Thermal Conductivity of Amorphous NbOx Thin Films and Its Effect on Volatile Memristive Switching

Effect of Interdiffusion and Crystallization on Threshold Switching Characteristics of Nb/Nb2O5/Pt Memristors

The resistive switching response of two terminal metal/oxide/metal devices depends on the stoichiometry of the oxide film, and this is commonly controlled by using a reactive metal electrode to reduce the oxide layer. Here, we investigate compositional and structural changes induced in Nb/Nb2O5 bilayers by thermal annealing at temperatures in the range of 573-973 K and its effect on the volatile threshold switching characteristics of Nb/Nb2O5/Pt devices. Changes in the stoichiometry of the Nb and Nb2O5 films are determined by Rutherford backscattering spectrometry and energy-dispersive X-ray (EDX) mapping of sample cross sections, while the structure of the films is determined by X-ray diffraction, Raman spectroscopy, and transmission electron microscopy (TEM). Such analysis shows that the composition of the Nb and Nb2O5 layers is homogenized by interdiffusion at temperatures less than the crystallization temperature (i.e., >773 K) but that this effectively ceases once the films crystallize. This is explained by comparison with the predictions of a simple diffusion model which shows that the compositional changes are dominated by oxygen diffusion in the amorphous oxide, which is much faster than that in the crystalline phases. We further show that these compositional and structural changes have a significant effect on the electroforming and threshold switching characteristics of the devices, the most significant being a marked increase in their reliability and endurance after crystallization of the oxide films. Finally, we examine the effect of annealing on the quasistatic negative differential resistance characteristics and oscillator dynamics of devices and use a lumped element model to show that this is dominated by changes in the device capacitance resulting from interdiffusion.

Thermal transport in metal-NbOx-metal cross-point devices and its effect on threshold switching characteristics

Volatile threshold switching and current-controlled negative differential resistance (NDR) in metal-oxide-metal (MOM) devices result from thermally driven conductivity changes induced by local Joule heating and are therefore influenced by the thermal properties of the device-structure. In this study, we investigate the effect of the metal electrodes on the threshold switching response of NbO_x-based cross-point devices. The electroforming and switching characteristics are shown to be strongly influenced by the thickness and thermal conductivity of the top-electrode due to its effect on heat loss from the NbO_x film. Specifically, we demonstrate a 40% reduction in threshold voltage and a 75% reduction in threshold power as the thickness of the top Au electrode is reduced from 125 nm to 25 nm, and a 24% reduction in threshold voltage and 64% reduction in threshold power when the Au electrode is replaced by a Pt electrode of the same thickness of NbO_x film, due to its lower thermal conductivity. Lumped element and finite element modelling of the devices show that these improvements are due to a reduction in heat loss to the electrodes, which is dominated by lateral heat flow within the electrode. These results clearly demonstrate the importance of the electrodes in determining the electroforming and threshold switching characteristics of MOM cross point devices.