Shear-Aligned Block Copolymer Monolayers as Seeds To Control the Orientational Order in Cylinder-Forming Block Copolymer Thin Films

Competitive Registration Fields for The Development of Complex Block Copolymer Structures by A Layer-by-Layer Approach

Block copolymer (BCP) self-assembly in thin films is an elegant method to generate nanometric features with tunable geometrical configurations. By combining directed assembly and hybridization methods, advances in nano-manufacturing have been attested over the past decades with flagship applications in lithography and optics. Nevertheless, the range of geometrical configurations is limited by the accessible morphologies inherent to the energy minimization process involved in BCP self-assembly. Layering of nanostructured BCP thin films has been recently proposed in order to enrich the span of nanostructures derived from BCP self-assembly with the formation of non-native heterostructures such as double-layered arrays of nanowires or dots-on-line and dots-in-hole hierarchical structures. In this work, the layer-by-layer method is further exploited for the generation of nano-mesh arrays using nanostructured BCP thin films. In particular, a subtle combination of chemical and topographical fields is leveraged in order to demonstrate design rules for the controlled registration of a BCP layer on top of an underneath immobilized one by the precise tuning of the interfacial chemical field between the two BCP layers.

Solvent-assisted self-assembly of block copolymer thin films

Solvent-assisted block copolymer self-assembly is a compelling method for processing and advancing practical applications of these materials due to the exceptional level of the control of BCP morphology and significant acceleration of ordering kinetics. Despite substantial experimental and theoretical efforts devoted to understanding of solvent-assisted BCP film ordering, the development of a universal BCP patterning protocol remains elusive; possibly due to a multitude of factors which dictate the self-assembly scenario. The aim of this review is to aggregate both seminal reports and the latest progress in solvent-assisted directed self-assembly and to provide the reader with theoretical background, including the outline of BCP ordering thermodynamics and kinetics phenomena. We also indicate significant BCP research areas and emerging high-tech applications where solvent-assisted processing might play a dominant role.

Shear-induced transitions in colloidal and polymeric liquids

This review reflects different aspects of wide current studies of the phenomena related to the shear-induced structure transformation in various complex liquids. Experimental data, being the basis of this discussion, were obtained for polymeric liquids (melts, blends, solutions) and different dispersions (colloidal solutions, suspensions, emulsions). The general initial input of shearing is the creation of inhomogeneities which can continue to remain as separate domains, become the nuclei of new phases, or become diffuse, leading to phase separation. The following effects are discussed: diffusion-induced phase separation, phase transitions occurring mainly due to the deformation-driven orientation of polymer chains and worm-like micelles that results in the formation of a liquid-crystal state, as well as self-assembly effects. It can be stressed that the appearance of regular structures takes place in systems that can coexist in different concentrations or phase states at the same stress or shear rate. This is linked with the existence of two-value points on flow curves (part of a flow curve with negative slope) or transient regimes of deformation that lead to instability of the flow. The described experimental facts are briefly discussed on the basis of the application of different constitutive molecular or phenomenological rheological models.

Nanoscratch-Directed Self-Assembly of Block Copolymer Thin Films

Directed self-assembly (DSA) of block copolymer (BCP) thin films is of particular interest in nanoscience and nanotechnology due to its superior ability to form various well-aligned nanopatterns. Herein, nanoscratch-DSA is introduced as a simple and scalable DSA strategy allowing highly aligned BCP nanopatterns over a large area. A gentle scratching on the target substrate with a commercial diamond lapping film can form uniaxially aligned nanoscratches. As applied in BCP thin films, the nanoscratch effectively guides the self-assembly of overlying BCPs and provides highly aligned nanopatterns along the direction of the nanoscratch. The nanoscratch-DSA is not material-specific, allowing more versatile nanofabrication for various functional nanomaterials. In addition, we demonstrate that the nanoscratch-DSA can be utilized as a direction-controllable and area-selective nanofabrication method.

Defects and defect engineering in Soft Matter

Soft matter covers a wide range of materials based on linear or branched polymers, gels and rubbers, amphiphilic (macro)molecules, colloids, and self-assembled structures. These materials have applications in various industries, all highly important for our daily life, and they control all biological functions; therefore, controlling and tailoring their properties is crucial. One way to approach this target is defect engineering, which aims to control defects in the material's structure, and/or to purposely add defects into it to trigger specific functions. While this approach has been a striking success story in crystalline inorganic hard matter, both for mechanical and electronic properties, and has also been applied to organic hard materials, defect engineering is rarely used in soft matter design. In this review, we present a survey on investigations on defects and/or defect engineering in nine classes of soft matter composed of liquid crystals, colloids, linear polymers with moderate degree of branching, hyperbranched polymers and dendrimers, conjugated polymers, polymeric networks, self-assembled amphiphiles and proteins, block copolymers and supramolecular polymers. This overview proposes a promising role of this approach for tuning the properties of soft matter.

Hybrid line-dot nanopatterns from directed self-assembly of diblock copolymers by trenches

We demonstrate that the directed self-assembly of AB diblock copolymers by periodic trenches can be used to fabricate large-scale ordered hybrid line-dot nanopatterns in addition to a defect-free dot nanopattern. The formation of line or dot nanopatterns in thin films with proper surface affinities is controlled by the film thickness, which is modulated by a topographic pattern consisting of steps and trenches. Two kinds of line-dot nanopatterns are achieved with cylinder-forming and sphere-forming copolymers, respectively. One kind of hybrid nanopatterns is composed of perpendicularly standing cylinders (dots) on the steps and parallel monolayer cylinders (lines) within the trenches, while the dots of the other kind are replaced by monolayer spheres on the steps. The thermodynamic stability region of target hybrid nanopatterns is identified by constructing two-dimensional phase diagrams with respect to two control parameters of step height and film thickness using self-consistent field theory. Furthermore, a process window of the line-dot nanopatterns is estimated using cell dynamics simulations based on time-dependent Ginzburg-Landau theory, confirming their feasibility in kinetics.

Coarsening dynamics in the Swift-Hohenberg equation with an external field

We study the Swift-Hohenberg equation (SHE) in the presence of an external field. The application of the field leads to a phase diagram with three phases, i.e., stripe, hexagon, and uniform. We focus on coarsening after a quench from the uniform to stripe or hexagon regions. For stripe patterns, we find that the length scale associated with the order-parameter structure factor has the same growth exponent (≃1/4) as for the SHE with zero field. The growth process is slower in the case of hexagonal patterns, with the effective growth exponent varying between 1/6 and 1/9, depending on the quench parameters. For deep quenches in the hexagonal phase, the growth process stops at late stages when defect boundaries become pinned.

Curvature as a Guiding Field for Patterns in Thin Block Copolymer Films

Experimental data on thin films of cylinder-forming block copolymers (BC)-free-standing BC membranes as well as supported BC films-strongly suggest that the local orientation of the BC patterns is coupled to the geometry in which the patterns are embedded. We analyze this phenomenon using general symmetry considerations and numerical self-consistent field studies of curved BC films in cylindrical geometry. The stability of the films against curvature-induced dewetting is also analyzed. In good agreement with experiments, we find that the BC cylinders tend to align along the direction of curvature at high curvatures. At low curvatures, we identify a transition from perpendicular to parallel alignment in supported films, which is absent in free-standing membranes. Hence both experiments and theory show that curvature can be used to manipulate and align BC patterns.

Shear-induced parallel and transverse alignments of cylinders in thin films of diblock copolymers

Coarse-grained Langevin dynamics simulations were performed to investigate the alignment behavior of monolayer films of cylinder-forming diblock copolymers under steady shear, a structure of significant importance for many technical applications such as nanopatterning. The influences of shear conditions, the interactions involved in the films, and the initial morphology of the cylinder-forming phase were examined. Our results showed that above a critical shear rate, the cylinders can align either along the shearing direction or transverse (log-rolling) to the shearing direction depending on the relative strength between the interchain attraction in the cylinders (εAA) and the surface attraction of the confining walls with the film (εBW). To understand the underlying mechanism, the microscopic properties of the films under shear were systematically investigated. It was found that at low εAA/εBW, the majority blocks of the diblock polymer that are adsorbed on the confining walls prefer to move synchronously with the walls, inducing the cylinder-forming blocks to align along the flow direction. When εAA/εBW is above a threshold value, a strong attraction between the cylinder-forming blocks restrains their movement during shear, leading to the log-rolling motions of the cylinders. To predict the threshold εAA/εBW, we developed an approach based on equilibrium thermodynamics data and found good agreement with our shear simulations.