solution pH due to the release of a copious amount of OH- in the bulk liquid phase.

Reproducible Patterning of Single Au Nanoparticles on Silicon Substrates by Scanning Probe Oxidation and Self-Assembly

This paper describes a rational approach for reproducibly patterning single Au nanoparticles, 15-20-nm diameter, on silicon wafer substrates. The approach uses scanning probe oxidation (SPO) to pattern silicon oxide nanodomain arrays on silicon substrates modified with octadecyltrimethoxysilane (OTS). It was usually found using aminopropyltrimethoxysilane (APS) that Au nanoparticles only assembled at the domain boundaries probably because of asymmetrically distributed hydroxyl groups. To generate uniformly distributed hydroxyl groups on oxide domains, we employed a two-step treatment to etch and oxidize the substrate. With this treatment, oxide domains consistently attached Au nanoparticles to maximum capacity. Single Au nanoparticles were readily patterned by fabricating oxide nanodomains with a diameter below 30 nm. We also investigated the deposition of APS on OTS monolayers, which resulted in the assembly of Au nanoparticles outside of the oxide domains, and proposed two alternative methods to inhibit it.

Atomic-Resolution Electrochemistry with the Atomic Force Microscope: Copper Deposition on Gold

The atomic force microscope (AFM) was used to image an electrode surface at atomic resolution while the electrode was under potential control in a fluid electrolyte. A new level of subtlety was observed for each step of a complete electrochemical cycle that started with an Au(111) surface onto which bulk Cu was electrodeposited. The Cu was stripped down to an underpotential-deposited monolayer and finally returned to a bare Au(111) surface. The images revealed that the underpotential-deposited monolayer has different structures in different electrolytes. Specifically, for a perchloric acid electrolyte the Cu atoms are in a close-packed lattice with a spacing of 0.29 +/- 0.02 nanometer (nm). For a sulfate electrolyte they are in a more open lattice with a spacing of 0.49 +/- 0.02 nm. As the deposited Cu layer grew thicker, the Cu atoms converged to a (111)-oriented layer with a lattice spacing of 0.26 +/- 0.02 nm for both electrolytes. A terrace pattern was observed during dissolution of bulk Cu. Images were obtained of an atomically resolved Cu monolayer in one region and an atomically resolved Au substrate in another in which a 30 degrees rotation of the Cu monolayer lattice from the Au lattice is clearly visible.