Designing Intrablock Attractions To Increase the χ Parameter of a Symmetric Diblock Copolymer

Chemically tailored block copolymers for highly reliable sub-10-nm patterns by directed self-assembly

While block copolymer (BCP) lithography is theoretically capable of printing features smaller than 10 nm, developing practical BCPs for this purpose remains challenging. Herein, we report the creation of a chemically tailored, highly reliable, and practically applicable block copolymer and sub-10-nm line patterns by directed self-assembly. Polystyrene-block-[poly(glycidyl methacrylate)-random-poly(methyl methacrylate)] (PS-b-(PGMA-r-PMMA) or PS-b-PGM), which is based on PS-b-PMMA with an appropriate amount of introduced PGMA (10-33 mol%) is quantitatively post-functionalized with thiols. The use of 2,2,2-trifluoroethanethiol leads to polymers (PS-b-PGFMs) with Flory-Huggins interaction parameters (χ) that are 3.5-4.6-times higher than that of PS-b-PMMA and well-defined higher-order structures with domain spacings of less than 20 nm. This study leads to the smallest perpendicular lamellar domain size of 12.3 nm. Furthermore, thin-film lamellar domain alignment and vertical orientation are highly reliably and reproducibly obtained by directed self-assembly to yield line patterns that correspond to a 7.6 nm half-pitch size.

Effect of degree of substitution on the microphase separation and mechanical properties of cellooligosaccharide acetate-based elastomers

Thermoplastic elastomers (TPEs) have long been used in a wide range of industries. However, most existing TPEs are petroleum-derived polymers. To realize environmentally benign alternatives to conventional TPEs, cellulose acetate is a promising TPE hard segment because of its sufficient mechanical properties, availability from renewable sources, and biodegradability in natural environments. Because the degree of substitution (DS) of cellulose acetate governs a range of physical properties, it is a useful parameter for designing novel cellulose acetate-based TPEs. In this study, we synthesized cellulose acetate-based ABA-type triblock copolymers (AcCel_x-b-PDL-b-AcCel_x) containing a celloologosaccharide acetate hard A segment (AcCel_x, where x is the DS; x = 3.0, 2.6, and 2.3) and a poly(δ-decanolactone) (PDL) soft B segment. Small-angle X-ray scattering showed that decreasing the DS of AcCel_x-b-PDL-b-AcCel_x resulted in the formation of a more ordered microphase-separated structure. Owing to the microphase separation of the hard cellulosic and soft PDL segments, all the AcCel_x-b-PDL-b-AcCel_x samples exhibited elastomer-like properties. Moreover, the decrease in DS improved toughness and suppressed stress relaxation. Furthermore, preliminary biodegradation tests in an aqueous environment revealed that the decrease in DS endowed AcCel_x-b-PDL-b-AcCel_x with greater biodegradability potential. This work demonstrates the usefulness of cellulose acetate-based TPEs as next-generation sustainable materials.

Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives

Polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is one of the most widely studied block copolymers for direct self-assembly because of its excellent compatibility with traditional processes. However, pattern transfer of PS-b-PMMA block copolymers (BCPs) remains a great challenge for its applications due to the insufficient etching resolution. In this study, the effect of ionic liquid 1-hexyl-3-methylimidazolium hexafluorophosphate (HMHF) additives on the line edge roughness (LER) performances of PS-b-PMMA self-assembled patterns was studied. Trace addition of HMHF kept the photolithography compatibility of PS-b-PMMA block copolymer films, but obviously increased their Flory-Huggins interaction parameter (χ) and enabled phase separation of disordered low molecular weight BCPs. LER value was effectively decreased by blending HMHF directly with PS-b-PMMA or from a supplying top layer of polyvinylpyrrolidone containing HMHF additives. This study shows an excellent strategy to improve the deficiencies of existing block copolymers.

Downsizing of Block Polymer-Templated Nanopores to One Nanometer via Hyper-Cross-Linking of High χ-Low N Precursors

Synthesizing nanoporous polymer from the block polymer template by selective removal of the sacrificial domain offers straightforward pore size control as a function of the degree of polymerization (N). Downscaling pore size into the microporous regime (<2 nm) has been thermodynamically challenging, because the low N drives the system to disorder and the small-sized pore is prone to collapse. Herein, we report that maximizing cross-linking density of a block polymer precursor with an increased interaction parameter (χ) can help successfully stabilize the structure bearing pore sizes of 1.1 nm. We adopt polymerization-induced microphase separation (PIMS) combined with hyper-cross-linking as a strategy for the preparation of the bicontinuous block polymer precursors with a densely cross-linked framework by copolymerization of vinylbenzyl chloride with divinylbenzene and also Friedel-Crafts alkylation. Incorporating 4-vinylbiphenyl as a higher-χ comonomer to the sacrificial polylactide (PLA) block and optimizing the segregation strength versus cross-linking density allow for further downscaling. Control of pore size by N of PLA is demonstrated in the range of 9.9-1.1 nm. Accessible surface area to fluorescein-tagged dextrans is regulated by the relative size of the pore to the guest, and pore size is controlled. These findings will be useful for designing microporous polymers with tailored pore size for advanced catalytic and separation applications.

Main-chain liquid crystalline polymers bearing periodically grafted folding elements

Inclusion of non-mesogenic pendant segments, such as alkyl, PEG and fluoroalkyl, at periodic intervals along the backbone of main-chain LCPs, that contain flexible spacers, provides an interesting alternative to control the mesophase structure and the layer periodicity.

Field theoretic approach for block polymer melts: SCFT and FTS

This perspective addresses the development of polymer field theory for predicting the equilibrium phase behavior of block polymer melts. The approach is tailored to the high-molecular-weight limit, where universality reduces all systems to the standard Gaussian chain model, an incompressible melt of elastic threads interacting by contact forces. Using mathematical identities, this particle-based version of the model is converted to an equivalent field-based version that depends on fields rather than particle coordinates. The statistical mechanics of the field-based model is typically solved using the saddle-point approximation of self-consistent field theory (SCFT), which equates to mean field theory, but it can also be evaluated using field theoretic simulations (FTS). While SCFT has matured into one of the most successful theories in soft condensed matter, FTS are still in its infancy. The two main obstacles of FTS are the high computational cost and the occurrence of an ultraviolet divergence, but fortunately there has been recent groundbreaking progress on both fronts. As such, FTS are now well poised to become the method of choice for predicting fluctuation corrections to mean field theory.

High-Fidelity, Sub-5 nm Patterns from High-χ Block Copolymer Films with Vapor-Deposited Ultrathin, Cross-Linked Surface-Modification Layers

Despite their capability, sub-10 nm periodic nano-patterns formed by strongly segregating block copolymer (BCP) thin films cannot be easily oriented perpendicular to the substrate due to the huge surface energy differences of the constituent blocks. To produce perpendicular nano-patterns, the interfacial energies of both the substrate and free interfaces should be controlled precisely to induce non-preferential wetting. Unfortunately, high-performance surface modification layers are challenging to design, and different kinds of surface modification methods must be devised respectively for each neutral layer and top coat. Furthermore, conventional approaches, largely based on spin-coating processes, are highly prone to defect formation and may readily cause dewetting at sub-10 nm thickness. To date, these obstacles have hampered the development of high-fidelity, sub-5 nm BCP patterns. Herein, an all-vapor phase deposition approach initiated chemical vapor deposition is demonstrated to form 9-nm-thick, uniform neutral bottom layer and top coat with exquisite control of composition and thickness. These layers are employed in BCP films to produce perpendicular cylinders with a diameter of ≈4 nm that propagate throughout a BCP thickness of up to ≈60 nm, corresponding to five natural domain spacings of the BCP. Such a robust approach will serve as an advancement for the reliable generation of sub-10 nm nano-patterns.

The Influence of Additives on the Interfacial Width and Line Edge Roughness in Block Copolymer Lithography

The challenges of patterning next generation integrated circuits have driven the semiconductor industry to look outside of traditional lithographic methods in order to continue cost effective size scaling. The directed self-assembly (DSA) of block copolymers (BCPs) is a nanofabrication technique used to reduce the periodicity of patterns prepared with traditional optical methods. BCPs with large interaction parameters (χ eff), provide access to smaller pitches and reduced interface widths. Larger χ eff is also expected to be correlated with reduced line edge roughness (LER), a critical performance parameter in integrated circuits. One approach to increasing χ eff is blending the BCP with a phase selective additive, such as an Ionic liquid (IL). The IL does not impact the etching rates of either phase, and this enables a direct interrogation of whether the change in interface width driven by higher χ eff translates into lower LER. The effect of the IL on the layer thickness and interface width of a BCP are examined, along with the corresponding changes in LER in a DSA patterned sample. The results demonstrate that increased χ eff through additive blending will not necessarily translate to a lower LER, clarifying an important design criterion for future material systems.

Chemically tailored high-χ block copolymers for perpendicular lamellae via thermal annealing

A chemically tailored high-χ block copolymer (BCP), polystyrene-block-poly[2-hydroxy-3-(2,2,2-trifluoroethylsulfanyl)propyl methacrylate] (PS-b-PHFMA), was designed to incorporate tailored surface affinities and chemical incompatibilities for engineering perpendicular lamellae using thermal annealing. PS-b-PHFMA was synthesized via the sequential anionic polymerization of styrene and glycidyl methacrylate and the post-polymerization functionalization of the glycidyl moieties with 2,2,2-trifluoroethanethiol. The bulk studies revealed lamellae with a minimum domain spacing of 9.6 nm and a large effective Flory-Huggins interaction parameter (χeff) of 0.191 at 25 °C. Furthermore, atomic force microscopy and scanning electron microscopy showed perpendicular lamellae of the PS-b-PHFMA prepared on thermally-annealed thin films. The introduction of hydrophobic trifluoroethyl moieties onto the hydrophilic glycidyl moieties successfully balanced the surface affinity of the PHFMA block relative to PS, while simultaneously increasing the strength of segregation. Thus, χeff of the chemically tailored BCP increased, and a perpendicular orientation was facilitated on the thin films using thermal annealing.

Thermal Approaches to Perpendicular Block Copolymer Microdomains in Thin Films: A Review and Appraisal

Block copolymer thin films are highly versatile and accessible materials capable of producing nanofeatures in the size regime of a few to hundreds of nanometers by a simple spin-coating-and-anneal process. Unfortunately, this simple protocol usually leads to parallel microdomains, which limits the applicability of such nanofeatures. A great deal of effort has been put into achieving perpendicular microdomains, but those that incorporate thermal annealing are arguably the most practical and reproducible in the lab and industry. This review discusses the recent ongoing efforts on various thermal approaches to achieving perpendicular microdomains in order to provide the readers with a toolbox to work with.

Ionic Liquids as Additives to Polystyrene- Block-Poly(Methyl Methacrylate) Enabling Directed Self-Assembly of Patterns with Sub-10 nm Features

Polystyrene- block-poly(methyl methacrylate) (PS- b-PMMA) is one of the prototypical block copolymers in directed self-assembly (DSA) research and development, with standardized protocols in place for processing on industrially relevant 300 mm wafers. Scaling of DSA patterns to pitches below 20 nm using PS- b-PMMA, however, is hindered by the relatively low Flory-Huggins interaction parameter, χ. Here, we investigate the approach of adding small amounts of ionic liquids (ILs) into PS- b-PMMA, which selectively segregates into the PMMA domain and effectively increases the χ parameter and thus the pattern resolution. The amount of IL additive is small enough to result in limited changes in PS- b-PMMA's surface and interfacial properties, thus maintaining industry-friendly processing by thermal annealing with a free surface. Three different ILs are studied comparatively regarding their compositional process window, capability of increasing χ, and thermal stability. By adding ∼3.1 vol % of the champion IL into a low-molecular-weight PS- b-PMMA ( M_n = 10.3k- b-9.5k), we demonstrated DSA on chemically patterned substrates of lamellar structures with feature sizes <8.5 nm. Compatibility of the PS- b-PMMMA/IL blends with the standardized processes that have been previously developed suggests that such blend materials could provide a drop-in solution for sub-10 nm lithography with the processing advantages of PS- b-PMMA.

Highly Asymmetric Phase Behaviors of Polyhedral Oligomeric Silsesquioxane-Based Multiheaded Giant Surfactants

This work reports the molecular design, synthesis, and systematic study on the bulk self-assembly behaviors of three series of polyhedral oligomeric silsesquioxane (POSS)-based multiheaded giant surfactants XDPOSS-PS_n (X = 2, 3, and 4), which are composed of two, three, or four hydrophilic hydroxyl-group-functionalized DPOSS cages attached via one junction point to a hydrophobic polystyrene (PS) chain. These series of hybrid polymeric amphiphiles with precisely defined chemical structure and controllable molecular architecture are synthesized by the sequential usage of "click" reactions. By tuning molecular weights of the PS tail, we established full phase diagrams of XDPOSS-PS_n as a function of the volume fractions of PS chains (V_f^PS). We found that the self-assembled structures were greatly influenced by the molecular architecture. Strikingly, our results showed that the lamellar morphology, which usually existed at relatively symmetric compositions in common diblock copolymers, became the thermodynamically stable phase in the 3DPOSS-PS_n and 4DPOSS-PS_n samples even at an asymmetric composition up to V_f^PS = 0.842, with the ratio between the thicknesses of PS and DPOSS lamellae up to 5.32. This unusual phenomenon induced by molecular architectural variation could be explained by the large cross-sectional area of DPOSS cages at the nanophase-separated domain interface and high elastic deformation energy of clustered DPOSS cages which have relatively rigid conformation. The unique bulk self-assembly behaviors in our POSS-based multiheaded giant surfactants provide insights in developing hybrid nanomaterials toward unconventional nanostructures.

Directed Self-Assembly of Liquid-Crystalline Molecular Building Blocks for Sub-5 nm Nanopatterning

The thin-film directed self-assembly of molecular building blocks into oriented nanostructure arrays enables next-generation lithography at the sub-5 nm scale. Currently, the fabrication of inorganic arrays from molecular building blocks is restricted by the limited long-range order and orientation of the materials, as well as suitable methodologies for creating lithographic templates at sub-5 nm dimensions. In recent years, higher-order liquid crystals have emerged as functional thin films for organic electronics, nanoporous membranes, and templated synthesis, which provide opportunities for their use as lithographic templates. By choosing examples from these fields, recent progress toward the design of molecular building blocks is highlighted, with an emphasis on liquid crystals, to access sub-5 nm features, their directed self-assembly into oriented thin films, and, importantly, the fabrication of inorganic arrays. Finally, future challenges regarding sub-5 nm patterning with liquid crystals are discussed.

Molecular Tailoring of Poly(styrene-b-methyl methacrylate) Block Copolymer Toward Perpendicularly Oriented Nanodomains with Sub-10 nm Features

We demonstrate a novel approach for fabricating vertically orientated, sub-10 nm, block copolymer (BCP) nanodomains on a substrate via molecular tailoring of poly(styrene-b-methyl methacrylate) (PS-b-PMMA) BCP, one of the most widely used BCPs for nanopatterning. The idea is to incorporate a short middle block of self-attracting poly(methacrylic acid) (PMAA) between the PS and PMMA blocks, where the PMAA middle block promotes phase separation between PS and PMMA, while maintaining the domain orientation perpendicular to the substrate. The designed PS-b-PMAA-b-PMMA triblock copolymers, which were synthesized via well-controlled anionic polymerization, exhibited order-disorder transition temperatures higher than that of pristine PS-b-PMMA BCPs, indicating the promotion of phase separation by the middle PMAA block. For PS-b-PMAA-b-PMMA BCPs with total molecular weights of 21 and 18 kg/mol, the domain spacing corresponds to 19.3 and 16.7 nm, respectively, allowing us to fabricate sub-10 nm nanodomain structures. More importantly, it was demonstrated that the PMAA middle block, which has a higher surface energy than PS and PMMA, does not significantly alter lateral concentration fluctuations, which are responsible for phase-separation in the lateral direction. This enabled the vertical orientation of microdomains with sub-10 nm feature size on a PS-r-PMMA neutral surface without an additional neutral top layer. We anticipate that this approach provides an important platform for next-generation lithography and nanopatterning applications that require sub-10 nm features over large areas with simple process and reduced cost.

Domain swelling in ARB-type triblock copolymers via self-adjusting effective dispersity

We investigated the domain spacing of an ordered structure formed by polydisperse ARB-type triblock copolymers (triBCPs) with random middle R blocks consisting of A and B monomers. ARB-type triBCPs were synthesized via reversible addition-fragmentation chain transfer (RAFT) polymerization, and the dispersities of all samples were controlled as narrow as ∼1.2. From the bulk and film morphologies, it was found that the domain swelling increases as the content of middle R blocks increases, which implies that the middle R block even with a small content plays a critical role in dilating the domain spacing. Since the random middle R blocks are energetically neutral, they can be segregated into either A or B blocks. The strong stretching theory (SST) suggests that the dispersities of the resulting constituent blocks are maximized to reduce the elastic energy associated with chain stretching, thereby leading to the dilation of domain spacing.