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Barth S, Porrati F, Knez D, Jungwirth F, Jochmann NP, Huth M, Winkler R, Plank H, Gracia I, Cané C. Nanoscale, surface-confined phase separation by electron beam induced oxidation. NANOSCALE 2024; 16:14722-14729. [PMID: 38922329 DOI: 10.1039/d4nr01650e] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/27/2024]
Abstract
Electron-assisted oxidation of Co-Si-based focused electron beam induced deposition (FEBID) materials is shown to form a 2-4 nm metal oxide surface layer on top of an electrically insulating silicon oxide layer less than 10 nm thick. Differences between thermal and electron-induced oxidation on the resulting microstructure are illustrated.
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Affiliation(s)
- Sven Barth
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany.
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Fabrizio Porrati
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany.
| | - Daniel Knez
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria
| | - Felix Jungwirth
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany.
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Nicolas P Jochmann
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany.
- Institute for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, 60438 Frankfurt, Germany
| | - Michael Huth
- Institute of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, 60323 Frankfurt am Main, Germany.
| | - Robert Winkler
- Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes (DEFINE), Institute of Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria
| | - Harald Plank
- Institute of Electron Microscopy and Nanoanalysis, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria
- Christian Doppler Laboratory for Direct-Write Fabrication of 3D Nano-Probes (DEFINE), Institute of Electron Microscopy, Graz University of Technology, Steyrergasse 17, 8010 Graz, Austria
| | - Isabel Gracia
- Institut de Microelectrònica de Barcelona (IMB), Centre Nacional de Microelectrònica (CNM), Consejo Superior de Investigaciones Científicas (CSIC), 08193 Barcelona, Spain
| | - Carles Cané
- Institut de Microelectrònica de Barcelona (IMB), Centre Nacional de Microelectrònica (CNM), Consejo Superior de Investigaciones Científicas (CSIC), 08193 Barcelona, Spain
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Jungwirth F, Salvador-Porroche A, Porrati F, Jochmann NP, Knez D, Huth M, Gracia I, Cané C, Cea P, De Teresa JM, Barth S. Gas-Phase Synthesis of Iron Silicide Nanostructures Using a Single-Source Precursor: Comparing Direct-Write Processing and Thermal Conversion. THE JOURNAL OF PHYSICAL CHEMISTRY. C, NANOMATERIALS AND INTERFACES 2024; 128:2967-2977. [PMID: 38444783 PMCID: PMC10910579 DOI: 10.1021/acs.jpcc.3c08250] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 12/18/2023] [Revised: 01/24/2024] [Accepted: 01/29/2024] [Indexed: 03/07/2024]
Abstract
The investigation of precursor classes for the fabrication of nanostructures is of specific interest for maskless fabrication and direct nanoprinting. In this study, the differences in material composition depending on the employed process are illustrated for focused-ion-beam- and focused-electron-beam-induced deposition (FIBID/FEBID) and compared to the thermal decomposition in chemical vapor deposition (CVD). This article reports on specific differences in the deposit composition and microstructure when the (H3Si)2Fe(CO)4 precursor is converted into an inorganic material. Maximum metal/metalloid contents of up to 90 at. % are obtained in FIBID deposits and higher than 90 at. % in CVD films, while FEBID with the same precursor provides material containing less than 45 at. % total metal/metalloid content. Moreover, the Fe:Si ratio is retained well in FEBID and CVD processes, but FIBID using Ga+ ions liberates more than 50% of the initial Si provided by the precursor. This suggests that precursors for FIBID processes targeting binary materials should include multiple bonding such as bridging positions for nonmetals. In addition, an in situ method for investigations of supporting thermal effects of precursor fragmentation during the direct-writing processes is presented, and the applicability of the precursor for nanoscale 3D FEBID writing is demonstrated.
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Affiliation(s)
- Felix Jungwirth
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
- Institute
for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, Frankfurt 60438, Germany
| | - Alba Salvador-Porroche
- Instituto
de Nanociencia y Materiales de Aragón (INMA), CSIC−Universidad de Zaragoza, Zaragoza 50009, Spain
| | - Fabrizio Porrati
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
| | - Nicolas P. Jochmann
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
- Institute
for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, Frankfurt 60438, Germany
| | - Daniel Knez
- Institute
of Electron Microscopy and Nanoanalysis, Graz University of Technology, Steyrergasse 17, Graz 8010, Austria
| | - Michael Huth
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
| | - Isabel Gracia
- Institut
de Microelectrònica de Barcelona (IMB), Centre Nacional de
Microelectrònica (CNM), Consejo Superior
de Investigaciones Científicas (CSIC), Barcelona 08193, Spain
| | - Carles Cané
- Institut
de Microelectrònica de Barcelona (IMB), Centre Nacional de
Microelectrònica (CNM), Consejo Superior
de Investigaciones Científicas (CSIC), Barcelona 08193, Spain
| | - Pilar Cea
- Instituto
de Nanociencia y Materiales de Aragón (INMA), CSIC−Universidad de Zaragoza, Zaragoza 50009, Spain
- Laboratorio
de Microscopías Avanzadas (LMA), Universidad de Zaragoza, Edificio de
I+D+i, Campus Río Ebro, Zaragoza 50018, Spain
| | - José María De Teresa
- Instituto
de Nanociencia y Materiales de Aragón (INMA), CSIC−Universidad de Zaragoza, Zaragoza 50009, Spain
| | - Sven Barth
- Institute
of Physics, Goethe University Frankfurt, Max-von-Laue-Str. 1, Frankfurt am Main 60323, Germany
- Institute
for Inorganic and Analytical Chemistry, Goethe University Frankfurt, Max-von-Laue-Str. 7, Frankfurt 60438, Germany
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Vanadium and Manganese Carbonyls as Precursors in Electron-Induced and Thermal Deposition Processes. NANOMATERIALS 2022; 12:nano12071110. [PMID: 35407228 PMCID: PMC9000455 DOI: 10.3390/nano12071110] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Download PDF] [Figures] [Subscribe] [Scholar Register] [Received: 02/28/2022] [Revised: 03/21/2022] [Accepted: 03/24/2022] [Indexed: 02/04/2023]
Abstract
The material composition and electrical properties of nanostructures obtained from focused electron beam-induced deposition (FEBID) using manganese and vanadium carbonyl precursors have been investigated. The composition of the FEBID deposits has been compared with thin films derived by the thermal decomposition of the same precursors in chemical vapor deposition (CVD). FEBID of V(CO)6 gives access to a material with a V/C ratio of 0.63–0.86, while in CVD a lower carbon content with V/C ratios of 1.1–1.3 is obtained. Microstructural characterization reveals for V-based materials derived from both deposition techniques crystallites of a cubic phase that can be associated with VC1−xOx. In addition, the electrical transport measurements of direct-write VC1−xOx show moderate resistivity values of 0.8–1.2 × 103 µΩ·cm, a negligible influence of contact resistances and signatures of a granular metal in the temperature-dependent conductivity. Mn-based deposits obtained from Mn2(CO)10 contain ~40 at% Mn for FEBID and a slightly higher metal percentage for CVD. Exclusively insulating material has been observed in FEBID deposits as deduced from electrical conductivity measurements. In addition, strong tendencies for postgrowth oxidation have to be considered.
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