1
|
Yeon E, Woo S, Chu RJ, Lee IH, Jang HW, Jung D, Choi WJ. Reduction of Structural Defects in the GaSb Buffer Layer on (001) GaP/Si for High Performance InGaSb/GaSb Quantum Well Light-Emitting Diodes. ACS APPLIED MATERIALS & INTERFACES 2023; 15:55965-55974. [PMID: 37978916 DOI: 10.1021/acsami.3c10979] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/19/2023]
Abstract
Monolithic integration of GaSb-based optoelectronic devices on Si is a promising approach for achieving a low-cost, compact, and scalable infrared photonics platform. While tremendous efforts have been put into reducing dislocation densities by using various defect filter layers, exploring other types of extended crystal defects that can exist on GaSb/Si buffers has largely been neglected. Here, we show that GaSb growth on Si generates a high density of micro-twin (MT) defects as well as threading dislocations (TDs) to accommodate the extremely large misfit between GaSb and Si. We found that a 250 nm AlSb single insertion layer is more effective than AlSb/GaSb strained superlattices in reducing both types of defects, resulting in a 4× and 13× reduction in TD density and MT density, respectively, compared with a reference sample with no defect filter layer. InGaSb quantum well light-emitting diodes were grown on the GaSb/Si templates, and the effect of TD density and MT density on their performance was studied. This work shows the importance of using appropriate defect filter layers for high performance GaSb-based optoelectronic devices on standard on-axis (001) Si via direct epitaxial growth.
Collapse
Affiliation(s)
- Eungbeom Yeon
- Center for Optoelectronic Materials and Devices, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Department of Materials Science and Engineering, Korea University, Seoul 02481, South Korea
| | - Seungwan Woo
- Center for Optoelectronic Materials and Devices, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Department of Materials Science and Engineering, Research Institute of Advanced Materials, Seoul National University, Seoul 08826, South Korea
| | - Rafael Jumar Chu
- Center for Optoelectronic Materials and Devices, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Division of Nanoscience and Technology, University of Science and Technology, Seoul 02792, South Korea
| | - In-Hwan Lee
- Department of Materials Science and Engineering, Korea University, Seoul 02481, South Korea
| | - Ho Won Jang
- Department of Materials Science and Engineering, Research Institute of Advanced Materials, Seoul National University, Seoul 08826, South Korea
| | - Daehwan Jung
- Center for Optoelectronic Materials and Devices, Korea Institute of Science and Technology, Seoul 02792, South Korea
- Division of Nanoscience and Technology, University of Science and Technology, Seoul 02792, South Korea
| | - Won Jun Choi
- Center for Optoelectronic Materials and Devices, Korea Institute of Science and Technology, Seoul 02792, South Korea
| |
Collapse
|
2
|
Growth and Fabrication of GaAs Thin-Film Solar Cells on a Si Substrate via Hetero Epitaxial Lift-Off. APPLIED SCIENCES-BASEL 2022. [DOI: 10.3390/app12020820] [Citation(s) in RCA: 2] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 11/16/2022]
Abstract
We demonstrate, for the first time, GaAs thin film solar cells epitaxially grown on a Si substrate using a metal wafer bonding and epitaxial lift-off process. A relatively thin 2.1 μm GaAs buffer layer was first grown on Si as a virtual substrate, and a threading dislocation density of 1.8 × 107 cm−2 was achieved via two In0.1Ga0.9As strained insertion layers and 6× thermal cycle annealing. An inverted p-on-n GaAs solar cell structure grown on the GaAs/Si virtual substrate showed homogenous photoluminescence peak intensities throughout the 2″ wafer. We show a 10.6% efficient GaAs thin film solar cell without anti-reflection coatings and compare it to nominally identical upright structure solar cells grown on GaAs and Si. This work paves the way for large-scale and low-cost wafer-bonded III-V multi-junction solar cells.
Collapse
|