Solvent-Mediated Affinity of Polymer-Wrapped Single-Walled Carbon Nanotubes for Chemically Modified Surfaces

Parameters Affecting Interfacial Assembly and Alignment of Nanotubes

Tangential flow interfacial self-assembly (TaFISA) is a promising scalable technique enabling uniformly aligned carbon nanotubes for high-performance semiconductor electronics. In this process, flow is utilized to induce global alignment in two-dimensional nematic carbon nanotube assemblies trapped at a liquid/liquid interface, and these assemblies are subsequently deposited on target substrates. Here, we present an observational study of experimental parameters that affect the interfacial assembly and subsequent aligned nanotube deposition. We specifically study the water contact angle (WCA) of the substrate, nanotube ink composition, and water subphase and examine their effects on liquid crystal defects, overall and local alignment, and nanotube bunching or crowding. By varying the substrate chemical functionalization, we determine that highly aligned, densely packed, individualized nanotubes deposit only at relatively small WCA between 35 and 65°. At WCA (< 10°), high nanotube bunching or crowding occurs, and the film is nonuniform, while aligned deposition ceases to occur at higher WCA (>65°). We find that the best alignment, with minimal liquid crystal defects, occurs when the polymer-wrapped nanotubes are dispersed in chloroform at a low (0.6:1) wrapper polymer to nanotube ratio. We also demonstrate that modifying the water subphase through the addition of glycerol not only improves overall alignment and reduces liquid crystal defects but also increases local nanotube bunching. These observations provide important guidance for the implementation of TaFISA and its use toward creating technologies based on aligned semiconducting carbon nanotubes.

High-Strength Epoxy Nanocomposites Reinforced with Photochemically Treated CNTs

A carbon nanotube (CNT)/epoxy nanocomposite was prepared using a photochemical surface modification process of CNTs. The vacuum ultraviolet (VUV)-excimer lamp treatment created reactive sites on the CNT surface. Increasing the irradiation time increased the oxygen functional groups and changed the oxygen bonding state such as C=O, C-O, and -COOH. By the VUV-excimer irradiation on CNTs, the epoxy infiltrated well between the CNT bundles and formed a strong chemical bond between CNT and epoxy. The tensile strength and elastic modulus of the nanocomposites with VUV-excimer irradiated sample during 30 min (R30) were found to increase by 30 and 68% compared to using pristine CNT, respectively. R30 was not pulled out and remained embedded in the matrix until the fracture occurred. The VUV-excimer irradiation is an effective surface modification and functionalization method for improving the mechanical properties of CNT nanocomposite materials.

Controlled Preparation of Single-Walled Carbon Nanotubes as Materials for Electronics

Single-walled carbon nanotubes (SWCNTs) are of particular interest as channel materials for field-effect transistors due to their unique structure and excellent properties. The controlled preparation of SWCNTs that meet the requirement of semiconducting and chiral purity, high density, and good alignment for high-performance electronics has become a key challenge in this field. In this Outlook, we outline the efforts in the preparation of SWCNTs for electronics from three main aspects, structure-controlled growth, selective sorting, and solution assembly, and discuss the remaining challenges and opportunities. We expect that this Outlook can provide some ideas for addressing the existing challenges and inspire the development of SWCNT-based high-performance electronics.

A simple simulation-derived descriptor for the deposition of polymer-wrapped carbon nanotubes on functionalized substrates

Controlling the deposition of polymer-wrapped single-walled carbon nanotubes (s-CNTs) onto functionalized substrates can enable the fabrication of s-CNT arrays for semiconductor devices. In this work, we utilize classical atomistic molecular dynamics (MD) simulations to show that a simple descriptor of solvent structure near silica substrates functionalized by a wide variety of self-assembled monolayers (SAMs) can predict trends in the deposition of s-CNTs from toluene. Free energy calculations and experiments indicate that those SAMs that lead to maximum disruption of solvent structure promote deposition to the greatest extent. These findings are consistent with deposition being driven by solvent-mediated interactions that arise from SAM-solvent interactions, rather than direct s-CNT-SAM interactions, and will permit the rapid computational exploration of potential substrate designs for controlling s-CNT deposition and alignment.

Chemical and topographical patterns combined with solution shear for selective-area deposition of highly-aligned semiconducting carbon nanotubes

Selective deposition of semiconducting carbon nanotubes (s-CNTs) into densely packed, aligned arrays of individualized s-CNTs is necessary to realize their potential in semiconductor electronics. We report the combination of chemical contrast patterns, topography, and pre-alignment of s-CNTs via shear to achieve selective-area deposition of aligned arrays of s-CNTs. Alternate stripes of surfaces favorable and unfavorable to s-CNT adsorption were patterned with widths varying from 2000 nm down to 100 nm. Addition of topography to the chemical contrast patterns combined with shear enabled the selective-area deposition of arrays of quasi-aligned s-CNTs (∼14°) even in patterns that are wider than the length of individual nanotubes (>500 nm). When the width of the chemical and topographical contrast patterns is less than the length of individual nanotubes (<500 nm), confinement effects become dominant enabling the selective-area deposition of much more tightly aligned s-CNTs (∼7°). At a trench width of 100 nm, we demonstrate the lowest standard deviation in alignment degree of 7.6 ± 0.3° at a deposition shear rate of 4600 s^-1, while maintaining an individualized s-CNT density greater than 30 CNTs μm^-1. Chemical contrast alone enables selective-area deposition, but chemical contrast in addition to topography enables more effective selective-area deposition and stronger confinement effects, with the advantage of removal of nanotubes deposited in spurious areas via selective lift-off of the topographical features. These findings provide a methodology that is inherently scalable, and a means to deposit spatially selective, aligned s-CNT arrays for next-generation semiconducting devices.