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For: Chatterjee S, Major GH, Lunt BM, Kaykhaii M, Linford MR. Polyallylamine as an Adhesion Promoter for SU-8 Photoresist. Microsc Microanal 2016;22:964-970. [PMID: 27748219 DOI: 10.1017/s1431927616011727] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Number Cited by Other Article(s)
1
Baumli P, Hauer L, Lorusso E, Aghili AS, Hegner KI, D'Acunzi M, Gutmann JS, Dünweg B, Vollmer D. Linear shrinkage of hydrogel coatings exposed to flow: interplay between dissolution of water and advective transport. SOFT MATTER 2022;18:365-371. [PMID: 34889343 DOI: 10.1039/d1sm01297e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
2
Mukherjee P, Nebuloni F, Gao H, Zhou J, Papautsky I. Rapid Prototyping of Soft Lithography Masters for Microfluidic Devices Using Dry Film Photoresist in a Non-Cleanroom Setting. MICROMACHINES 2019;10:E192. [PMID: 30875965 PMCID: PMC6471384 DOI: 10.3390/mi10030192] [Citation(s) in RCA: 33] [Impact Index Per Article: 6.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/12/2019] [Revised: 03/10/2019] [Accepted: 03/11/2019] [Indexed: 01/13/2023]
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