Suppressing Structural Colors of Photocatalytic Optical Coatings on Glass: The Critical Role of SiO2

Block-Copolymers Enable Direct Reduction and Structuration of Noble Metal-Based Films

Noble metal nanostructured films are of great interest for various applications including electronics, photonics, catalysis, and photocatalysis. Yet, structuring and patterning noble metals, especially those of the platinum group, is challenging by conventional nanofabrication. Herein, an approach based on solution processing to obtain metal-based films (rhodium, ruthenium (Ru) or iridium in the presence of residual organic species) with nanostructuration at the 20 nm-scale is introduced. Compared to existing approaches, the dual functionality of block-copolymers acting both as structuring and as reducing agent under inert atmosphere is exploited. A set of in situ techniques has allowed for the capturing of the carbothermal reduction mechanism occurring at the hybrid organic/inorganic interface. Differently from previous literature, a two-step reduction mechanism is unveiled with the formation of a carbonyl intermediate. From a technological point of view, the materials can be solution-processed on a large scale by dip-coating as polymers and simultaneously structured and reduced into metals without requiring expensive equipment or treatments in reducing atmosphere. Importantly, the metal-based films can be patterned directly by block-copolymer lithography or by soft-nanoimprint lithography on various substrates. As proof-of-concept of application, the authors demonstrate that nanostructured Ru films can be used as efficient catalysts for H₂ generation into microfluidic reactors.

Scalable Disordered Hyperuniform Architectures via Nanoimprint Lithography of Metal Oxides

Fabrication and scaling of disordered hyperuniform materials remain hampered by the difficulties in controlling the spontaneous phenomena leading to this novel kind of exotic arrangement of objects. Here, we demonstrate a hybrid top-down/bottom-up approach based on sol-gel dip-coating and nanoimprint lithography for the faithful reproduction of disordered hyperuniform metasurfaces in metal oxides. Nano- to microstructures made of silica and titania can be directly printed over several cm² on glass and on silicon substrates. First, we describe the polymer mold fabrication starting from a hard master obtained via spontaneous solid-state dewetting of SiGe and Ge thin layers on SiO₂. Then, we assess the effective disordered hyperuniform character of master and replica and the role of the thickness of the sol-gel layer on the metal oxide replicas and on the presence of a residual layer underneath. Finally, as a potential application, we show the antireflective character of titania structures on silicon. Our results are relevant for the realistic implementation over large scales of disordered hyperuniform nano- and microarchitectures made of metal oxides, thus opening their exploitation in the framework of wet chemical assembly.

Replacing Metals with Oxides in Metal-Assisted Chemical Etching Enables Direct Fabrication of Silicon Nanowires by Solution Processing

Metal-assisted chemical etching (MACE) has emerged as an effective method to fabricate high aspect ratio nanostructures. This method requires a catalytic mask that is generally composed of a metal. Here, we challenge the general view that the catalyst needs to be a metal by introducing oxide-assisted chemical etching (OACE). We perform etching with metal oxides such as RuO₂ and IrO₂ by transposing materials used in electrocatalysis to nanofabrication. These oxides can be solution-processed as polymers exhibiting similar capabilities of metals for MACE. Nanopatterned oxides can be obtained by direct nanoimprint lithography or block-copolymer lithography from chemical solution on a large scale. High aspect ratio silicon nanostructures were obtained at the sub-20 nm scale exclusively by cost-effective solution processing by halving the number of fabrication steps compared to MACE. In general, OACE is expected to stimulate new fundamental research on chemical etching assisted by other materials, providing new possibilities for device fabrication.

Field Test of Self-Cleaning Zr-Modified-TiO2-SiO2 Films on Glass with a Demonstration of Their Anti-Fogging Effect

The number of commercial products claiming self-cleaning properties is rising and testing of long-term activity and durability of such coatings needs to be addressed more. The time-dependent changes of different characteristics like haze, transparency, and color are essential for transparent glazing materials. Herein, we aimed to examine whether the laboratory results obtained on the Zr-modified-titania-silica (TiZr) self-cleaning materials would translate to larger-scale outdoor-exposed testing. TiZr thin films were deposited via spraying onto float glass window surfaces and exposed into three different environments for 20 months. For comparison, a commercially available active SGG BIOCLEAN^TM glass and standard float glass were simultaneously exposed in the same conditions. It was shown that the self-cleaning property of either a commercial product or TiZr-coated float glass was not considerably effective in real field test conditions, although the previous laboratory tests showed pronounced photocatalytic activity of TiZr thin films. The inclination angle; however, was shown to have a considerable effect on the self-cleaning ability of samples, as did the rain patterns during the testing period. On the other hand, the anti-fogging effect of our TiZr material was very well expressed in controlled laboratory conditions (measuring droplet formation time) as well as in the real outdoor environment.

Transparent Photocatalytic Thin Films on Flexible Polymer Substrates

Self-cleaning and/or photocatalytic films on polymer substrates have found numerous applications during the past decades. However, the common demand for high-temperature post synthesis treatment limits the application to temperature resistant substrates only. Herein, we prepared self-cleaning photocatalytic films on four thermosensitive polymeric substrates: polyvinyl chloride (PVC), polymethyl methacrylate (PMMA), and acryl coated polyester (PES) fabric (D2) with poly(vinylidene fluoride) (PVDF) containing lacquer (D1). TiO₂ was prepared via a low-temperature sol-gel process using titanium(IV) isopropoxide and zirconium(IV) butoxide as precursors with various loading levels of Zr; 0, 5, 10, and 20 mol.%, and deposited on the substrates by using a SiO₂ binder in form of thin films (ca. 200 nm thick) via dip-coating. The films were characterized by SEM, hardness test, UV-Vis, photothermal beam deflection spectroscopy, and IR spectroscopy, while photocatalytic activity was measured by the fluorescence-based method of the terephthalic acid probe and wetting by contact angle measurements. Films containing 10 mol.% of Zr showed the best compromise regarding photocatalytic activity and mechanical stability while from substrates point of view PVC performed the best, followed by PMMA, D1, and D2. The beneficial role of SiO₂ binder was not only guaranteeing excellent mechanical stability, but also to prevent the D1 polymer from deterioration; the latter was found to be labile to long-term solar-light exposure due to degradation of the top PVDF layer.

Ultralow-refractive-index optical thin films built from shape-tunable hollow silica nanomaterials

Shape-tunable hollow silica nanomaterials, including hollow silica nano-spheres and nano-tadpoles, were synthesized with a one-step soft-templating method. A possible particle growth mechanism was proposed. Films were built from these shape-tunable hollow silica nanomaterials with refractive indices as low as 1.045, which is, to the best of our knowledge, the third-lowest value ever reported so far. For the first time, the refractive indices of films were tuned by changing the morphology of building blocks. These films are intrinsically hydrophobic. Moreover, the process used to prepare these nanomaterials without the need for expensive equipment or any post-treatment is well suited for industrial production on large surfaces.