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Putranto AF, Petit-Etienne C, Cavalaglio S, Cabannes-Boué B, Panabiere M, Forcina G, Fleury G, Kogelschatz M, Zelsmann M. Controlled Anisotropic Wetting by Plasma Treatment for Directed Self-Assembly of High-χ Block Copolymers. ACS APPLIED MATERIALS & INTERFACES 2024; 16:27841-27849. [PMID: 38758246 DOI: 10.1021/acsami.4c01657] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/18/2024]
Abstract
The directed self-assembly (DSA) of block copolymers (BCPs) is a promising next-generation lithography technique for high-resolution patterning. However, achieving lithographically applicable BCP organization such as out-of-plane lamellae requires proper tuning of interfacial energies between the BCP domains and the substrate, which remains difficult to address effectively and efficiently with high-χ BCPs. Here, we present the successful generation of anisotropic wetting by plasma treatment on patterned spin-on-carbon (SOC) substrates and its application to the DSA of a high-χ Si-containing material, poly(1,1-dimethylsilacyclobutane)-block-polystyrene (PDMSB-b-PS), with a 9 nm half pitch. Exposing the SOC substrate to different plasma chemistries promotes the vertical alignment of the PDMSB-b-PS lamellae within the trenches. In particular, a patterned substrate treated with HBr/O2 plasma gives both a neutral wetting at the bottom interface and a strong PS-affine wetting at the sidewalls of the SOC trenches to efficiently guide the vertical BCP lamellae. Furthermore, prolonged exposure to HBr/O2 plasma enables an adjustment of the trench width and an increased density of BCP lines on the substrate. Experimental observations are in agreement with a free energy configurational model developed to describe the system. These advances, which could be easily implemented in industry, could contribute to the wider adoption of self-assembly techniques in microelectronics, and beyond to applications such as metasurfaces, surface-enhanced Raman spectroscopy, and sensing technologies.
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Affiliation(s)
- Achmad Fajar Putranto
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
| | - Camille Petit-Etienne
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
| | - Sébastien Cavalaglio
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
| | | | - Marie Panabiere
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
| | - Gianluca Forcina
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
| | - Guillaume Fleury
- CNRS, Bordeaux INP, LCPO, UMR 5629, Univ. Bordeaux, F-33600 Pessac, France
| | - Martin Kogelschatz
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
| | - Marc Zelsmann
- CNRS, CEA/LETI Minatec, Laboratoire des Technologies de la Microélectronique (LTM), Université Grenoble Alpes, 38000 Grenoble, France
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Jambhulkar S, Ravichandran D, Zhu Y, Thippanna V, Ramanathan A, Patil D, Fonseca N, Thummalapalli SV, Sundaravadivelan B, Sun A, Xu W, Yang S, Kannan AM, Golan Y, Lancaster J, Chen L, Joyee EB, Song K. Nanoparticle Assembly: From Self-Organization to Controlled Micropatterning for Enhanced Functionalities. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2024; 20:e2306394. [PMID: 37775949 DOI: 10.1002/smll.202306394] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/27/2023] [Revised: 09/02/2023] [Indexed: 10/01/2023]
Abstract
Nanoparticles form long-range micropatterns via self-assembly or directed self-assembly with superior mechanical, electrical, optical, magnetic, chemical, and other functional properties for broad applications, such as structural supports, thermal exchangers, optoelectronics, microelectronics, and robotics. The precisely defined particle assembly at the nanoscale with simultaneously scalable patterning at the microscale is indispensable for enabling functionality and improving the performance of devices. This article provides a comprehensive review of nanoparticle assembly formed primarily via the balance of forces at the nanoscale (e.g., van der Waals, colloidal, capillary, convection, and chemical forces) and nanoparticle-template interactions (e.g., physical confinement, chemical functionalization, additive layer-upon-layer). The review commences with a general overview of nanoparticle self-assembly, with the state-of-the-art literature review and motivation. It subsequently reviews the recent progress in nanoparticle assembly without the presence of surface templates. Manufacturing techniques for surface template fabrication and their influence on nanoparticle assembly efficiency and effectiveness are then explored. The primary focus is the spatial organization and orientational preference of nanoparticles on non-templated and pre-templated surfaces in a controlled manner. Moreover, the article discusses broad applications of micropatterned surfaces, encompassing various fields. Finally, the review concludes with a summary of manufacturing methods, their limitations, and future trends in nanoparticle assembly.
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Affiliation(s)
- Sayli Jambhulkar
- Systems Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Dharneedar Ravichandran
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Yuxiang Zhu
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Varunkumar Thippanna
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Arunachalam Ramanathan
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Dhanush Patil
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Nathan Fonseca
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Sri Vaishnavi Thummalapalli
- Manufacturing Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Barath Sundaravadivelan
- Department of Mechanical and Aerospace Engineering, School for Engineering of Matter, Transport & Energy, Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Tempe, AZ, 85281, USA
| | - Allen Sun
- Department of Chemistry, Stony Brook University, Stony Brook, NY, 11794, USA
| | - Weiheng Xu
- Systems Engineering, School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Sui Yang
- Materials Science and Engineering, School for Engineering of Matter, Transport and Energy (SEMTE), Arizona State University (ASU), Tempe, AZ, 85287, USA
| | - Arunachala Mada Kannan
- The Polytechnic School (TPS), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
| | - Yuval Golan
- Department of Materials Engineering and the Ilse Katz Institute for Nanoscale Science and Technology, Ben-Gurion University of the Negev, Beer Sheva, 8410501, Israel
| | - Jessica Lancaster
- Department of Immunology, Mayo Clinic Arizona, 13400 E Shea Blvd, Scottsdale, AZ, 85259, USA
| | - Lei Chen
- Mechanical Engineering, University of Michigan-Dearborn, 4901 Evergreen Rd, Dearborn, MI, 48128, USA
| | - Erina B Joyee
- Mechanical Engineering and Engineering Science, University of North Carolina, Charlotte, 9201 University City Blvd, Charlotte, NC, 28223, USA
| | - Kenan Song
- School of Environmental, Civil, Agricultural, and Mechanical Engineering (ECAM), College of Engineering, University of Georgia (UGA), Athens, GA, 30602, USA
- Adjunct Professor of School of Manufacturing Systems and Networks (MSN), Ira A. Fulton Schools of Engineering, Arizona State University (ASU), Mesa, AZ, 85212, USA
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Esmeraldo Paiva A, Gerlt MS, Läubli NF, Prochukhan N, Baez Vasquez JF, Kaminski Schierle GS, Morris MA. High Aspect Ratio Nanoscale Pores through BCP-Based Metal Oxide Masks and Advanced Dry Etching. ACS APPLIED MATERIALS & INTERFACES 2023; 15:57960-57969. [PMID: 37861980 PMCID: PMC10739579 DOI: 10.1021/acsami.3c09863] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/10/2023] [Revised: 09/29/2023] [Accepted: 10/04/2023] [Indexed: 10/21/2023]
Abstract
The reliable and regular modification of the surface properties of substrates plays a crucial role in material research and the development of functional surfaces. A key aspect of this is the development of the surface pores and topographies. These can confer specific advantages such as high surface area as well as specific functions such as hydrophobic properties. Here, we introduce a combination of nanoscale self-assembled block-copolymer-based metal oxide masks with optimized deep reactive ion etching (DRIE) of silicon to permit the fabrication of porous topographies with aspect ratios of up to 50. Following the evaluation of our procedure and involved parameters using various techniques, such as AFM or SEM, the suitability of our features for applications relying on high light absorption as well as efficient thermal management is explored and discussed in further detail.
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Affiliation(s)
- Aislan Esmeraldo Paiva
- AMBER
Research Centre/School of Chemistry, Trinity
College Dublin, Dublin D02 CP49, Ireland
| | - Michael S. Gerlt
- Department
of Biomedical Engineering, Lund University, Lund 22363, Sweden
- Department
of Mechanical and Process Engineering, ETH
Zürich, Zürich 8092, Switzerland
| | - Nino F. Läubli
- Department
of Chemical Engineering and Biotechnology, University of Cambridge, Cambridge CB3 0AS, U.K.
| | - Nadezda Prochukhan
- AMBER
Research Centre/School of Chemistry, Trinity
College Dublin, Dublin D02 CP49, Ireland
| | | | | | - Michael A. Morris
- AMBER
Research Centre/School of Chemistry, Trinity
College Dublin, Dublin D02 CP49, Ireland
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Xu B, Wu D, Hill IM, Halim M, Rubin Y, Wang Y. A new and versatile template towards vertically oriented nanopillars and nanotubes. NANOSCALE ADVANCES 2023; 5:4489-4498. [PMID: 37638160 PMCID: PMC10448359 DOI: 10.1039/d3na00476g] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 06/30/2023] [Accepted: 07/31/2023] [Indexed: 08/29/2023]
Abstract
Vertically oriented nanostructures bring unparalleled high surface area, light trapping capability, and high device density to electronic, optoelectronic, and energy storage devices. However, general methods to prepare such structures remain sparse and are typically based on anodized metal oxide templates. Here, we demonstrate a new approach: using vertically oriented tetraaniline nanopillar arrays as templates for creating nanopillars and nanotubes of other materials. The tetraaniline templates are scalable and easy to prepare. Vertical arrays of a variety of materials can be created by directly coating them onto the tetraaniline nanopillars via vapor, solution, or electrodeposition. Since the tetraaniline template is encased within the target material, it does not require post-deposition removal, thus enabling vertical structure formation of sensitive materials. Conversely, removal of the encased tetraaniline template provides vertically oriented nanotube arrays in a lost-wax-type operation. The resulting vertical structures exhibit a high degree of orientation and height uniformity, with tunable feature size, spacing, and array density. Furthermore, the deposition location and shape of the vertical arrays can be patterned at a resolution of 3 μm. Collectively, these attributes should broaden the material repertoire for vertically oriented structures, and lead to advancements in energy storage, electronics, and optoelectronics.
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Affiliation(s)
- Bohao Xu
- Department of Materials Science and Engineering, University of California Merced USA
| | - Di Wu
- Department of Materials Science and Engineering, University of California Merced USA
| | - Ian M Hill
- Department of Materials Science and Engineering, University of California Merced USA
| | - Merissa Halim
- Department of Chemistry and Biochemistry, University of California Los Angeles USA
| | - Yves Rubin
- Department of Chemistry and Biochemistry, University of California Los Angeles USA
| | - Yue Wang
- Department of Materials Science and Engineering, University of California Merced USA
- Department of Chemistry and Biochemistry, University of California Merced USA
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Fabrication of Ultrafine, Highly Ordered Nanostructures Using Carbohydrate-Inorganic Hybrid Block Copolymers. NANOMATERIALS 2022; 12:nano12101653. [PMID: 35630875 PMCID: PMC9144075 DOI: 10.3390/nano12101653] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 04/21/2022] [Revised: 05/10/2022] [Accepted: 05/10/2022] [Indexed: 12/04/2022]
Abstract
Block copolymers (BCPs) have garnered considerable interest due to their ability to form microphase-separated structures suitable for nanofabrication. For these applications, it is critical to achieve both sufficient etch selectivity and a small domain size. To meet both requirements concurrently, we propose the use of oligosaccharide and oligodimethylsiloxane as hydrophilic and etch-resistant hydrophobic inorganic blocks, respectively, to build up a novel BCP system, i.e., carbohydrate-inorganic hybrid BCP. The carbohydrate-inorganic hybrid BCPs were synthesized via a click reaction between oligodimethylsiloxane with an azido group at each chain end and propargyl-functionalized maltooligosaccharide (consisting of one, two, and three glucose units). In the bulk state, small-angle X-ray scattering revealed that these BCPs microphase separated into gyroid, asymmetric lamellar, and symmetric lamellar structures with domain-spacing ranging from 5.0 to 5.9 nm depending on the volume fraction. Additionally, we investigated microphase-separated structures in the thin film state and discovered that the BCP with the most asymmetric composition formed an ultrafine and highly oriented gyroid structure as well as in the bulk state. After reactive ion etching, the gyroid thin film was transformed into a nanoporous-structured gyroid SiO2 material, demonstrating the material’s promising potential as nanotemplates.
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