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Maekawa S, Seshimo T, Dazai T, Sato K, Hatakeyama-Sato K, Nabae Y, Hayakawa T. Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly. Nat Commun 2024; 15:5671. [PMID: 38971785 PMCID: PMC11227500 DOI: 10.1038/s41467-024-49839-0] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 08/31/2023] [Accepted: 06/19/2024] [Indexed: 07/08/2024] Open
Abstract
While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the creation of a chemically tailored, highly reliable, and practically applicable block copolymer and sub-10-nm line patterns by directed self-assembly. Polystyrene-block-[poly(glycidyl methacrylate)-random-poly(methyl methacrylate)] (PS-b-(PGMA-r-PMMA) or PS-b-PGM), which is based on PS-b-PMMA with an appropriate amount of introduced PGMA (10-33 mol%) is quantitatively post-functionalized with thiols. The use of 2,2,2-trifluoroethanethiol leads to polymers (PS-b-PGFMs) with Flory-Huggins interaction parameters (χ) that are 3.5-4.6-times higher than that of PS-b-PMMA and well-defined higher-order structures with domain spacings of less than 20 nm. This study leads to the smallest perpendicular lamellar domain size of 12.3 nm. Furthermore, thin-film lamellar domain alignment and vertical orientation are highly reliably and reproducibly obtained by directed self-assembly to yield line patterns that correspond to a 7.6 nm half-pitch size.
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Affiliation(s)
- Shinsuke Maekawa
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Takehiro Seshimo
- Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan
| | - Takahiro Dazai
- Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan
| | - Kazufumi Sato
- Research & Development Department, Tokyo Ohka Kogyo Co., Ltd., Kanagawa, 253-0114, Japan
| | - Kan Hatakeyama-Sato
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Yuta Nabae
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan
| | - Teruaki Hayakawa
- Department of Materials Science and Engineering, School of Materials and Chemical Technology, Tokyo Institute of Technology, Tokyo, 152-8552, Japan.
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Wang M, Xue T, Miao H, Wu W, Zhang Z, Han M, Liu X, Li X. High χ P2PFBEMA- b-P2VP Block Copolymers Forming 6-8 nm Domains for Semiconductor Lithography. ACS APPLIED MATERIALS & INTERFACES 2024; 16:31586-31596. [PMID: 38837344 DOI: 10.1021/acsami.4c05301] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/07/2024]
Abstract
We leveraged the potential of high χ-low N block copolymer (BCP), namely, poly[2-(perfluorobutyl) ethyl methacrylate]-block-poly(2-vinylpyridine) (P2PFBEMA-b-P2VP), and demonstrated its utility in next-generation nanomanufacturing. By combining molecular dynamics simulations with experiments, the χ value was calculated to be as high as 0.4 (at 150 °C), surpassing similar structures. Highly ordered features suitable for application were observed, ranging in periods from 19.0 nm down to 12.1 nm, with feature sizes as small as 6 nm. Transmission electron microscopy images of the BCP solutions indicated that preformed micelles in the solution facilitated the self-assembly process of the thin film. In addition, the vertical or parallel orientation of the cylindrical structure was determined by manipulating the solvent, substrate, and annealing conditions. Finally, guided by a wide topographical template, nearly defect-free directed self-assembly (DSA) lines with a resolution of 8 nm were achieved, highlighting its potential practical application in DSA lithography technology.
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Affiliation(s)
- Mengge Wang
- Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Tao Xue
- Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Han Miao
- Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Wanqing Wu
- Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Zhipeng Zhang
- Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
| | - Muzi Han
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Xianhe Liu
- School of Microelectronics, Fudan University, Shanghai 200433, China
| | - Xinxin Li
- Key Laboratory of Specially Functional Polymeric Materials and Related Technology (Ministry of Education), School of Materials Science and Engineering, East China University of Science and Technology, Shanghai 200237, China
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Angelopoulou PP, Moutsios I, Manesi GM, Ivanov DA, Sakellariou G, Avgeropoulos A. Designing high χ copolymer materials for nanotechnology applications: A systematic bulk vs. thin films approach. Prog Polym Sci 2022. [DOI: 10.1016/j.progpolymsci.2022.101625] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/19/2022]
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Lai H, Zhang X, Huang G, Liu Y, Li W, Ji S. Directed self-assembly of poly(styrene-b-vinyl acetate) block copolymers on chemical patterns for sub-10 nm nanopatterning via thermal annealing. POLYMER 2022. [DOI: 10.1016/j.polymer.2022.125277] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
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Seguini G, Motta A, Bigatti M, Caligiore FE, Rademaker G, Gharbi A, Tiron R, Tallarida G, Perego M, Cianci E. Al 2O 3 Dot and Antidot Array Synthesis in Hexagonally Packed Poly(styrene- block-methyl methacrylate) Nanometer-Thick Films for Nanostructure Fabrication. ACS APPLIED NANO MATERIALS 2022; 5:9818-9828. [PMID: 35937588 PMCID: PMC9344376 DOI: 10.1021/acsanm.2c02013] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/12/2023]
Abstract
Nanostructured organic templates originating from self-assembled block copolymers (BCPs) can be converted into inorganic nanostructures by sequential infiltration synthesis (SIS). This capability is particularly relevant within the framework of advanced lithographic applications because of the exploitation of the BCP-based nanostructures as hard masks. In this work, Al2O3 dot and antidot arrays were synthesized by sequential infiltration of trimethylaluminum and water precursors into perpendicularly oriented cylinder-forming poly(styrene-block-methyl methacrylate) (PS-b-PMMA) BCP thin films. The mechanism governing the effective incorporation of Al2O3 into the PMMA component of the BCP thin films was investigated evaluating the evolution of the lateral and vertical dimensions of Al2O3 dot and antidot arrays as a function of the SIS cycle number. The not-reactive PS component and the PS/PMMA interface in self-assembled PS-b-PMMA thin films result in additional paths for diffusion and supplementary surfaces for sorption of precursor molecules, respectively. Thus, the mass uptake of Al2O3 into the PMMA block of self-assembled PS-b-PMMA thin films is higher than that in pure PMMA thin films.
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Affiliation(s)
- Gabriele Seguini
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Alessia Motta
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Marco Bigatti
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | | | | | - Ahmed Gharbi
- Univ.
Grenoble Alpes, CEA, Leti, Grenoble F-38000, France
| | - Raluca Tiron
- Univ.
Grenoble Alpes, CEA, Leti, Grenoble F-38000, France
| | - Graziella Tallarida
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Michele Perego
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
| | - Elena Cianci
- IMM-CNR,
Unit of Agrate Brianza, Via C. Olivetti 2, Agrate Brianza I-20864, Italy
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Venetsanos F, Anogiannakis SD, Theodorou DN. Mixing Thermodynamics and Flory–Huggins Interaction Parameter of Polyethylene Oxide/Polyethylene Oligomeric Blends from Kirkwood–Buff Theory and Molecular Simulations. Macromolecules 2022. [DOI: 10.1021/acs.macromol.2c00642] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Affiliation(s)
- Fotis Venetsanos
- School of Chemical Engineering, National Technical University of Athens, 9 Heroon Polytechniou Street, Athens 15780, Greece
| | - Stefanos D. Anogiannakis
- School of Chemical Engineering, National Technical University of Athens, 9 Heroon Polytechniou Street, Athens 15780, Greece
| | - Doros N. Theodorou
- School of Chemical Engineering, National Technical University of Athens, 9 Heroon Polytechniou Street, Athens 15780, Greece
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Cummins C, Alvarez-Fernandez A, Bentaleb A, Hadziioannou G, Ponsinet V, Fleury G. Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm). LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2020; 36:13872-13880. [PMID: 33175555 DOI: 10.1021/acs.langmuir.0c02261] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
Assembling ultrahigh-molecular-weight (UHMW) block copolymers (BCPs) in rapid time scales is perceived as a grand challenge in polymer science due to slow kinetics. Through surface engineering and identifying a nonvolatile solvent (propylene glycol methyl ether acetate, PGMEA), we showcase the impressive ability of a series of lamellar poly(styrene)-block-poly(2-vinylpyridine) (PS-b-P2VP) BCPs to self-assemble directly after spin-coating. In particular, we show the formation of large-period (≈111 nm) lamellar structures from a neat UHMW PS-b-P2VP BCP. The significant influence of solvent-polymer solubility parameters are explored to enhance the polymer chain mobility. After optimization using solvent vapor annealing, increased feature order of ultralarge-period PS-b-P2VP BCP patterns in 1 h is achieved. Isolated metallic and dielectric features are also demonstrated to exemplify the promise that large BCP periods offer for functional applications. The methods described in this article center on industry-compatible patterning schemes, solvents, and deposition techniques. Thus, our straightforward UHMW BCP strategy potentially paves a viable and practical path forward for large-scale integration in various sectors, e.g., photonic band gaps, polarizers, and membranes that demand ultralarge period sizes.
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Affiliation(s)
- Cian Cummins
- CNRS, Univ. Bordeaux, Centre de Recherche Paul Pascal, UMR 5031, 115 Avenue Schweitzer, 33600 Pessac, France
- Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
| | - Alberto Alvarez-Fernandez
- Department of Chemical Engineering, University College London, Torrington Place, London WC1E 7JE, U.K
| | - Ahmed Bentaleb
- CNRS, Univ. Bordeaux, Centre de Recherche Paul Pascal, UMR 5031, 115 Avenue Schweitzer, 33600 Pessac, France
| | | | - Virginie Ponsinet
- CNRS, Univ. Bordeaux, Centre de Recherche Paul Pascal, UMR 5031, 115 Avenue Schweitzer, 33600 Pessac, France
| | - Guillaume Fleury
- Univ. Bordeaux, CNRS, Bordeaux INP, LCPO, UMR 5629, F-33600 Pessac, France
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