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For: Liu Y, Liu H, Croue JP, Liu C. CuO Promotes the Formation of Halogenated Disinfection Byproducts during Chlorination via an Enhanced Oxidation Pathway. Environ Sci Technol 2023;57:19043-19053. [PMID: 37710978 DOI: 10.1021/acs.est.3c05975] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/16/2023]
Number Cited by Other Article(s)
1
Wang T, Deng L, Tan C, Hu J, Singh RP. Effects of cupric ions on the formation of chlorinated disinfection byproducts from nitrophenol compounds during UV/post-chlorination. JOURNAL OF HAZARDOUS MATERIALS 2024;471:134362. [PMID: 38643576 DOI: 10.1016/j.jhazmat.2024.134362] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 02/29/2024] [Revised: 04/02/2024] [Accepted: 04/18/2024] [Indexed: 04/23/2024]
2
Li G, Tian C, Karanfil T, Liu C. Comparative formation of chlorinated and brominated disinfection byproducts from chlorination and bromination of amino acids. CHEMOSPHERE 2024;349:140985. [PMID: 38104740 DOI: 10.1016/j.chemosphere.2023.140985] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Track Full Text] [Subscribe] [Scholar Register] [Received: 10/03/2023] [Revised: 12/14/2023] [Accepted: 12/14/2023] [Indexed: 12/19/2023]
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