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For: Gervasio M, Lu K, Davis R. Experimental and Modeling Study of Solvent Diffusion in PDMS for Nanoparticle-Polymer Cosuspension Imprint Lithography. Langmuir 2015;31:9809-9816. [PMID: 26299401 DOI: 10.1021/acs.langmuir.5b02617] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.1] [Reference Citation Analysis] [What about the content of this article? (0)] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/04/2023]
Number Cited by Other Article(s)
1
Gervasio M, Lu K. Sub-micron features from polymer-derived SiOC via imprint lithography. Ann Ital Chir 2019. [DOI: 10.1016/j.jeurceramsoc.2019.01.001] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.2] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 10/27/2022]
2
Gervasio M, Lu K. Monte Carlo Simulation Modeling of Nanoparticle-Polymer Cosuspensions. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2019;35:161-170. [PMID: 30525657 DOI: 10.1021/acs.langmuir.8b03128] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
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