Hierarchical Structures with Double Lower Disorder-to-Order Transition and Closed-Loop Phase Behaviors in Charged Block Copolymers Bearing Long Alkyl Side Groups

Self-Assembly of Hierarchical Silicon-Containing Block Copolymers with Cross-Linkable 3 nm Smectic Motifs for Nanopatterning and Osmotic Energy Conversion Membranes

Highly-dense small-feature-size nanopatterns and nanoporous membranes are important in advanced microelectronics, nanofiltration, and biomimic device manufacturing. Here, we report the synthesis and self-assembly of a series of high-interaction-parameter (high-χ) silicon-containing hierarchical block copolymers (BCPs) with cross-linkable subordering chalcone motifs, which possess both an intrinsic native etching contrast for nanofabrication and cross-linkability under ultraviolet light for generating free-standing membranes. BCPs with a volume fraction of chalcone block of 55-74% form ordered primary nanostructures with period 15-22 nm including lamellae, double gyroid, hexagonally packed cylinders, and body-centered cubic spheres of the minority Si-containing block. The majority PChMA block self-assembles into a highly ordered 3 nm smectic sublattice, and cross-linking after self-assembly enables the formation of free-standing isoporous membranes. Both silicon oxide nanopatterns and free-standing nanoporous osmotic energy conversion membranes are generated by etching films of these BCPs. This work demonstrates that the combination of hierarchical ordering and cross-linkable motifs in a high-interaction parameter BCP enables applications in both nanofabrication and free-standing functional porous membranes.

Hierarchically engineered nanostructures from compositionally anisotropic molecular building blocks

The inability to synthesize hierarchical structures with independently tailored nanoscale and mesoscale features limits the discovery of next-generation multifunctional materials. Here we present a predictable molecular self-assembly strategy to craft nanostructured materials with a variety of phase-in-phase hierarchical morphologies. The compositionally anisotropic building blocks employed in the assembly process are formed by multicomponent graft block copolymers containing sequence-defined side chains. The judicious design of various structural parameters in the graft block copolymers enables broadly tunable compositions, morphologies and lattice parameters across the nanoscale and mesoscale in the assembled structures. Our strategy introduces advanced design principles for the efficient creation of complex hierarchical structures and provides a facile synthetic platform to access nanomaterials with multiple precisely integrated functionalities.

Thickness-Dependent Photo-Aligned Thin-Film Morphologies of a Block Copolymer Containing an Azobenzene-Based Liquid Crystalline Polymer and a Poly(ionic liquid)

Photo-induced alignment of the thin-film morphologies of azobenzene-containing block copolymers (BCPs) is an effective method to obtain a uniaxial pattern of nanocylinders. Although film thickness is an important factor affecting the self-assembly of BCP thin films, the influence of film thickness on the photo-induced alignment of BCP thin-film morphology has never been systematically studied. Herein, we report the thickness-dependent photo-aligned film morphologies of the BCP containing an azobenzene-based liquid crystalline polymer and a poly(ionic liquid) (PIL), with a perfect uniaxial pattern of PIL nanocylinders. For films aligned with the unpolarized light (UPL), the out-of-plane PIL nanocylinders can be obtained in the film with a thickness of only 1L0 (∼30 nm, where L0 is the layer spacing of the hexagonally packed cylinder array), which is far lower than the thickness (more than 4L0) of the thermally annealed film needed to obtain the same morphology. This change is attributed to the orientation effect of UPL on azobenzene mesogens that suppresses the excluded volume effect. For the films aligned with linearly polarized light (LPL), to take advantage of the excluded volume effect to obtain the planar orientation of azobenzene mesogens, the thickness should be controlled to be no more than 3L0 to achieve an in-plane uniaxial alignment of PIL nanocylinders. The above relationship between the morphology and thickness of photo-aligned film eliminates the obstacles encountered in preparing films with well-ordered photo-aligned morphologies.