Nanotribological Properties of ALD-Made Ultrathin MoS2 Influenced by Film Thickness and Scanning Velocity

Tribology of Copper Metal Matrix Composites Reinforced with Fluorinated Graphene Oxide Nanosheets: Implications for Solid Lubricants in Mechanical Switches

The potential for the use of copper coatings on steel switching mechanisms is abundant owing to the high conductivities and corrosion resistance that they impart on the engineered assemblies. However, applications of these coatings on such moving parts are limited due to their poor tribological properties; tendencies to generate high friction and susceptibility to degradative wear. In this study, we have fabricated a fluorinated graphene oxide-copper metal matrix composite (FGO-CMMC) on an AISI 52100 bearing steel substrate by a simple electrodeposition process in water. The FGO-CMMC coatings exhibited excellent lubrication performance under pin-on-disk (PoD) tribological sliding at 1N load, which reduced CoF by 63 and 69%, compared to the GO-CMMC and pure copper coatings that were also prepared. Furthermore, FGO-CMMC achieved low friction and low wear at higher sliding loads. The lubrication enhancement of the FGO-CMMCs is attributed to the tribochemical reaction of FGO with the AISI 52100 steel counterface initiated by the sliding load. The formation of an asymmetric tribofilm structure on the sliding track is critical; the performance of the FGO/Cu tribofilm formed in the track is boosted by the continued fluorination of the counterface surface during PoD sliding, passivating the tribosystem from adhesion-driven breakdown. The FGO-CMMC and GO-CMMC coatings also provide increased corrosion protection reaching 94.2 and 91.6% compared to the bare steel substrate, allowing for the preservation of the long-term low-friction performance of the coating. Other influences include the improved interlaminar shear strength of the FGO-containing composite. The excellent lubrication performance of the copper matrix composite coatings facilitated by FGO incorporation makes it a promising solid lubricant candidate for use in mechanical engineering applications.

Self-Assembly of MoS2 Monolayer Sheets by Desulfurization

Self-assembled structures of two-dimensional (2D) materials exhibit novel physical properties distinct from those of their parent materials. Herein, the critical role of desulfurization on the self-assembled structural morphologies of molybdenum disulfide (MoS₂) monolayer sheets is explored using molecular dynamics (MD) simulations. MD results show that there are differences in the atomic energetics of MoS₂ monolayer sheets with different desulfurization contents. Both free-standing and substrate-hosted MoS₂ monolayer sheets show diversity in structural morphologies, for example, flat plane structures, wrinkles, nanotubes, and folds, depending on the desulfurization contents, planar dimensions, and ratios of length to width of MoS₂ sheets. Particularly, at the critical desulfurization content, they can roll up into nanotubes, which is in good agreement with previous experimental observations. Importantly, these observed differences in the molecular structural morphologies between free-standing and substrate-hosted MoS₂ monolayer sheets can be attributed to interatomic interactions and interlayer van der Waals interactions. Furthermore, MD results have demonstrated that the surface-driven stability of MoS₂ structures can be indicated by the desulfurization contents on one surface of MoS₂ monolayer sheets, and the self-assembly of MoS₂ monolayer sheets by desulfurization can emerge to adjust their surface-driven stability. The study provides important atomic insights into tuning the self-assembling structural morphologies of 2D materials through defect engineering in the future science and engineering applications.

Plasma-assisted friction control of 2D MoS2 made by atomic layer deposition

MoS₂ films as an excellent solid lubricating film can significantly decrease the friction and adhesion of nanoelectromechanical systems. Atomic layer deposition (ALD) as a surface-controlled method provides a flexible way to apply MoS₂ to complex surfaces. In this work, MoS₂ film deposited by ALD on substrates by a plasma-assisted process is used to study controlled friction. Firstly, layer-controlled MoS₂ films were fabricated by ALD from one to five layers. The friction decreases as the number of layers increases. Furthermore, the average friction force of MoS₂ deposited on Al₂O₃ substrates treated by plasma for 10 s with one ALD cycle has the lowest value. Functional groups on the substrate surface can be obtained by plasma treatment, which can control the growth of the first layer of MoS₂ in ALD so that the frictional characteristics of monolayer MoS₂ can be controlled. Finally, the effect of plasma treatment on ALD growth at the intermediate stage of MoS₂ is relatively weak. Only the monolayer MoS₂ treated by plasma can affect the growth of MoS₂ by ALD. Therefore, the controlling effect of plasma treatment on the frictional characteristics of MoS₂ deposited by ALD mainly occurs at the initial stage of growth.

Ultrathin Quasibinary Heterojunctioned ReS2/MoS2 Film with Controlled Adhesion from a Bimetallic Co-Feeding Atomic Layer Deposition

Heterojunctioned transition-metal dichalcogenide (TMD) films with regulatable interface adhesion have shown broad application prospects in the design of advanced materials and the manufacturing of novel functional devices. To date, the controlled fabrication of TMD heterojunctions or heterojunction-rich films with tailorable thickness and composition has proved challenging. Herein, a bimetallic co-feeding atomic layer deposition (ALD) system was developed capable of fulfilling these requirements. In the co-feeding ALD fabrication, by adjusting the Re/Mo ratio, 3-layered quasibinary heterojunctioned ReS₂/MoS₂ films with adjustable composition and grain size were prepared. Moreover, the measurements between atomic force microscopy Si tip coated with the ReS₂/MoS₂ films and films on the substrate indicate that the adhesion force can be regulated from 13.5 to 136.3 nN. Further experimental data and theoretical analysis show that the adhesion force between the coated tip and films possesses a positive correlation with the "tip-film unanimity" in composition.

A Novel Biosensor Based on Molybdenum Disulfide (MoS2 ) Modified Porous Anodic Aluminum Oxide Nanochannels for Ultrasensitive microRNA-155 Detection

Artificial photoresponsive nanochannels have attracted widespread attention because of their capacity to achieve ion transport through light modulation. Herein, a biosensor for ultrasensitive miRNA-155 detection is devised based on molybdenum disulfide (MoS₂ ) modified porous anodic aluminum oxide (AAO) photoresponsive nanochannels by atomic layer deposition (ALD). According to the optimized experimental results, when the cycles of ALD, the wavelength, and the power of the excitation laser are 70 cycles, 450 nm, and 80 mW, respectively, the most supreme photocurrent performance of these photoresponsive nanochannels are obtained. AAO nanochannels modified with MoS₂ can work as a photoelectrochemical (PEC) biosensor by generating photoexcitation current; what is more, the high channel density in AAO can magnify the ion current signal response effectively by aggrandizing the flux of electroactive species. By using AAO photoresponsive nanochannels with an average diameter of 150 nm as PEC biosensor, an ultrasensitive detection record ranging from 0.01 fM to 0.01 nM with a detection limit of 3 aM can be achieved. This work not only proposes a simple method for manufacturing semiconductor photoresponsive nanochannels, but also exhibits great potential in the ultrasensitive detection of biomolecules.