1
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Wu H, Zhang X, Han W. Ultrafast Temporal-Spatial Dynamics of Phase Transition in N-Doped Ge 2Sb 2Te 5 Film Induced by Femtosecond Laser Pulse Irradiation. MICROMACHINES 2022; 13:2168. [PMID: 36557466 PMCID: PMC9785651 DOI: 10.3390/mi13122168] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 11/02/2022] [Revised: 12/01/2022] [Accepted: 12/05/2022] [Indexed: 06/17/2023]
Abstract
Element-doped phase change material (PCM) could improve the performances, e.g., better thermal stability, higher electrical resistance, and faster crystallization speed; thus, the influence of the doping element needs to be further investigated. In this paper, a femtosecond laser, which could realize the ultrafast phase transition rate of PCM between amorphization and crystallization, was used to explore the properties of nitrogen-doped Ge2Sb2Te5 (GST), and a bond effect was proposed. The pure GST and different nitrogen contents of doped GST films were investigated by femtosecond laser pulse excitation through a pump-probe shadowgraph imaging technique. The results showed that the element-doped films could change photon absorption because of the increase in free carriers. This caused the faster rate of reflectivity to change in the irradiated area by the laser beam as the more nitrogen doped. When the nitrogen content increased, the crystallization evolution became harder because it enhanced the bond effect, which suppressed crystalline grain growth and improved the thermal stability. Based on the analysis in the paper, the desired performances of PCMs, e.g., ultrafast dynamics, crystallization evolution, and thermal stability, could be controlled according to the demands by modifying the bond effect.
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Affiliation(s)
- Hao Wu
- Laser Micro/Nano-Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China
- Beijing Institute of Technology Chongqing Innovation Center, Chongqing 401120, China
| | - Xiaobin Zhang
- Laser Micro/Nano-Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China
- Beijing Institute of Technology Chongqing Innovation Center, Chongqing 401120, China
| | - Weina Han
- Laser Micro/Nano-Fabrication Laboratory, School of Mechanical Engineering, Beijing Institute of Technology, Beijing 100081, China
- Beijing Institute of Technology Chongqing Innovation Center, Chongqing 401120, China
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2
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Ning J, Wang Y, Teo TY, Huang CC, Zeimpekis I, Morgan K, Teo SL, Hewak DW, Bosman M, Simpson RE. Low Energy Switching of Phase Change Materials Using a 2D Thermal Boundary Layer. ACS APPLIED MATERIALS & INTERFACES 2022; 14:41225-41234. [PMID: 36043468 DOI: 10.1021/acsami.2c12936] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/15/2023]
Abstract
The switchable optical and electrical properties of phase change materials (PCMs) are finding new applications beyond data storage in reconfigurable photonic devices. However, high power heat pulses are needed to melt-quench the material from crystalline to amorphous. This is especially true in silicon photonics, where the high thermal conductivity of the waveguide material makes heating the PCM energy inefficient. Here, we improve the energy efficiency of the laser-induced phase transitions by inserting a layer of two-dimensional (2D) material, either MoS2 or WS2, between the silica or silicon substrate and the PCM. The 2D material reduces the required laser power by at least 40% during the amorphization (RESET) process, depending on the substrate. Thermal simulations confirm that both MoS2 and WS2 2D layers act as a thermal barrier, which efficiently confines energy within the PCM layer. Remarkably, the thermal insulation effect of the 2D layer is equivalent to a ∼100 nm layer of SiO2. The high thermal boundary resistance induced by the van der Waals (vdW)-bonded layers limits the thermal diffusion through the layer interface. Hence, 2D materials with stable vdW interfaces can be used to improve the thermal efficiency of PCM-tuned Si photonic devices. Furthermore, our waveguide simulations show that the 2D layer does not affect the propagating mode in the Si waveguide; thus, this simple additional thin film produces a substantial energy efficiency improvement without degrading the optical performance of the waveguide. Our findings pave the way for energy-efficient laser-induced structural phase transitions in PCM-based reconfigurable photonic devices.
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Affiliation(s)
- Jing Ning
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
- Department of Materials Science & Engineering, National University of Singapore, 9 Engineering Drive 1, 117575 Singapore
| | - Yunzheng Wang
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
| | - Ting Yu Teo
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
| | - Chung-Che Huang
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Ioannis Zeimpekis
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Katrina Morgan
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Siew Lang Teo
- Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis 138634, Singapore
| | - Daniel W Hewak
- Optoelectronics Research Centre, University of Southampton, Southampton SO17 1BJ, United Kingdom
| | - Michel Bosman
- Department of Materials Science & Engineering, National University of Singapore, 9 Engineering Drive 1, 117575 Singapore
- Institute of Materials Research and Engineering (IMRE), Agency for Science Technology and Research (A*STAR), 2 Fusionopolis Way, Innovis 138634, Singapore
| | - Robert E Simpson
- Singapore University of Technology and Design (SUTD), 8 Somapah Road, 487372 Singapore
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3
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Zheng C, Simpson RE, Tang K, Ke Y, Nemati A, Zhang Q, Hu G, Lee C, Teng J, Yang JKW, Wu J, Qiu CW. Enabling Active Nanotechnologies by Phase Transition: From Electronics, Photonics to Thermotics. Chem Rev 2022; 122:15450-15500. [PMID: 35894820 DOI: 10.1021/acs.chemrev.2c00171] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/29/2022]
Abstract
Phase transitions can occur in certain materials such as transition metal oxides (TMOs) and chalcogenides when there is a change in external conditions such as temperature and pressure. Along with phase transitions in these phase change materials (PCMs) come dramatic contrasts in various physical properties, which can be engineered to manipulate electrons, photons, polaritons, and phonons at the nanoscale, offering new opportunities for reconfigurable, active nanodevices. In this review, we particularly discuss phase-transition-enabled active nanotechnologies in nonvolatile electrical memory, tunable metamaterials, and metasurfaces for manipulation of both free-space photons and in-plane polaritons, and multifunctional emissivity control in the infrared (IR) spectrum. The fundamentals of PCMs are first introduced to explain the origins and principles of phase transitions. Thereafter, we discuss multiphysical nanodevices for electronic, photonic, and thermal management, attesting to the broad applications and exciting promises of PCMs. Emerging trends and valuable applications in all-optical neuromorphic devices, thermal data storage, and encryption are outlined in the end.
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Affiliation(s)
- Chunqi Zheng
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore.,NUS Graduate School, National University of Singapore, Singapore 119077, Singapore
| | - Robert E Simpson
- Engineering Product Development, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Kechao Tang
- Key Laboratory of Microelectronic Devices and Circuits (MOE), School of Integrated Circuits, Peking University, Beijing 100871, China
| | - Yujie Ke
- Engineering Product Development, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore
| | - Arash Nemati
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore
| | - Qing Zhang
- School of Physics, University of Electronic Science and Technology of China, Chengdu 611731, China
| | - Guangwei Hu
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
| | - Chengkuo Lee
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
| | - Jinghua Teng
- Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore
| | - Joel K W Yang
- Engineering Product Development, Singapore University of Technology and Design (SUTD), Singapore 487372, Singapore.,Institute of Materials Research and Engineering, Agency for Science, Technology and Research (A*STAR), Singapore 138634, Singapore
| | - Junqiao Wu
- Department of Materials Science and Engineering, University of California, Berkeley, and Lawrence Berkeley National Laboratory, California 94720, United States
| | - Cheng-Wei Qiu
- Department of Electrical and Computer Engineering, National University of Singapore, Singapore 117583, Singapore
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4
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Kerres P, Zhou Y, Vaishnav H, Raghuwanshi M, Wang J, Häser M, Pohlmann M, Cheng Y, Schön CF, Jansen T, Bellin C, Bürgler DE, Jalil AR, Ringkamp C, Kowalczyk H, Schneider CM, Shukla A, Wuttig M. Scaling and Confinement in Ultrathin Chalcogenide Films as Exemplified by GeTe. SMALL (WEINHEIM AN DER BERGSTRASSE, GERMANY) 2022; 18:e2201753. [PMID: 35491494 DOI: 10.1002/smll.202201753] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.5] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/20/2022] [Indexed: 06/14/2023]
Abstract
Chalcogenides such as GeTe, PbTe, Sb2 Te3 , and Bi2 Se3 are characterized by an unconventional combination of properties enabling a plethora of applications ranging from thermo-electrics to phase change materials, topological insulators, and photonic switches. Chalcogenides possess pronounced optical absorption, relatively low effective masses, reasonably high electron mobilities, soft bonds, large bond polarizabilities, and low thermal conductivities. These remarkable characteristics are linked to an unconventional bonding mechanism characterized by a competition between electron delocalization and electron localization. Confinement, that is, the reduction of the sample dimension as realized in thin films should alter this competition and modify chemical bonds and the resulting properties. Here, pronounced changes of optical and vibrational properties are demonstrated for crystalline films of GeTe, while amorphous films of GeTe show no similar thickness dependence. For crystalline films, this thickness dependence persists up to remarkably large thicknesses above 15 nm. X-ray diffraction and accompanying simulations employing density functional theory relate these changes to thickness dependent structural (Peierls) distortions, due to an increased electron localization between adjacent atoms upon reducing the film thickness. A thickness dependence and hence potential to modify film properties for all chalcogenide films with a similar bonding mechanism is expected.
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Affiliation(s)
- Peter Kerres
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
| | - Yiming Zhou
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
| | - Hetal Vaishnav
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
- Peter Grünberg Institute-JARA-Institute Energy-Efficient Information Technology (PGI-10), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
| | - Mohit Raghuwanshi
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
- Peter Grünberg Institute-JARA-Institute Energy-Efficient Information Technology (PGI-10), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
| | - Jiangjing Wang
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
- Center for Alloy Innovation and Design, Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China
| | - Maria Häser
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
| | - Marc Pohlmann
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
| | - Yudong Cheng
- I. Institute of Physics (IA), RWTH Aachen University, 52056, Aachen, Germany
- Center for Alloy Innovation and Design, Key Laboratory for Mechanical Behavior of Materials, Xi'an Jiaotong University, Xi'an, 710049, China
| | | | - Thomas Jansen
- Peter Grünberg Institute-Electronic Properties (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
| | - Christophe Bellin
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, Paris, F-75005, France
| | - Daniel E Bürgler
- Peter Grünberg Institute-Electronic Properties (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
| | - Abdur Rehman Jalil
- Peter Grünberg Institute-Semiconductor Nanoelectronics (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
| | - Christoph Ringkamp
- Peter Grünberg Institute-Semiconductor Nanoelectronics (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
| | - Hugo Kowalczyk
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, Paris, F-75005, France
| | - Claus M Schneider
- Peter Grünberg Institute-Electronic Properties (PGI-6), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
- JARA-FIT, RWTH Aachen University, 52056, Aachen, Germany
| | - Abhay Shukla
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, Paris, F-75005, France
| | - Matthias Wuttig
- Peter Grünberg Institute-JARA-Institute Energy-Efficient Information Technology (PGI-10), Forschungszentrum Jülich GmbH, 52428, Jülich, Germany
- JARA-FIT, RWTH Aachen University, 52056, Aachen, Germany
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5
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Read JC, Stewart DA, Reiner JW, Terris BD. Evaluating Ovonic Threshold Switching Materials with Topological Constraint Theory. ACS APPLIED MATERIALS & INTERFACES 2021; 13:37398-37411. [PMID: 34338499 DOI: 10.1021/acsami.1c10131] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/13/2023]
Abstract
The physical properties of ovonic threshold switching (OTS) materials are of great interest due to the use of OTS materials as selectors in cross-point array nonvolatile memory systems. Here, we show that the topological constraint theory (TCT) of chalcogenide glasses provides a robust framework to describe the physical properties of sputtered thin film OTS materials and electronic devices. Using the mean coordination number (MCN) of an OTS alloy as a comparative metric, we show that changes in data trends from several measurements are signatures of the transition from a floppy to a rigid glass network as described by TCT. This approach provides a means to optimize OTS selector materials for device applications using film-level measurements.
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Affiliation(s)
- John C Read
- Western Digital Corporation, 5601 Great Oaks Pkwy, San Jose, California 95119, United States
| | - Derek A Stewart
- Western Digital Corporation, 5601 Great Oaks Pkwy, San Jose, California 95119, United States
| | - James W Reiner
- Western Digital Corporation, 5601 Great Oaks Pkwy, San Jose, California 95119, United States
| | - Bruce D Terris
- Western Digital Corporation, 5601 Great Oaks Pkwy, San Jose, California 95119, United States
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6
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Zhang X, Zhao F, Wang Y, Liang X, Zhang Z, Feng Y, Li Y, Tang L, Feng W. Two-Dimensional GeTe: Air Stability and Photocatalytic Performance for Hydrogen Evolution. ACS APPLIED MATERIALS & INTERFACES 2020; 12:37108-37115. [PMID: 32643918 DOI: 10.1021/acsami.0c08699] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/11/2023]
Abstract
As a key method to convert solar into chemical energy, photocatalytic water decomposition has garnered attention. Moreover, the development of graphene and graphene-like two-dimensional (2D) materials has brought fresh vitality in the field of photocatalysis. Here, we prepared two to four layers of GeTe nanosheets by ultrasonic-assisted liquid-phase exfoliation in argon and air, which we referred to as Ar-GeTe and O-GeTe, respectively. The photocatalytic hydrogen production potential of 2D GeTe was experimentally investigated for the first time. The results indicated that minimally layered GeTe samples are indirect-gap semiconductors with the GeTe band gap increasing after oxidation. All samples have suitable band positions that can drive photocatalytic water splitting into H2 under mild conditions, providing maximum hydrogen evolution rates of 1.13 mmol g-1 h-1 (Ar-GeTe) and 0.54 mmol g-1 h-1 (O-GeTe). With density functional theory computations, the structural stability of GeTe in air was discussed, revealing that oxygen atoms could easily combine with Ge to form a more stable structure, thus impacting the photocatalytic performance of 2D GeTe. Therefore, the light requirement and oxygen deficiency of the material give an advantage in the field of energy supply in space.
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Affiliation(s)
- Xin Zhang
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
| | - Fulai Zhao
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
| | - Yu Wang
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
| | - Xuejing Liang
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
| | - Zhixing Zhang
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
| | - Yiyu Feng
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
- Key Laboratory of Advanced Ceramics and Machining Technology, Ministry of Education, Tianjin 300072, P. R. China
- Key Laboratory of Materials Processing and Mold, Ministry of Education, Zhengzhou University, Zhengzhou 450002, China
| | - Yu Li
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
- Key Laboratory of Advanced Ceramics and Machining Technology, Ministry of Education, Tianjin 300072, P. R. China
| | - Lin Tang
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
- Key Laboratory of Advanced Ceramics and Machining Technology, Ministry of Education, Tianjin 300072, P. R. China
| | - Wei Feng
- Tianjin Key Laboratory of Composite and Functional Materials, School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China
- Key Laboratory of Advanced Ceramics and Machining Technology, Ministry of Education, Tianjin 300072, P. R. China
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7
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Pawbake A, Bellin C, Paulatto L, Béneut K, Biscaras J, Narayana C, Late DJ, Shukla A. Pressure-Induced Phase Transitions in Germanium Telluride: Raman Signatures of Anharmonicity and Oxidation. PHYSICAL REVIEW LETTERS 2019; 122:145701. [PMID: 31050486 DOI: 10.1103/physrevlett.122.145701] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.8] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/23/2019] [Revised: 03/15/2019] [Indexed: 06/09/2023]
Abstract
Pressure-induced phase transitions in GeTe, a prototype phase change material, have been studied to date with diffraction which is not sensitive to anharmonicity-induced dynamical effects. GeTe is also prone to surface oxidation which may compromise surface sensitive measurements. These factors could be responsible for the lack of clarity about the phases and transitions intervening in the phase diagram of GeTe. We have used high-pressure Raman scattering and ab initio pseudopotential density functional calculations to unambiguously establish the high-pressure phase diagram and identify three phases up to 57 GPa, a low-pressure rhombohedral phase, an intermediate pressure cubic phase, and a high-pressure orthorhombic phase. We detect substantial broadening and softening of Raman modes at low pressure and identify the transition regions and possible intermediate phases.
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Affiliation(s)
- Amit Pawbake
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, IRD UMR 206, 4 Place Jussieu, F-75005 Paris, France
| | - Christophe Bellin
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, IRD UMR 206, 4 Place Jussieu, F-75005 Paris, France
| | - Lorenzo Paulatto
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, IRD UMR 206, 4 Place Jussieu, F-75005 Paris, France
| | - Keevin Béneut
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, IRD UMR 206, 4 Place Jussieu, F-75005 Paris, France
| | - Johan Biscaras
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, IRD UMR 206, 4 Place Jussieu, F-75005 Paris, France
| | - Chandrabhas Narayana
- Chemistry and Physics of Materials Unit, Jawaharlal Nehru Centre for Advanced Scientific Research, Jakkur, Bangalore 560 064, India
| | - Dattatray J Late
- Physical and Materials Chemistry Division, CSIR-National Chemical Laboratory, Dr. Homi Bhabha Road, Pune 411008, India
| | - Abhay Shukla
- Institut de Minéralogie, de Physique des Matériaux et de Cosmochimie, Sorbonne Université, UMR CNRS 7590, MNHN, IRD UMR 206, 4 Place Jussieu, F-75005 Paris, France
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Wang Y, Guo T, Liu G, Li T, Lv S, Song S, Cheng Y, Song W, Ren K, Song Z. Sc-Centered Octahedron Enables High-Speed Phase Change Memory with Improved Data Retention and Reduced Power Consumption. ACS APPLIED MATERIALS & INTERFACES 2019; 11:10848-10855. [PMID: 30810295 DOI: 10.1021/acsami.8b22580] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Phase change memory (PCM) with advantages of high operation speed, multilevel storage capability, spiking-time-dependent plasticity, etc., has wide application scenarios in both Von Neumann systems and neuromorphic systems. In the automotive application, intelligent system not only needs high efficiency to handle massive data processing but also good robustness to retain the existing data against high working temperature. In this work, Sc-doped GeTe is developed for PCM, which has achieved 120 °C data retention for 10 years, 6 ns operation speed, and 7 nJ low power consumption. The high data retention is attributed to the high coordination number of Sc and its strong bonds with Te atoms in the amorphous phase, which enhances the robustness of the atomic matrices. Sc-centered octahedrons in amorphous state provide a nucleation center, leading to fast crystallization. In the crystalline phase, Sc atoms occupy Ge vacancies to form a homogenous GeTe-like rhombohedral phase. The strong covalent-like Sc-Te bonds weaken the neighboring Ge-Te bonds, lowering energy for melting. Together with the increased energy efficiency originated from confined grain size, the reduced power consumption has been achieved. The improvements in data retention, speed, and power efficiency have made Sc-doped GeTe a promising candidate for high-performance automobile electronics application.
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Affiliation(s)
- Yong Wang
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Tianqi Guo
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Guangyu Liu
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Tao Li
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- University of Chinese Academy of Sciences , Beijing 100049 , China
| | - Shilong Lv
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
| | - Sannian Song
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
| | - Yan Cheng
- Key Laboratory of Polar Materials and Devices, Ministry of Education , East China Normal University , Shanghai 200062 , China
| | - Wenxiong Song
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
| | - Kun Ren
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
- College of Materials and Environmental Engineering , Hangzhou Dianzi University , Hangzhou , Zhejiang 310018 , China
| | - Zhitang Song
- State Key Laboratory of Functional Materials for Informatics, Laboratory of Nanotechnology , Shanghai Institute of Micro-System and Information Technology, Chinese Academy of Sciences , Shanghai 200050 , China
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9
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Wang G, Lotnyk A, Nie Q, Wang R, Shen X, Lu Y. Shortening Nucleation Time to Enable Ultrafast Phase Transition in Zn 1Sb 7Te 12 Pseudo-Binary Alloy. LANGMUIR : THE ACS JOURNAL OF SURFACES AND COLLOIDS 2018; 34:15143-15149. [PMID: 30449104 DOI: 10.1021/acs.langmuir.8b02737] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Zn1Sb7Te12 thin films have been deposited by magnetron co-sputtering of ZnTe and Sb2Te3 targets. The microstructure, phase-change speed, optical cycling stability, and crystallization kinetics have been investigated during thermal annealing and laser irradiation. The thermal-annealed and laser-irradiated films give a clear evidence of the coexistence of trigonal Sb2Te3 and cubic ZnTe phases, which are homogeneously distributed in a single alloy as confirmed by advanced scanning transmission electron microscopy. The formation of both phases increases the initial nucleation sites, leading to the rapid phase-change speed in the Zn1Sb7Te12 film. The film has a minimum crystallization time of ∼3 ns at 70 mW with almost no incubation period for the formation of critical nuclei compared to Ge2Sb2Te5 and other Zn-based films. Moreover, the complete crystallization of Zn1Sb7Te12 thin films is achieved within 10 ns. The ultrafast two-dimensional nucleation and crystal growth speed in Zn1Sb7Te12 obtained from the laser-irradiated system is almost 7 times faster compared to that in Ge2Sb2Te5 film. Controlling the crystallization process through doping ZnTe into Sb2Te3 is thus promising for the development of high-speed optical switching technology.
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Affiliation(s)
- Guoxiang Wang
- Laboratory of Infrared Materials and Devices, The Research Institute of Advanced Technologies , Ningbo University , Ningbo , Zhejiang 315211 , China
- Leibniz Institute of Surface Engineering (IOM) , Permoserstr. 15 , D-04318 Leipzig , Germany
- Key Laboratory of Photoelectric Detection Materials and Devices of Zhejiang Province , Ningbo , Zhejiang 315211 , China
| | - Andriy Lotnyk
- Leibniz Institute of Surface Engineering (IOM) , Permoserstr. 15 , D-04318 Leipzig , Germany
| | - Qiuhua Nie
- Laboratory of Infrared Materials and Devices, The Research Institute of Advanced Technologies , Ningbo University , Ningbo , Zhejiang 315211 , China
- Key Laboratory of Photoelectric Detection Materials and Devices of Zhejiang Province , Ningbo , Zhejiang 315211 , China
| | - Rongping Wang
- Laboratory of Infrared Materials and Devices, The Research Institute of Advanced Technologies , Ningbo University , Ningbo , Zhejiang 315211 , China
- Key Laboratory of Photoelectric Detection Materials and Devices of Zhejiang Province , Ningbo , Zhejiang 315211 , China
| | - Xiang Shen
- Laboratory of Infrared Materials and Devices, The Research Institute of Advanced Technologies , Ningbo University , Ningbo , Zhejiang 315211 , China
- Key Laboratory of Photoelectric Detection Materials and Devices of Zhejiang Province , Ningbo , Zhejiang 315211 , China
| | - Yegang Lu
- Laboratory of Infrared Materials and Devices, The Research Institute of Advanced Technologies , Ningbo University , Ningbo , Zhejiang 315211 , China
- Key Laboratory of Photoelectric Detection Materials and Devices of Zhejiang Province , Ningbo , Zhejiang 315211 , China
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Sun Y, Ma Z, Jiang X, Tan D, Zhang H, Zhang X, Liu J, Yang H, Li W, Xu L, Chen K, Feng D. Presetting conductive pathway induced the switching uniformity evolution of a-SiN x:H resistive switching memory. NANOTECHNOLOGY 2018; 29:415701. [PMID: 30004387 DOI: 10.1088/1361-6528/aad35d] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Si-based resistive random access memory (RRAM) devices at the nanoscale with high uniformity have great potential applications in the future. We demonstrate that the uniformity evolution of the a-SiNx:H RRAM at the low resistance state (LRS) and the high resistance state (HRS) can be clearly monitored by presetting a Si dangling bond (Si-DB) conductive pathway through thermal energy. It is found that the increased magnitude of uniformity for the LRS and the HRS are determined by the number of preset Si-DBs, which can be controlled by tuning thermal energy. As for LRS, the Si-DBs produced under the electric field along with the preset Si-DB conductive pathways form the main conductive pathway. Theoretical calculation of current-voltage (I-V) curves indicates that the Si-DB conductive pathways obey the trap-assisted tunneling model. In the HRS, the preset Si-DBs induced by thermal energy are the unique source of the conductive pathway. The transmission mechanism involves a trap-to-trap process by the hopping of electrons under a low electric field, Poole-Frenkel emission in the main region under the medium electric field and Fowler-Nordheim tunneling under the high electric field. Our discovery of the uniformity evolution for a-SiNx:H RRAM device through presetting the Si-DB conductive pathway provides new insight into the resistive switching mechanism of next generation Si-based RRAM devices.
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Affiliation(s)
- Yang Sun
- School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, People's Republic of China. Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China. Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials Sciences and Technology, Nanjing University, Nanjing, 210093, People's Republic of China
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Zhang P, Zhao F, Long P, Wang Y, Yue Y, Liu X, Feng Y, Li R, Hu W, Li Y, Feng W. Sonication-assisted liquid-phase exfoliated α-GeTe: a two-dimensional material with high Fe 3+ sensitivity. NANOSCALE 2018; 10:15989-15997. [PMID: 29856449 DOI: 10.1039/c8nr03091j] [Citation(s) in RCA: 19] [Impact Index Per Article: 3.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
We describe sonication-assisted liquid-phase exfoliation of rhombohedral germanium telluride (α-GeTe) to obtain a good dispersion of α-GeTe nanosheets in ethanol. The thickness of the α-GeTe nanosheets is dependent on the exfoliation conditions, and few-layer α-GeTe nanosheets of 2-4 layers and even monolayer α-GeTe were obtained. We use first-principles calculations to investigate the structural, electronic, and optical properties of monolayer and bulk α-GeTe and compare the optical band gap of centrifugally fractionated α-GeTe nanosheet dispersions with the computational predictions. We demonstrate that few layer α-GeTe nanosheets are purified selectively through centrifugation, and they exhibit high sensitivity to Fe3+. The scalable production of two-dimensional α-GeTe nanosheets can be used in the future optoelectronic industry.
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Affiliation(s)
- Panpan Zhang
- School of Materials Science and Engineering, Tianjin University, Tianjin 300072, P. R. China.
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Zhang X, Ma Z, Zhang H, Liu J, Yang H, Sun Y, Tan D, Li W, Xu L, Chen K, Feng D. Forming-free performance of a-SiN x :H-based resistive switching memory obtained by oxygen plasma treatment. NANOTECHNOLOGY 2018; 29:245701. [PMID: 29583126 DOI: 10.1088/1361-6528/aab9e1] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
An a-SiN x -based resistive random access memory (RRAM) device with a forming-free characteristic has significant potentials for the industrialization of the next-generation memories. We demonstrate that a forming-free a-SiN x O y RRAM device can be achieved by an oxygen plasma treatment of ultra-thin a-SiN x :H films. Electron spin resonance spectroscopy reveals that Si dangling bonds with a high density (1019 cm-3) are distributed in the initial state, which exist in the forms of Si2N≡Si·, SiO2≡Si·, O3≡Si·, and N3≡Si·. X-ray photoelectron spectroscopy and temperature-dependent current analyses reveal that the silicon dangling bonds induced by the oxygen plasma treatment and external electric field contribute to the low resistance state (LRS). For the high resistance state (HRS), the rupture of the silicon dangling bond pathway is attributed to the partial passivation of Si dangling bonds by H+ and O2-. Both LRS and HRS transmissions obey the hopping conduction model. The proposed oxygen plasma treatment, introduced to generate a high density of Si dangling bonds in the SiN x O y :H films, provides a new approach to forming-free RRAM devices.
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Affiliation(s)
- Xinxin Zhang
- School of Electronic Science and Engineering, Nanjing University, Nanjing, 210093, People's Republic of China. Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing, 210093, People's Republic of China. Jiangsu Provincial Key Laboratory of Photonic and Electronic Materials Sciences and Technology, Nanjing University, Nanjing, 210093, People's Republic of China
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Behera JK, Zhou X, Ranjan A, Simpson RE. Sb 2Te 3 and Its Superlattices: Optimization by Statistical Design. ACS APPLIED MATERIALS & INTERFACES 2018; 10:15040-15050. [PMID: 29649865 DOI: 10.1021/acsami.8b02100] [Citation(s) in RCA: 2] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
The objective of this work is to demonstrate the usefulness of fractional factorial design for optimizing the crystal quality of chalcogenide van der Waals (vdW) crystals. We statistically analyze the growth parameters of highly c axis oriented Sb2Te3 crystals and Sb2Te3-GeTe phase change vdW heterostructured superlattices. The statistical significance of the growth parameters of temperature, pressure, power, buffer materials, and buffer layer thickness was found by fractional factorial design and response surface analysis. Temperature, pressure, power, and their second-order interactions are the major factors that significantly influence the quality of the crystals. Additionally, using tungsten rather than molybdenum as a buffer layer significantly enhances the crystal quality. Fractional factorial design minimizes the number of experiments that are necessary to find the optimal growth conditions, resulting in an order of magnitude improvement in the crystal quality. We highlight that statistical design of experiment methods, which is more commonly used in product design, should be considered more broadly by those designing and optimizing materials.
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Affiliation(s)
- Jitendra K Behera
- ACTA Lab , Singapore University of Technology and Design , 8 Somapah Road , 487372 Singapore
| | - Xilin Zhou
- ACTA Lab , Singapore University of Technology and Design , 8 Somapah Road , 487372 Singapore
| | - Alok Ranjan
- Singapore University of Technology and Design , 8 Somapah Road , 487372 Singapore
| | - Robert E Simpson
- ACTA Lab , Singapore University of Technology and Design , 8 Somapah Road , 487372 Singapore
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Li Y, Zhou YX, Xu L, Lu K, Wang ZR, Duan N, Jiang L, Cheng L, Chang TC, Chang KC, Sun HJ, Xue KH, Miao XS. Realization of Functional Complete Stateful Boolean Logic in Memristive Crossbar. ACS APPLIED MATERIALS & INTERFACES 2016; 8:34559-34567. [PMID: 27998150 DOI: 10.1021/acsami.6b11465] [Citation(s) in RCA: 5] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/06/2023]
Abstract
Nonvolatile stateful logic computing in memristors is a promising paradigm with which to realize the unity of information storage and processing in the same physical location that has shown great feasibility for breaking the von Neumann bottleneck in traditional computing architecture. How to reduce the computational complexity of memristor-based logic functions is a matter of concern. Here, based on a general logic expression, we proposed a method to implement the arbitrary logic of complete 16 Boolean logic in two steps with one memristor in the crossbar architecture. A representative functional complete NAND logic is successfully experimentally demonstrated in the filamentary Ag-AgGeTe-Ta memristors to prove the validity of our method. We believe our work may promote the development of the revolutionary logic in memory architectures.
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Affiliation(s)
- Yi Li
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Ya-Xiong Zhou
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Lei Xu
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Ke Lu
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Zhuo-Rui Wang
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Nian Duan
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Lei Jiang
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Long Cheng
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Ting-Chang Chang
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Kuan-Chang Chang
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Hua-Jun Sun
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Kan-Hao Xue
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
| | - Xiang-Shui Miao
- School of Optical and Electronic Information and ‡Wuhan National Laboratory for Optoelectronics (WNLO), Huazhong University of Science and Technology (HUST) , Wuhan 430074, China
- Department of Physics and ⊥Department of Materials and Optoelectronic Science, National Sun Yat-Sen University , Kaohsiung 804, Taiwan
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