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Yang J, Fang C, Li T, Wang Y, Li X, Zeng X, Liu Y, Hao Y, Han G. Hybrid mode for absorption enhancement in the Ga 2O 3 nanocavity photodetector with grating electrodes. APPLIED OPTICS 2024; 63:4414-4420. [PMID: 38856622 DOI: 10.1364/ao.524563] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/22/2024] [Accepted: 04/30/2024] [Indexed: 06/11/2024]
Abstract
Gallium oxide (G a 2 O 3) photodetectors have drawn increased interest for their widespread applications ranging from military to civil. Due to the inherent oxygen vacancy defects, they seriously suffer from trade-offs that make them incompetent for high-responsivity, quick-response detection. Herein, a G a 2 O 3 nanocavity photodetector assisted with grating electrodes is designed to break the constraint. The proposed structure supports both the plasmonic mode and the Fabry-Perot (F-P) mode. Numerical calculations show that the absorption of 99.8% is realized for ultra-thin G a 2 O 3 (30 nm), corresponding to a responsivity of 12.35 A/W. Benefiting from optical mechanisms, the external quantum efficiency (EQE) reaches 6040%, which is 466 times higher than that of bare G a 2 O 3 film. Furthermore, the proposed photodetector achieves a polarization-dependent dichroism ratio of 9.1, enabling polarization photodetection. The grating electrodes also effectively reduce the transit time of the photo-generated carriers. Our work provides a sophisticated platform for developing high-performance G a 2 O 3 photodetectors with the advantages of simplified fabrication processes and multidimensional detection.
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2
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Ma L, Wang Y, Liu Y. van der Waals Contact for Two-Dimensional Transition Metal Dichalcogenides. Chem Rev 2024; 124:2583-2616. [PMID: 38427801 DOI: 10.1021/acs.chemrev.3c00697] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 03/03/2024]
Abstract
Two-dimensional (2D) transition metal dichalcogenides (TMDs) have emerged as highly promising candidates for next-generation electronics owing to their atomically thin structures and surfaces devoid of dangling bonds. However, establishing high-quality metal contacts with TMDs presents a critical challenge, primarily attributed to their ultrathin bodies and delicate lattices. These distinctive characteristics render them susceptible to physical damage and chemical reactions when conventional metallization approaches involving "high-energy" processes are implemented. To tackle this challenge, the concept of van der Waals (vdW) contacts has recently been proposed as a "low-energy" alternative. Within the vdW geometry, metal contacts can be physically laminated or gently deposited onto the 2D channel of TMDs, ensuring the formation of atomically clean and electronically sharp contact interfaces while preserving the inherent properties of the 2D TMDs. Consequently, a considerable number of vdW contact devices have been extensively investigated, revealing unprecedented transport physics or exceptional device performance that was previously unachievable. This review presents recent advancements in vdW contacts for TMD transistors, discussing the merits, limitations, and prospects associated with each device geometry. By doing so, our purpose is to offer a comprehensive understanding of the current research landscape and provide insights into future directions within this rapidly evolving field.
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Affiliation(s)
- Likuan Ma
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Yiliu Wang
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
| | - Yuan Liu
- Key Laboratory for Micro-Nano Optoelectronic Devices of Ministry of Education, School of Physics and Electronics, Hunan University, Changsha 410082, China
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Wang Y, Chen Z, Qu Y, Zhang M, Ren Y, Sun H, Li Y, Deng Y, Li S, Nie Y, Xiang H, Wu Y, Shi Y, Zeng H, Hao Y. A Bifunctional Optoelectronic Device for Photodetection and Photoluminescence Switching Based on Graphene/ZnTe/Graphene van der Waals Heterostructures. ACS NANO 2023; 17:21829-21837. [PMID: 37922194 DOI: 10.1021/acsnano.3c07814] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/05/2023]
Abstract
Controlling the dynamic processes, such as generation, separation, transport, and recombination, of photoexcited carriers in a semiconductor is foundational in the design of various devices for optoelectronic applications. One may imagine that if different processes can be manipulated in one single device and thus generate useful signals, a multifunctional device can be realized, and the toolbox for integrated optoelectronics will be expanded. Here, we revealed that in a graphene/ZnTe/graphene van der Waals (vdW) heterostructure, the carriers can be generated by illumination from visible to infrared frequencies, and thus, the detected spectrum range extends to the communication band, well beyond the band gap of ZnTe (2.26 eV). More importantly, we are able to control the competition between separation and recombination of the photoexcited carriers by an electric bias along the thickness-defined channel of the ZnTe flake: as the bias increases, the photodetecting performance, e.g. response speed and photocurrent, are improved due to the efficient separation of carriers; synchronously, the photoluminescence (PL) intensity decreases and even switches off due to the suppressed recombination process. The ZnTe-based vdW heterostructure device thus integrates both photodetection and PL switching functions by manipulating the generation, separation, transport, and recombination of carriers, which may inspire the design of the next generation of miniaturized optoelectronic devices based on the vdW heterostructures made by various thin flakes.
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Affiliation(s)
- Yushu Wang
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
| | - Zhesheng Chen
- MIIT Key Laboratory of Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Yan Qu
- The Sixth Element (Changzhou) Materials Technology Co., Ltd. and Jiangsu Jiangnan Xiyuan Graphene Technology Co., LTD, Changzhou 213161, People's Republic of China
| | - Mingrui Zhang
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
| | - Yifeng Ren
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
| | - Haoying Sun
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
| | - Yuan Li
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
- State Key Laboratory of Quantum Optics and Quantum Optics Devices, Institute of Optoelectronics, Collaborative Innovation Center of Extreme Optics, Shanxi University, Taiyuan 030006, People's Republic of China
| | - Yu Deng
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
| | - Songlin Li
- National Laboratory of Solid State Microstructures, and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, People's Republic of China
| | - Yuefeng Nie
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
| | - Hengyang Xiang
- MIIT Key Laboratory of Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Yaping Wu
- Department of Physics, OSED, Fujian Provincial Key Laboratory of Semiconductor Materials and Applications, Xiamen University, Xiamen 361005, People's Republic of China
| | - Yi Shi
- National Laboratory of Solid State Microstructures, and School of Electronic Science and Engineering, Nanjing University, Nanjing 210023, People's Republic of China
| | - Haibo Zeng
- MIIT Key Laboratory of Display Materials and Devices, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing 210094, People's Republic of China
| | - Yufeng Hao
- National Laboratory of Solid State Microstructures, College of Engineering and Applied Sciences, Jiangsu Key Laboratory of Artificial Functional Materials, and Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210023, People's Republic of China
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Xie B, Ji Z, Wu J, Zhang R, Jin Y, Watanabe K, Taniguchi T, Liu Z, Cai X. Probing the Inelastic Electron Tunneling via the Photocurrent in a Vertical Graphene van der Waals Heterostructure. ACS NANO 2023; 17:18352-18358. [PMID: 37695240 DOI: 10.1021/acsnano.3c05666] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 09/12/2023]
Abstract
Inelastic electron tunneling (IET), accompanied by energy transfer between the tunneling charge carriers and other elementary excitations, is widely used to investigate the collective modes and quasiparticles in solid-state materials. In general, the inelastic contribution to the tunneling current is small compared to the elastic part and is therefore only prominent in the second derivative of the tunneling current with respect to the bias voltage. Here we demonstrate a direct observation of the IET by measuring the photoresponse in a graphene-based vertical tunnel junction device. Characteristic peaks/valleys are observed in the bias-voltage-dependent tunneling photocurrent at low temperatures, which barely shift with the gate voltage applied to graphene and diminish gradually as the temperature increases. By comparing with the second-order differential conductance spectra, we establish that these features are associated with the phonon-assisted IET. A simple model based on the photoexcited hot-carrier tunneling in graphene qualitatively explains the response. Our study points to a promising means of probing the low-energy elementary excitations utilizing the graphene-based van der Waals (vdW) heterostructures.
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Affiliation(s)
- Binghe Xie
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
- Department of Micro/Nano Electronics, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
| | - Zijie Ji
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
- Department of Micro/Nano Electronics, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
| | - Jiaxin Wu
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
- Department of Micro/Nano Electronics, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
| | - Ruan Zhang
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
- Department of Micro/Nano Electronics, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
| | - Yunmin Jin
- Department of Micro/Nano Electronics, School of Electronic Information and Electrical Engineering, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
- Key Laboratory of Thin Film and Microfabrication Technology (Ministry of Education), Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
| | - Kenji Watanabe
- National Institute for Materials Science, Tsukuba, Ibaraki 305-00044, Japan
| | - Takashi Taniguchi
- National Institute for Materials Science, Tsukuba, Ibaraki 305-00044, Japan
| | - Zhao Liu
- Zhejiang Institute of Modern Physics, Zhejiang University, Hangzhou 310058, People's Republic of China
| | - Xinghan Cai
- National Key Laboratory of Advanced Micro and Nano Manufacture Technology, Shanghai Jiao Tong University, Shanghai 200240, People's Republic of China
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Yu Y, Gao L, Niu X, Liu K, Li R, Yang D, Zeng H, Wang HQ, Ni Z, Lu J. Deciphering Adverse Detrapped Hole Transfer in Hot-Electron Photoelectric Conversion at Infrared Wavelengths. ADVANCED MATERIALS (DEERFIELD BEACH, FLA.) 2023; 35:e2210157. [PMID: 36732915 DOI: 10.1002/adma.202210157] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 11/02/2022] [Revised: 01/01/2023] [Indexed: 06/18/2023]
Abstract
Hot-carrier devices are promising alternatives for enabling path breaking photoelectric conversion. However, existing hot-carrier devices suffer from low efficiencies, particularly in the infrared region, and ambiguous physical mechanisms. In this work, the competitive interfacial transfer mechanisms of detrapped holes and hot electrons in hot-carrier devices are discovered. Through photocurrent polarity research and optical-pump-THz-probe (OPTP) spectroscopy, it is verified that detrapped hole transfer (DHT) and hot-electron transfer (HET) dominate the low- and high-density excitation responses, respectively. The photocurrent ratio assigned to DHT and HET increases from 6.6% to over 1133.3% as the illumination intensity decreases. DHT induces severe degeneration of the external quantum efficiency (EQE), especially at low illumination intensities. The EQE of a hot-electron device can theoretically increase by over two orders of magnitude at 10 mW cm-2 through DHT elimination. The OPTP results show that competitive transfer arises from the carrier oscillation type and carrier-density-related Coulomb screening. The screening intensity determines the excitation weight and hot-electron cooling scenes and thereby the transfer dynamics.
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Affiliation(s)
- Yuanfang Yu
- School of Physics and Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, 211189, P. R. China
| | - Lei Gao
- School of Physics and Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, 211189, P. R. China
| | - Xianghong Niu
- New Energy Technology Engineering Laboratory of Jiangsu Province & School of Science, Nanjing University of Posts and Telecommunications, Nanjing, 210023, P. R. China
| | - Kaiyang Liu
- School of Physics and Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, 211189, P. R. China
| | - Ruizhi Li
- School of Physics and Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, 211189, P. R. China
| | - Dandan Yang
- School of Chemistry and Chemical Engineering, Yangzhou University, Yangzhou, 225002, P. R. China
- Institute of Optoelectronics and Nanomaterials, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, 210094, P. R. China
| | - Haibo Zeng
- Institute of Optoelectronics and Nanomaterials, School of Materials Science and Engineering, Nanjing University of Science and Technology, Nanjing, 210094, P. R. China
| | - Hui-Qiong Wang
- Department of Physics and Department of New Energy Science and Engineering, Xiamen University Malaysia, Sepang, 43900, Malaysia
- Department of Physics, Xiamen University, Xiamen, 361005, P. R. China
| | - Zhenhua Ni
- School of Physics and Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, 211189, P. R. China
- Purple Mountain Laboratories, Nanjing, 211111, P. R. China
| | - Junpeng Lu
- School of Physics and Key Laboratory of MEMS of the Ministry of Education, Southeast University, Nanjing, 211189, P. R. China
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Dandu M, Gupta G, Majumdar K. Negative Differential Photoconductance as a Signature of Nonradiative Energy Transfer in van der Waals Heterojunction. ACS NANO 2021; 15:16432-16441. [PMID: 34644047 DOI: 10.1021/acsnano.1c05844] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
The physical proximity of layered materials in their van der Waals heterostructures (vdWhs) aids interfacial phenomena such as charge transfer (CT) and energy transfer (ET). Besides providing fundamental insights, CT and ET also offer routes to engineer optoelectronic properties of vdWhs. For example, harnessing ET in vdWhs can help to overcome the limitations of optical absorption imposed by the ultra-thin nature of layered materials and thus provide an opportunity for in situ enhancement of quantum efficiency for light-harvesting and sensing applications. While several spectroscopic studies on vdWhs probed the dynamics of CT and ET, the possible contribution of ET in the photocurrent generation remains largely unexplored. In this work, we investigate the role of nonradiative energy transfer (NRET) in the photocurrent through a vertical vdWh of SnSe2/MoS2/TaSe2. We observe an unusual negative differential photoconductance (NDPC) arising from the existence of NRET across the SnSe2/MoS2 junction. Modulation of the NRET-driven NDPC characteristics with optical power results in a striking transition of the photocurrent's power law from a sublinear to a superlinear regime. Our observations reveal the nontrivial influence of ET on the photoresponse of vdWhs, which offer insights to harness ET in synergy with CT for vdWh based next-generation optoelectronics.
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Affiliation(s)
- Medha Dandu
- Department of Electrical Communication Engineering, Indian Institute of Science, Bangalore 560012, India
| | - Garima Gupta
- Department of Electrical Communication Engineering, Indian Institute of Science, Bangalore 560012, India
| | - Kausik Majumdar
- Department of Electrical Communication Engineering, Indian Institute of Science, Bangalore 560012, India
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7
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Liu C, Guo J, Yu L, Li J, Zhang M, Li H, Shi Y, Dai D. Silicon/2D-material photodetectors: from near-infrared to mid-infrared. LIGHT, SCIENCE & APPLICATIONS 2021; 10:123. [PMID: 34108443 PMCID: PMC8190178 DOI: 10.1038/s41377-021-00551-4] [Citation(s) in RCA: 52] [Impact Index Per Article: 17.3] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 12/19/2020] [Revised: 04/21/2021] [Accepted: 05/06/2021] [Indexed: 05/06/2023]
Abstract
Two-dimensional materials (2DMs) have been used widely in constructing photodetectors (PDs) because of their advantages in flexible integration and ultrabroad operation wavelength range. Specifically, 2DM PDs on silicon have attracted much attention because silicon microelectronics and silicon photonics have been developed successfully for many applications. 2DM PDs meet the imperious demand of silicon photonics on low-cost, high-performance, and broadband photodetection. In this work, a review is given for the recent progresses of Si/2DM PDs working in the wavelength band from near-infrared to mid-infrared, which are attractive for many applications. The operation mechanisms and the device configurations are summarized in the first part. The waveguide-integrated PDs and the surface-illuminated PDs are then reviewed in details, respectively. The discussion and outlook for 2DM PDs on silicon are finally given.
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Affiliation(s)
- Chaoyue Liu
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
| | - Jingshu Guo
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
| | - Laiwen Yu
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
| | - Jiang Li
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
| | - Ming Zhang
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
- Ningbo Research Institute, Zhejiang University, Ningbo, 315100, China
| | - Huan Li
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
| | - Yaocheng Shi
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China
- Ningbo Research Institute, Zhejiang University, Ningbo, 315100, China
| | - Daoxin Dai
- State Key Laboratory for Modern Optical Instrumentation, Zhejiang Provincial Key Laboratory for Sensing Technologies, College of Optical Science and Engineering, International Research Center for Advanced Photonics, Zhejiang University, Zijingang Campus, Hangzhou, 310058, China.
- Ningbo Research Institute, Zhejiang University, Ningbo, 315100, China.
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8
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Chen Y, Li Z, Chen J. Abnormal Electron Emission in a Vertical Graphene/Hexagonal Boron Nitride van der Waals Heterostructure Driven by a Hot Hole-Induced Auger Process. ACS APPLIED MATERIALS & INTERFACES 2020; 12:57505-57513. [PMID: 33258372 DOI: 10.1021/acsami.0c13352] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/12/2023]
Abstract
Understanding the scattering process of field injection hot carriers is important for modulating their behaviors, which is the key for improving the efficiency of charge transfer and energy conversion in hot carrier devices. In this work, a significant electron thermalization induced by Auger scattering between a field injection hot hole and a native cold electron has been observed in a vertical single layer graphene/hexagonal boron nitride/few layer graphene (Gr/hBN/FLG) device by measuring the vacuum electron emission characteristics. For the first time, it is found that vacuum electron emission can be measured under both directions of bias within the device. Furthermore, electrons can be emitted even when the applied bias energy is smaller than the work function of the Gr cathode. Further analysis of the emission electron kinetic energy indicates that the low turn-on bias results from the emission of energetic electrons that are ∼3 eV higher than the Fermi level. A semiquantitative model based on hot hole-induced Auger electron emission is established to reproduce the results. All of these findings not only expand our understanding of the hot carrier scattering process in graphene but also provide insights into the applications of hot carrier devices.
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Affiliation(s)
- Yicong Chen
- State Key Lab of Optoelectronic Materials and Technologies, Guangdong Province Key Lab of Display Material and Technology, Sun Yat-sen University, Guangdong 510275, People's Republic of China
- School of Electronics and Information Technology, Sun Yat-sen University, Guangdong 510275, People's Republic of China
| | - Zhibing Li
- State Key Lab of Optoelectronic Materials and Technologies, Guangdong Province Key Lab of Display Material and Technology, Sun Yat-sen University, Guangdong 510275, People's Republic of China
- School of Physics, Sun Yat-sen University, Guangdong 510275, People's Republic of China
| | - Jun Chen
- State Key Lab of Optoelectronic Materials and Technologies, Guangdong Province Key Lab of Display Material and Technology, Sun Yat-sen University, Guangdong 510275, People's Republic of China
- School of Electronics and Information Technology, Sun Yat-sen University, Guangdong 510275, People's Republic of China
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Li L, Wang J, Kang L, Liu W, Yu L, Zheng B, Brongersma ML, Werner DH, Lan S, Shi Y, Xu Y, Wang X. Monolithic Full-Stokes Near-Infrared Polarimetry with Chiral Plasmonic Metasurface Integrated Graphene-Silicon Photodetector. ACS NANO 2020; 14:16634-16642. [PMID: 33197172 DOI: 10.1021/acsnano.0c00724] [Citation(s) in RCA: 43] [Impact Index Per Article: 10.8] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
The ability to detect the full-Stokes polarization of light is vital for a variety of applications that often require complex and bulky optical systems. Here, we report an on-chip polarimeter comprising four metasurface-integrated graphene-silicon photodetectors. The geometric chirality and anisotropy of the metasurfaces result in circular and linear polarization-resolved photoresponses, from which the full-Stokes parameters, including the intensity, orientation, and ellipticity of arbitrarily polarized incident infrared light (1550 nm), can be obtained. The design presents an ultracompact architecture while excluding the standard bulky optical components and structural redundancy. Computational extraction of full-Stokes parameters from mutual information among four detectors eliminates the need for a large absorption contrast between different polarization states. Our monolithic plasmonic metasurface integrated polarimeter is ideal for a variety of polarization-based applications including biological sensing, quantum information processing, and polarization photography.
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Affiliation(s)
- Lingfei Li
- School of Micro-Nanoelectronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, ZJU-UIUC Institute, State Key Labs of Silicon Materials and Modern Optical Instrumentation, Zhejiang University, Hangzhou 311200, China
- School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
| | - Junzhuan Wang
- School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
| | - Lei Kang
- Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Wei Liu
- School of Micro-Nanoelectronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, ZJU-UIUC Institute, State Key Labs of Silicon Materials and Modern Optical Instrumentation, Zhejiang University, Hangzhou 311200, China
| | - Li Yu
- School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
| | - Binjie Zheng
- School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
| | - Mark L Brongersma
- Geballe Laboratory of Advanced Materials, Stanford University, Stanford, California 94305, United States
| | - Douglas H Werner
- Department of Electrical Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802, United States
| | - Shoufeng Lan
- Department of Mechanical Engineering, Texas A&M University, College Station, Texas 77843, United States
| | - Yi Shi
- School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
| | - Yang Xu
- School of Micro-Nanoelectronics, ZJU-Hangzhou Global Scientific and Technological Innovation Center, ZJU-UIUC Institute, State Key Labs of Silicon Materials and Modern Optical Instrumentation, Zhejiang University, Hangzhou 311200, China
| | - Xiaomu Wang
- School of Electronic Science and Engineering, Nanjing University, Nanjing 210093, China
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10
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Yang X, Han J, Yu J, Chen Y, Zhang H, Ding M, Jia C, Sun J, Sun Q, Wang ZL. Versatile Triboiontronic Transistor via Proton Conductor. ACS NANO 2020; 14:8668-8677. [PMID: 32568513 DOI: 10.1021/acsnano.0c03030] [Citation(s) in RCA: 8] [Impact Index Per Article: 2.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/21/2023]
Abstract
Iontronics are effective in modulating electrical properties through the electric double layers (EDLs) assisted with ionic migration/arrangement, which are highly promising for unconventional electronics, ionic sensory devices, and flexible interactive interface. Proton conductors with the smallest and most abundant protons (H+) can realize a faster migration/polarization under electric field to form the EDL with higher capacitance. Here, a versatile triboiontronic MoS2 transistor via proton conductor by sophisticated combination of triboelectric modulation and protons migration has been demonstrated. This device utilizes triboelectric potential originated from mechanical displacement to modulate the electrical properties of transistors via protons migration/accumulation. It shows superior electrical properties, including high current on/off ratio over 106, low cutoff current (∼0.04 pA), and steep switching properties (89 μm/dec). Pioneering noise tests are conducted to the tribotronic devices to exclude the possible noise interference introduced by mechanical displacement. The versatile triboiontronic MoS2 transistor via proton conductor has been utilized for mechanical behavior derived logic devices and an artificial sensory neuron system. This work represents the reliable and effective triboelectric potential modulation on electronic transportation through protonic dielectrics, which is highly desired for theoretical study of tribotronic gating, active mechanosensation, self-powered electronic skin, artificial intelligence, etc.
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Affiliation(s)
- Xixi Yang
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
- CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology (NCNST), Beijing 100190, P. R. China
| | - Jing Han
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Jinran Yu
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Youhui Chen
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Huai Zhang
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
| | - Mei Ding
- College of Materials Science and Engineering, Changsha University of Science & Technology, Changsha 410114, China
| | - Chuankun Jia
- College of Materials Science and Engineering, Changsha University of Science & Technology, Changsha 410114, China
| | - Jia Sun
- School of Physics and Electronics, Central South University, Changsha 410083, China
| | - Qijun Sun
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
- Center on Nanoenergy Research, School of Physical Science and Technology, Guangxi University, Nanning, 530004, China
| | - Zhong Lin Wang
- Beijing Institute of Nanoenergy and Nanosystems, Chinese Academy of Sciences, Beijing 100083, China
- School of Nanoscience and Technology, University of Chinese Academy of Sciences, Beijing 100049, China
- School of Materials Science and Engineering, Georgia Institute of Technology, Atlanta, Georgia 30332-0245, United States
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11
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Wang H, Li S, Ai R, Huang H, Shao L, Wang J. Plasmonically enabled two-dimensional material-based optoelectronic devices. NANOSCALE 2020; 12:8095-8108. [PMID: 32091526 DOI: 10.1039/c9nr10755j] [Citation(s) in RCA: 11] [Impact Index Per Article: 2.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Two-dimensional (2D) materials, such as graphene, transition metal dichalcogenides, black phosphorus and hexagonal boron nitride, have been intensively investigated as building blocks for optoelectronic devices in the past few years. Very recently, significant efforts have been devoted to the improvement of the optoelectronic performances of 2D materials, which are restricted by their intrinsically low light absorption due to the ultrathin thickness. Making use of the plasmonic effects of metal nanostructures and intrinsic plasmon excitation in graphene has been shown to be one of the promising strategies. In this minireview, recent progress in 2D material-based optoelectronics enabled by the plasmonic effects is highlighted. A perspective on more possibilities in plasmon-assisted 2D material-based optoelectronic applications will also be provided.
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Affiliation(s)
- Hao Wang
- Shenzhen JL Computational Science and Applied Research Institute, Shenzhen 518109, China
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