Absorption of Near UV Light by HNO3/NO3(-) on Sapphire Surfaces

Direct Formation of Electronic Excited NO2 Contributes to the High Yield of HONO during Photosensitized Renoxification

Photosensitized renoxification of HNO₃ is found to produce HONO in an unexpectedly high yield, which has been considered an important source for atmospheric HONO. Conventionally, the production of HONO is ascribed to the secondary photolysis of the primarily formed NO₂. In this study, by using humic acid (HA) as a model environmental photosensitizer, we provide evidence of the direct formation of NO₂ in its electronic excited state (NO₂*) as a key intermediate during the photosensitizing renoxification of HNO₃. Moreover, the high HONO yield originates from the heterogeneous reaction of the primarily formed NO₂* with the co-adsorbed water molecules on HA. Such a mechanism is supported by the increase of the product selectivity of HONO with relative humidity. Further luminescence measurements demonstrate clearly the occurrence of an electronic excited state (NO₂*) from photolysis of adsorbed HNO₃ on HA. This work deepens our understanding of the formation of atmospheric HONO and gives insight into the transformation of RNS.

Matrix effect on surface-catalyzed photolysis of nitric acid

Photolysis rate constant of HNO₃ on the surface (HNO_3(s)) has been found to be enhanced by 1–4 orders of magnitude from that of gaseous HNO₃, with HONO and NO₂ as the main products. Such Re-NOx-ification pathway extends the apparent lifetime of reactive nitrogen species and modifies the atmospheric oxidative capacity along its long-rang transport. Despite of its importance, the detailed kinetics and mechanisms of HNO_3(s) photolysis are still not clear. Surface film of HNO₃ and organic compounds is ubiquitous in the environment and imposes matrix effect on HNO_3(s) photolysis. Here we studied photolysis of HNO₃ on Pyrex glass in a photochemical flow reactor over a wide range of HNO₃ surface density (D_HNO3) with or without the presence of model organic compounds. The photolysis rate constant of HNO_3(s) varied with D_HNO3 and surface-catalysis mechanism was proposed. Organic compounds further enhance the photolysis rate constant by up to one order of magnitude via both photosensitization and H-donating reaction. The H-donating reaction enhances as well the secondary HONO yield from reaction between the primary product NO₂ and adjacent H-donor, and thus increases the HONO/NO₂ production ratio. Finally, detailed mechanisms involving surface-catalyisis, photosensitization and H-donating reactions was integrated.

Nitrate Photochemistry at the Air-Ice Interface and in Other Ice Reservoirs

The photolysis of snowpack nitrate (NO₃^-) is an important source of gaseous reactive nitrogen species that affect atmospheric oxidants, particularly in remote regions. However, it is unclear whether nitrate photochemistry differs between the three solute reservoirs in/on ice: in liquid-like regions (LLRs) in the ice; within the solid ice matrix; and in a quasi-liquid layer (QLL) at the air-ice interface, where past work indicates photolysis is enhanced. In this work, we explore the photoformation of nitrite in these reservoirs using laboratory ices. Nitrite quantum yields, Φ(NO₂^-), at 313 nm for aqueous and LLR ice samples agree with previous values, e.g., 0.65 ± 0.07% at -10 °C. For ice samples made via flash-freezing solution in liquid nitrogen, where nitrate is possibly present as a solid solution, the nitrite quantum yield is 0.57 ± 0.05% at -10 °C, similar to the LLR results. In contrast, the quantum yield at the air-ice interface is enhanced by a factor of 3.7 relative to LLRs, with a value of 2.39 ± 0.24%. These results indicate nitrate photolysis is enhanced at the air-ice interface, although the importance of this enhancement in the environment depends on the amount of nitrate present at the interface.

Silanization of Sapphire Surfaces for Optical Sensing Applications

Well-characterized silane layers are essential for optimized attachment of (bio)molecules enabling reliable chem/biosensor performance. Herein, binding properties and orientation of 3-mercaptopropyltrimethoxysilane layers at crystalline sapphire (0001) surfaces were determined by water contact angle measurements, infrared reflection absorption spectroscopy, atomic force microscopy, and X-ray photoelectron spectroscopy. Infrared reflection absorption spectroscopy measurements suggest an almost perpendicular arrangement of the MPTMS molecules to the substrate surface. Adhesion force studies between a silicon nitride AFM tip and modified sapphire, gold, and silicon dioxide substrates were investigated by peak force tapping atomic force microscopy and used to define the silane binding properties on these surfaces. As expected, the Al-O-Si bond was determined to be responsible for the layer formation at the sapphire substrate surface.