1
|
Hafez NS, Amer WA, Okba EA, Sakr MAS, Alganzory HH, Ebeid EZM. Novel ultra-sensitive and highly selective cyanine sensors based on solvent-free microwave synthesis for the detection of trace hypochlorite ions in drinking water. SPECTROCHIMICA ACTA. PART A, MOLECULAR AND BIOMOLECULAR SPECTROSCOPY 2023; 303:123116. [PMID: 37459665 DOI: 10.1016/j.saa.2023.123116] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/11/2023] [Revised: 06/18/2023] [Accepted: 07/06/2023] [Indexed: 09/20/2023]
Abstract
The adoption of chlorine in drinking water disinfection with the determination of residual chlorine in the form of hypochlorite ion (ClO-) is in widespread demand. Several sensors including colorimetric, fluorometric, and electrochemical methods are currently in use, but detection limits and ease of application remain a challenge. In this work, two new cyanine derivatives-based ClO- sensors, that were prepared by solvent-free microwave synthesis, are reported. The two sensors are highly sensitive and selective to ClO-, exhibiting a noticeable color change visible to the naked eye. Additionally, the sensors can detect ClO- without interference from other potential water pollutants, with low detection limits of 7.43 ppb and 0.917 ppb based on absorption performance. When using fluorometric methods, the sensors' detection limits are pushed down to 0.025 ppb and 0.598 ppb for sensors I and II, respectively. The sensors can be loaded with paper strips for field and domestic detection of ClO- in tap water treatment installations. Using the quartz crystal microbalance (QCM) technique, these sensors showed strong detection sensitivity to ClO-, with detection limits of 0.256 ppm and 0.09 ppm for sensors I and II, respectively. Quantum chemical studies using density functional theory (DFT) calculations, natural bond orbital (NBO) analysis, molecular electrostatic potential (MESP), and time-dependent density functional theory (TD-DFT) supported the findings. The sensing mechanism is rationalized in terms of radical cation formation upon ClO- oxidation of cyanine sensors I and II.
Collapse
Affiliation(s)
- Nermeen S Hafez
- Chemistry Department, Faculty of Science, Tanta University, Tanta 31527, Egypt.
| | - Wael A Amer
- Chemistry Department, Faculty of Science, Tanta University, Tanta 31527, Egypt; Department of Chemistry, College of Science, University of Bahrain, Sakhir 32038, Bahrain
| | - Ehab A Okba
- Chemistry Department, Faculty of Science, Tanta University, Tanta 31527, Egypt
| | - Mahmoud A S Sakr
- Center of Basic Science, Misr University for Science and Technology, 6(TH) of October City, Egypt
| | | | - El-Zeiny M Ebeid
- Chemistry Department, Faculty of Science, Tanta University, Tanta 31527, Egypt; Center of Basic Science, Misr University for Science and Technology, 6(TH) of October City, Egypt
| |
Collapse
|
2
|
Hanzawa M, Ogura T, Akamatsu M, Sakai K, Sakai H. Enhanced Removal of Photoresist Films through Swelling and Dewetting Using Pluronic Surfactants. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2023; 39:14670-14679. [PMID: 37797199 PMCID: PMC10586462 DOI: 10.1021/acs.langmuir.3c02034] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/19/2023] [Revised: 09/13/2023] [Indexed: 10/07/2023]
Abstract
Organic photoresist coatings, primarily composed of resins, are commonly used in the electronics industry to protect inorganic underlayers. Conventional photoresist strippers, such as amine-type agents, have shown high removal performance but led to environmental impact and substrate corrosiveness. Therefore, this trade-off must be addressed. In this study, we characterized the removal mechanism of a photoresist film using a nonionic triblock Pluronic surfactant [poly(ethylene oxide)-poly(propylene oxide)-poly(ethylene oxide)] in a ternary mixture of ethylene carbonate (EC), propylene carbonate (PC), and water. In particular, the removal dynamics determined by using a quartz crystal microbalance with dissipation monitoring was compared with those determined by performing confocal laser scanning microscopy and visual observation to analyze the morphology, adsorption mass, and viscoelasticity of the photoresist film. In the absence of the Pluronic surfactant, the photoresist film in the ternary solvent exhibited a three-step process: (i) film swelling caused by the penetration of a good solvent (EC and PC), (ii) formation of photoresist particles through dewetting, and (iii) particle aggregation on the substrate. This result was correlated to the Hansen solubility parameters. The addition of the Pluronic surfactant not only prevented photoresist aggregation in the third step but also promoted desorption from the substrate. This effect was dependent on the concentration of the Pluronic surfactant, which influenced diffusion to the interface between the photoresist and the bulk solution. Finally, we proposed a novel photoresist stripping mechanism based on the synergy between dewetting driven by an EC/PC-to-water mixture and adsorption by the Pluronic surfactant.
Collapse
Affiliation(s)
- Masaki Hanzawa
- NIKKOL
GROUP Nikko Chemicals Co., Ltd., 3-24-3 Hasune, Itabashi, Tokyo 174-0046, Japan
| | - Taku Ogura
- NIKKOL
GROUP Nikko Chemicals Co., Ltd., 3-24-3 Hasune, Itabashi, Tokyo 174-0046, Japan
- Research
Institute for Science and Technology, Tokyo
University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
| | - Masaaki Akamatsu
- Research
Institute for Science and Technology, Tokyo
University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
- Department
of Chemistry and Biotechnology, Faculty of Engineering, Tottori University, 4-101 Koyama-Minami, Tottori 680-8552, Japan
| | - Kenichi Sakai
- Research
Institute for Science and Technology, Tokyo
University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
- Department
of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
| | - Hideki Sakai
- Research
Institute for Science and Technology, Tokyo
University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
- Department
of Pure and Applied Chemistry, Faculty of Science and Technology, Tokyo University of Science, 2641 Yamazaki, Noda, Chiba 278-8510, Japan
| |
Collapse
|
3
|
Takeuchi A, Heah WY, Yamamoto Y, Yamagishi H. Degradable optical resonators as in situ microprobes for microscopy-based observation of enzymatic hydrolysis. Chem Commun (Camb) 2023; 59:1477-1480. [PMID: 36651843 DOI: 10.1039/d2cc05597j] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 01/15/2023]
Abstract
Optical resonators work as precise physical and chemical sensors. Here, we assemble a whispering gallery mode resonator from a natural polymer, fibroin protein, and successfully observe its catalytic degradation reaction as a spectral shift. This methodology will contribute to the precise in situ observation of biological reactions by optical microscopy.
Collapse
Affiliation(s)
- Akihide Takeuchi
- Department of Materials Science, Institute of Pure and Applied Sciences, and Tsukuba Research Center for Energy Materials Science (TREMS), University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan.
| | - Wey Yih Heah
- Department of Materials Science, Institute of Pure and Applied Sciences, and Tsukuba Research Center for Energy Materials Science (TREMS), University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan.
| | - Yohei Yamamoto
- Department of Materials Science, Institute of Pure and Applied Sciences, and Tsukuba Research Center for Energy Materials Science (TREMS), University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan.
| | - Hiroshi Yamagishi
- Department of Materials Science, Institute of Pure and Applied Sciences, and Tsukuba Research Center for Energy Materials Science (TREMS), University of Tsukuba, 1-1-1 Tennodai, Tsukuba, Ibaraki 305-8573, Japan.
| |
Collapse
|