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Yeo J, Woo J, Choi S, Kwon K, Lee JK, Kim M. Comprehensive studies of continuous flow reversible addition–fragmentation chain transfer copolymerization and its application for photoimaging materials. Polym Chem 2022. [DOI: 10.1039/d2py00542e] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/25/2022]
Abstract
Thorough studies of RAFT copolymerization in a continuous flow to gain deeper insights into kinetics, reactivity, and applicability were conducted with monomers and solvents utilizable for chemically amplified resist systems.
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Affiliation(s)
- Jiyeong Yeo
- Department of Chemistry and Chemical Engineering, Inha University, Incheon 22212, Republic of Korea
| | - Jihoon Woo
- Program in Environment and Polymer Engineering, Inha University, Incheon 22212, Republic of Korea
| | - Seungyeon Choi
- Department of Chemistry and Chemical Engineering, Inha University, Incheon 22212, Republic of Korea
| | - Kiyoung Kwon
- Program in Environment and Polymer Engineering, Inha University, Incheon 22212, Republic of Korea
| | - Jin-Kyun Lee
- Program in Environment and Polymer Engineering, Inha University, Incheon 22212, Republic of Korea
- Department of Polymer Science and Engineering, Inha University, Incheon 22212, Republic of Korea
| | - Myungwoong Kim
- Department of Chemistry and Chemical Engineering, Inha University, Incheon 22212, Republic of Korea
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Synthesis of 4-acetoxystyrene – t-butyl acrylate statistical, block and gradient copolymers, and the effect of the structure of copolymers on their properties. Eur Polym J 2020. [DOI: 10.1016/j.eurpolymj.2020.109772] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/18/2022]
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Zheng X, Ji C, Liu J, Liu R, Mu Q, Liu X. Novel Star Polymers as Chemically Amplified Positive-Tone Photoresists for KrF Lithography Applications. Ind Eng Chem Res 2018. [DOI: 10.1021/acs.iecr.7b05335] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/30/2022]
Affiliation(s)
- Xiangfei Zheng
- The Key Laboratory of Synthetic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, No. 1800 Lihu Avenue, Wuxi, China
| | - Changwei Ji
- The Key Laboratory of Synthetic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, No. 1800 Lihu Avenue, Wuxi, China
| | - Jingcheng Liu
- The Key Laboratory of Synthetic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, No. 1800 Lihu Avenue, Wuxi, China
| | - Ren Liu
- The Key Laboratory of Synthetic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, No. 1800 Lihu Avenue, Wuxi, China
| | - Qidao Mu
- Suzhou Rui Hong
Electronic Chemicals Co., Ltd., No. 501 Minfeng Road, Suzhou, China
| | - Xiaoya Liu
- The Key Laboratory of Synthetic and Biological Colloids, Ministry of Education and School of Chemical and Material Engineering, Jiangnan University, No. 1800 Lihu Avenue, Wuxi, China
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Li H, Liu J, Zheng X, Ji C, Mu Q, Liu R, Liu X. Synthesis of chemically amplified photoresist polymer containing four (Meth)acrylate monomers via RAFT polymerization and its application for KrF lithography. JOURNAL OF POLYMER RESEARCH 2016. [DOI: 10.1007/s10965-016-0996-3] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/25/2022]
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