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Ahn J, Jang H, Jeong Y, Choi S, Ko J, Hwang SH, Jeong J, Jung YS, Park I. Illuminating Recent Progress in Nanotransfer Printing: Core Principles, Emerging Applications, and Future Perspectives. ADVANCED SCIENCE (WEINHEIM, BADEN-WURTTEMBERG, GERMANY) 2024; 11:e2303704. [PMID: 38032705 PMCID: PMC10767444 DOI: 10.1002/advs.202303704] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Key Words] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 06/07/2023] [Revised: 08/20/2023] [Indexed: 12/01/2023]
Abstract
As the demand for diverse nanostructures in physical/chemical devices continues to rise, the development of nanotransfer printing (nTP) technology is receiving significant attention due to its exceptional throughput and ease of use. Over the past decade, researchers have attempted to enhance the diversity of materials and substrates used in transfer processes as well as to improve the resolution, reliability, and scalability of nTP. Recent research on nTP has made continuous progress, particularly using the control of the interfacial adhesion force between the donor mold, target material, and receiver substrate, and numerous practical nTP methods with niche applications have been demonstrated. This review article offers a comprehensive analysis of the chronological advancements in nTP technology and categorizes recent strategies targeted for high-yield and versatile printing based on controlling the relative adhesion force depending on interfacial layers. In detail, the advantages and challenges of various nTP approaches are discussed based on their working mechanisms, and several promising solutions to improve morphological/material diversity are presented. Furthermore, this review provides a summary of potential applications of nanostructured devices, along with perspectives on the outlook and remaining challenges, which are expected to facilitate the continued progress of nTP technology and to inspire future innovations.
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Affiliation(s)
- Junseong Ahn
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Hanhwi Jang
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Yongrok Jeong
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
- Radioisotope Research DivisionKorea Atomic Energy Research Institute (KAERI)Daejeon34057Republic of Korea
| | - Seongsu Choi
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Jiwoo Ko
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Soon Hyoung Hwang
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Jun‐Ho Jeong
- Department of Nano Manufacturing TechnologyKorea Institute of Machinery and Materials (KIMM)Daejeon34103Republic of Korea
| | - Yeon Sik Jung
- Department of Materials Science and EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
| | - Inkyu Park
- Department of Mechanical EngineeringKorea Advanced Institute of Science and Technology (KAIST)Daejeon34141Republic of Korea
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2
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Stokes K, Clark K, Odetade D, Hardy M, Goldberg Oppenheimer P. Advances in lithographic techniques for precision nanostructure fabrication in biomedical applications. DISCOVER NANO 2023; 18:153. [PMID: 38082047 PMCID: PMC10713959 DOI: 10.1186/s11671-023-03938-x] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Figures] [Subscribe] [Scholar Register] [Received: 08/24/2023] [Accepted: 12/04/2023] [Indexed: 01/31/2024]
Abstract
Nano-fabrication techniques have demonstrated their vital importance in technological innovation. However, low-throughput, high-cost and intrinsic resolution limits pose significant restrictions, it is, therefore, paramount to continue improving existing methods as well as developing new techniques to overcome these challenges. This is particularly applicable within the area of biomedical research, which focuses on sensing, increasingly at the point-of-care, as a way to improve patient outcomes. Within this context, this review focuses on the latest advances in the main emerging patterning methods including the two-photon, stereo, electrohydrodynamic, near-field electrospinning-assisted, magneto, magnetorheological drawing, nanoimprint, capillary force, nanosphere, edge, nano transfer printing and block copolymer lithographic technologies for micro- and nanofabrication. Emerging methods enabling structural and chemical nano fabrication are categorised along with prospective chemical and physical patterning techniques. Established lithographic techniques are briefly outlined and the novel lithographic technologies are compared to these, summarising the specific advantages and shortfalls alongside the current lateral resolution limits and the amenability to mass production, evaluated in terms of process scalability and cost. Particular attention is drawn to the potential breakthrough application areas, predominantly within biomedical studies, laying the platform for the tangible paths towards the adoption of alternative developing lithographic technologies or their combination with the established patterning techniques, which depends on the needs of the end-user including, for instance, tolerance of inherent limits, fidelity and reproducibility.
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Affiliation(s)
- Kate Stokes
- Advanced Nanomaterials Structures and Applications Laboratories, School of Chemical Engineering, College of Engineering and Physical Sciences, University of Birmingham, Edgbaston, Birmingham, B15 2TT, UK
| | - Kieran Clark
- Advanced Nanomaterials Structures and Applications Laboratories, School of Chemical Engineering, College of Engineering and Physical Sciences, University of Birmingham, Edgbaston, Birmingham, B15 2TT, UK
| | - David Odetade
- Advanced Nanomaterials Structures and Applications Laboratories, School of Chemical Engineering, College of Engineering and Physical Sciences, University of Birmingham, Edgbaston, Birmingham, B15 2TT, UK
| | - Mike Hardy
- School of Biological Sciences, Institute for Global Food Security, Queen's University Belfast, Belfast, BT9 5DL, UK
- Centre for Quantum Materials and Technology, School of Mathematics and Physics, Queen's University Belfast, Belfast, BT7 1NN, UK
| | - Pola Goldberg Oppenheimer
- Advanced Nanomaterials Structures and Applications Laboratories, School of Chemical Engineering, College of Engineering and Physical Sciences, University of Birmingham, Edgbaston, Birmingham, B15 2TT, UK.
- Healthcare Technologies Institute, Institute of Translational Medicine, Mindelsohn Way, Birmingham, B15 2TH, UK.
- Cavendish Laboratory, Department of Physics, University of Cambridge, JJ Thomson Avenue, Cambridge, CB3 0HE, UK.
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3
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Kim DH, Oh JY, Yang D, Lee DW, Won J, Kim D, Choi S, Kim J, Park H, Seo D. Reformation of solution process
NiO
thin films with
UV
curable polymers for the self‐alignment of liquid crystals. POLYM ADVAN TECHNOL 2023. [DOI: 10.1002/pat.6017] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 02/25/2023]
Affiliation(s)
- Dong Hyun Kim
- IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering Yonsei University Seoul Republic of Korea
| | - Jin Young Oh
- IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering Yonsei University Seoul Republic of Korea
| | - Da‐Bin Yang
- IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering Yonsei University Seoul Republic of Korea
| | - Dong Wook Lee
- IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering Yonsei University Seoul Republic of Korea
| | - Jonghoon Won
- IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering Yonsei University Seoul Republic of Korea
| | - Dai‐Hyun Kim
- Department of Smart Electric Korea Polytechnic Incheon South Korea
| | - Se‐Hoon Choi
- Department of Smart Manufacturing Engineering Changwon National University Changwon‐si Republic of Korea
| | - Jin‐Ah Kim
- Department of Smart Manufacturing Engineering Changwon National University Changwon‐si Republic of Korea
| | - Hong‐Gyu Park
- Department of Smart Manufacturing Engineering Changwon National University Changwon‐si Republic of Korea
- Department of Electrical, Electronic, Control Engineering Changwon National University Changwon‐si Republic of Korea
| | - Dae‐Shik Seo
- IT Nano Electronic Device Laboratory, Department of Electrical and Electronic Engineering Yonsei University Seoul Republic of Korea
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4
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Rahman MA, Kim D, Arora D, Huh JY, Byun JY. Structural Colors on Al Surface via Capped Cu-Si 3N 4 Bilayer Structure. MICROMACHINES 2023; 14:mi14020471. [PMID: 36838171 PMCID: PMC9963491 DOI: 10.3390/mi14020471] [Citation(s) in RCA: 1] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Received: 01/20/2023] [Revised: 02/10/2023] [Accepted: 02/13/2023] [Indexed: 05/27/2023]
Abstract
Tunable structural colors have a multitude of applications in the beautification of mobile devices, in the decoration of artwork, and in the creation of color filters. In this paper, we describe a Metal-Insulator-Metal (MIM) design that can be used to systematically tune structural colors by altering the thickness of the top metal and intermediate insulator. Cu and Si3N4 were selected as the top metal and intermediate insulator layers, respectively, and various reflection colors were printed on Al. To protect the Cu surface from scratchiness and oxidation, a number of capping layers, including SiO2, LPSQ, PMMA, and the commercially available clear coat ProtectaClear, were applied. In addition to their ability to protect Cu from a humid environment without deteriorating color quality, ProtectaClear and LPSQ coatings have minimal angle dependency. Furthermore, a bilayer of PMMA/SiO2 can protect the Cu surface from the effects of humidity. In addition, the PMMA/SiO2 and ProtectaClear/SiO2 bilayers can also protect against corrosion on the Cu surface. The colors can be tuned by controlling the thickness of either the metal layer or intermediate insulator layer, and vivid structural colors including brown, dark orange, blue, violet, magenta, cyan, green-yellow, and yellow colors can be printed. The measured dielectric functions of Cu thin films do not provide any evidence of the plasmonic effect, and therefore, it is expected that the obtained colors are attributed to thin-film interference.
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Affiliation(s)
- M. A. Rahman
- Extreme Materials Research Center, Korea Institute of Science & Technology, 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul 02792, Republic of Korea
| | - Dongkyu Kim
- Extreme Materials Research Center, Korea Institute of Science & Technology, 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul 02792, Republic of Korea
- Department of Materials Science and Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea
| | - Deepshikha Arora
- Engineering Product Development, Singapore University of Technology and Design, 8 Somapah Road, Singapore 487372, Singapore
| | - Joo-Youl Huh
- Department of Materials Science and Engineering, Korea University, 145, Anam-ro, Seongbuk-gu, Seoul 02841, Republic of Korea
| | - Ji Young Byun
- Extreme Materials Research Center, Korea Institute of Science & Technology, 5, Hwarang-ro 14-gil, Seongbuk-gu, Seoul 02792, Republic of Korea
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5
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Yu X, Vashchenko VV, Prodanov MF, Srivastava AK. Monomolecular vertical alignment layer with room temperature processibility for flexible liquid crystal displays. J Mol Liq 2022. [DOI: 10.1016/j.molliq.2022.120535] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 11/08/2022]
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6
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Rahman MA, Kim YH, Cho SH, Lee SY, Byun JY. Realization of Structural Colors via Capped Cu-based F-P Cavity Structure. OPTICS EXPRESS 2021; 29:29466-29480. [PMID: 34615056 DOI: 10.1364/oe.435768] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.3] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 07/01/2021] [Accepted: 08/11/2021] [Indexed: 06/13/2023]
Abstract
Structural colors with tunable properties have several applications in the beautification of mobile devices, surface decoration, art and color filters. Herein, we propose an asymmetric F-P cavity design to systematically tune structural colors by changing the thickness of the top metal and intermediate insulator. In this study, Cu and Si3N4 were chosen as the top metal and intermediate insulator layers, respectively, various reflection colors being realized on the Cu surface. Various capping layers-that is, SiO2, polymethyl methacrylate (PMMA), and a commercially available clear coat named ProtectaClear-were used to protect the Cu surface from scratching and oxidation. PMMA coatings can protect Cu from corrosive environments without degradation of the color quality. The colors can be tuned by controlling the thickness of either the metal or intermediate insulator layers, and vivid structural colors-including orange, bright orange, red, purple, violet, light blue, green-yellow, and yellow-green-can be printed. The colors obtained can be attributed to thin-film interference.
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7
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Wang X, Chen J, Guo T, Shi Y. Polarization tunable color filters based on all-dielectric metasurfaces on a flexible substrate. OPTICS EXPRESS 2020; 28:21704-21712. [PMID: 32752443 DOI: 10.1364/oe.398494] [Citation(s) in RCA: 4] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Received: 05/27/2020] [Accepted: 06/25/2020] [Indexed: 06/11/2023]
Abstract
Structural color filters based on all-dielectric materials are considered to be promising alternatives to metal nanostructures due to significant advantages, such as high-quality resonance effects and low losses of Ohmic effects. We demonstrate a polarization tunable color filter based on all-dielectric metasurfaces, which is based on the arrays of asymmetric monocrystalline silicon nanoblocks on the flexible substrate. By adjusting the physical dimensions of nanoblocks, the filter can exhibit a variety of bright transmission colors. Furthermore, the designed dielectric metasurfaces are sensitive to the linear polarization direction of the incident light, thus a wide range of color images can be created by changing the polarization angles. All of the color filter including the dielectric silicon nanoblocks, the overcladding, and the flexible substrate can be delaminated from the handler substrates and the optical property is reconfigurable, which will find applications in the functional color display, polarization detection and imaging, and secured optical tag.
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Park TW, Byun M, Jung H, Lee GR, Park JH, Jang HI, Lee JW, Kwon SH, Hong S, Lee JH, Jung YS, Kim KH, Park WI. Thermally assisted nanotransfer printing with sub-20-nm resolution and 8-inch wafer scalability. SCIENCE ADVANCES 2020; 6:eabb6462. [PMID: 32832691 PMCID: PMC7439568 DOI: 10.1126/sciadv.abb6462] [Citation(s) in RCA: 23] [Impact Index Per Article: 5.8] [Reference Citation Analysis] [Abstract] [Grants] [Track Full Text] [Subscribe] [Scholar Register] [Received: 03/09/2020] [Accepted: 06/17/2020] [Indexed: 05/22/2023]
Abstract
Nanotransfer printing (nTP) has attracted considerable attention due to its good pattern resolution, process simplicity, and cost-effectiveness. However, the development of a large-area nTP process has been hampered by critical reliability issues related to the uniform replication and regular transfer printing of functional nanomaterials. Here, we present a very practical thermally assisted nanotransfer printing (T-nTP) process that can easily produce well-ordered nanostructures on an 8-inch wafer via the use of a heat-rolling press system that provides both uniform pressure and heat. We also demonstrate various complex pattern geometries, such as wave, square, nut, zigzag, and elliptical nanostructures, on diverse substrates via T-nTP. Furthermore, we demonstrate how to obtain a high-density crossbar metal-insulator-metal memristive array using a combined method of T-nTP and directed self-assembly. We expect that the state-of-the-art T-nTP process presented here combined with other emerging patterning techniques will be especially useful for the large-area nanofabrication of various devices.
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Affiliation(s)
- Tae Wan Park
- Electronic Convergence Materials Division, Korea Institute of Ceramic Engineering & Technology (KICET) 101 Soho-ro, Jinju 52851, Republic of Korea
- Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea
| | - Myunghwan Byun
- Department of Advanced Materials Engineering, Keimyung University, 1095 Dalgubeol-daero, Daegu 42601, Republic of Korea
| | - Hyunsung Jung
- Electronic Convergence Materials Division, Korea Institute of Ceramic Engineering & Technology (KICET) 101 Soho-ro, Jinju 52851, Republic of Korea
| | - Gyu Rac Lee
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
| | - Jae Hong Park
- Division of Nano-Convergence Technology, Korea National NanoFab Center (NNFC), 291 Daehak-ro, Daejeon 34141, Republic of Korea
- NanoIn-Inc, 291 Daehak-ro, Korea National NanoFab Center (NNFC), Daejeon 34141, Republic of Korea
| | - Hyun-Ik Jang
- Division of Nano-Convergence Technology, Korea National NanoFab Center (NNFC), 291 Daehak-ro, Daejeon 34141, Republic of Korea
- NanoIn-Inc, 291 Daehak-ro, Korea National NanoFab Center (NNFC), Daejeon 34141, Republic of Korea
| | - Jung Woo Lee
- School of Materials Science and Engineering, Pusan National University (PNU), Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan 46241, Republic of Korea
| | - Se Hun Kwon
- School of Materials Science and Engineering, Pusan National University (PNU), Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan 46241, Republic of Korea
| | - Seungbum Hong
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
| | - Jong-Heun Lee
- Department of Materials Science and Engineering, Korea University, Seoul 02841, Republic of Korea
| | - Yeon Sik Jung
- Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), 291 Daehak-ro, Yuseong-gu, Daejeon 34141, Republic of Korea
| | - Kwang Ho Kim
- School of Materials Science and Engineering, Pusan National University (PNU), Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan 46241, Republic of Korea
- Global Frontier R&D Center for Hybrid Interface Materials (HIM), Busandaehak-ro 63beon-gil, Geumjeong-gu, Busan 46241, Republic of Korea
| | - Woon Ik Park
- Department of Materials Science and Engineering, Pukyoung National University (PKNU), 45 Yongso-ro, Nam-gu, Busan 48513, Republic of Korea
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9
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Zhao ZJ, Hwang SH, Kang HJ, Jeon S, Bok M, Ahn S, Im D, Hahn J, Kim H, Jeong JH. Adhesive-Layer-Free and Double-Faced Nanotransfer Lithography for a Flexible Large-Area MetaSurface Hologram. ACS APPLIED MATERIALS & INTERFACES 2020; 12:1737-1745. [PMID: 31823599 DOI: 10.1021/acsami.9b14345] [Citation(s) in RCA: 1] [Impact Index Per Article: 0.3] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
Herein, we develop an adhesive-free double-faced nanotransfer lithography (ADNT) technique based on the surface deformation of flexible substrates under the conditions of temperature and pressure control and thus address the challenge of realizing the mass production of large-area nanodevices in the fields of optics, metasurfaces, and holograms. During ADNT, which is conducted on a flexible polymer substrate above its glass transition temperature in the absence of adhesive materials and chemical bonding agents, nanostructures from the polymer stamp are attached to the deformed polymer substrate. Various silicon masters are employed to prove our method applicable to arbitrary nanopatterns, and diverse Ag and Au nanostructures are deposited on polymer molds to demonstrate the wide scope of useable metals. Finally, ADNT is used to (i) produce a flexible large-area hologram on the defect-free poly(methyl methacrylate) (PMMA) film and (ii) fabricate a metasurface hologram and a color filter on the front and back surfaces of the PMMA film, respectively, to realize dual functionality. Thus, it is concluded that the use of ADNT can decrease the fabrication time and cost of high-density nanodevices and facilitate their commercialization.
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Affiliation(s)
- Zhi-Jun Zhao
- Nano-Convergence Mechanical Systems Research Division , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34103 , South Korea
| | - Soon Hyoung Hwang
- Nano-Convergence Mechanical Systems Research Division , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34103 , South Korea
| | - Hyeok-Joong Kang
- Nano-Convergence Mechanical Systems Research Division , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34103 , South Korea
| | - Sohee Jeon
- Nano-Convergence Mechanical Systems Research Division , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34103 , South Korea
| | - Moonjeong Bok
- Nano-Convergence Mechanical Systems Research Division , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34103 , South Korea
| | - Sunggyun Ahn
- School of Electronics Engineering , Kyungpook National University , Daegu 41566 , South Korea
| | - DaJeong Im
- Department of Electronics and Information Engineering , Korea University , Sejong 30019 , South Korea
| | - Joonku Hahn
- School of Electronics Engineering , Kyungpook National University , Daegu 41566 , South Korea
| | - Hwi Kim
- Department of Electronics and Information Engineering , Korea University , Sejong 30019 , South Korea
| | - Jun-Ho Jeong
- Nano-Convergence Mechanical Systems Research Division , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34103 , South Korea
- Department of Nano Mechatronics , University of Science and Technology , 217, Gajeongbuk-ro, Yuseong-gu , Daejeon 34103 , South Korea
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10
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Zhao ZJ, Hwang S, Bok M, Kang H, Jeon S, Park SH, Jeong JH. Nanopattern-Embedded Micropillar Structures for Security Identification. ACS APPLIED MATERIALS & INTERFACES 2019; 11:30401-30410. [PMID: 31353886 DOI: 10.1021/acsami.9b07308] [Citation(s) in RCA: 8] [Impact Index Per Article: 1.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/10/2023]
Abstract
A novel method was developed for fabricating nanopatterns embedded on micropillar-structured surfaces using nanowelding technology for security identification. Commonly used substrates, that is, polyethylene films, glass wafers, Si wafers, and curved surfaces, were employed and their characteristics were evaluated. Cr was deposited onto the selected substrate to strengthen the adhesion force, and an adhesive layer of ultra-thin metal was deposited on top of the Cr layer. Lastly, nanopatterns were embedded on the substrates by nanowelding. The morphologies, cross sections, and three-dimensional (3D) images of the fabricated nanostructures were evaluated, and their crystalline structures and compositions were analyzed. Using the same method, nanopatterns embedded on micropillar-structured surfaces were fabricated for the first time as security patterns to improve security identification. The fabricated security patterns were characterized in three stages. First, micropillar structures and structural color were simply observed via optical microscopy to achieve a preliminary judgment. The appearance of structural color was due to the nanostructures fabricated on the micropillar surface. Next, the designed nanopatterns on the micropillar-structured surfaces were observed by scanning electron microscopy. Lastly, the changes in the spectral peaks were precisely observed using a spectrometer to achieve an enhanced security pattern. The fabricated security patterns can be suitable for valuable products, such as branded wines, watches, and bags. In addition, the proposed method offers a simple approach for transferring metal nanopatterns to common substrates. Moreover, the fabricated security patterns can have potential applications in semiconductor electrodes, transparent electrodes, and security identification codes.
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Affiliation(s)
- Zhi-Jun Zhao
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , Daejeon 305-343 , South Korea
| | - SoonHyoung Hwang
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , Daejeon 305-343 , South Korea
| | - Moonjeong Bok
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , Daejeon 305-343 , South Korea
| | - Hyeokjung Kang
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , Daejeon 305-343 , South Korea
| | - Sohee Jeon
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , Daejeon 305-343 , South Korea
| | - Sang-Hu Park
- School of Mechanical Engineering , Pusan National University , Busandaehak-ro 63beon-gil , Geumjeong-gu, Busan 609-735 , Republic of Korea
| | - Jun-Ho Jeong
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , Daejeon 305-343 , South Korea
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11
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Hwang SH, Zhao ZJ, Jeon S, Kang H, Ahn J, Jeong JH. Repeatable and metal-independent nanotransfer printing based on metal oxidation for plasmonic color filters. NANOSCALE 2019; 11:11128-11137. [PMID: 31042252 DOI: 10.1039/c9nr00176j] [Citation(s) in RCA: 16] [Impact Index Per Article: 3.2] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
Many recently developed nanotransfer printing techniques have received much attention because of their simplicity and low cost. In addition, such techniques are suitable for fabricating nano/microscale sensors, optical elements, and electrical devices. However, conventional nanotransfer printing methods are time-consuming, cannot be easily used over large areas or with several different materials, and are not suitable for repeatedly transferring various materials onto the same substrate or a curved surface. Herein, a new nanotransfer printing method is introduced based on the oxidation of various metals and the formation of covalent bonds between spin- and spray-coatable adhesives and the chosen metal at low temperatures. These strong covalent bonds allow the fast transfer of the deposited materials from a polymer stamp without additional processing. A major advantage of this process is that it is metal-independent; nanowires of various metals are successfully transferred from the polymer stamp because strong covalent bonds form instantaneously between the metal and an adhesive-coated substrate. Moreover, this nanotransfer process can be used repeatedly to fabricate large-scale color filters from smaller areas of nanowires, regardless of the metal type and nanostructure orientation. Furthermore, plasmonic color filters composed of nanohole arrays can be obtained on both flat and curved surfaces.
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Affiliation(s)
- Soon Hyoung Hwang
- Nano-Convergence Mechanical Systems Research Division, Korea Institute of Machinery and Materials, Daejeon 34103, South Korea.
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12
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Khan AU, Guo Y, Chen X, Liu G. Spectral-Selective Plasmonic Polymer Nanocomposites Across the Visible and Near-Infrared. ACS NANO 2019; 13:4255-4266. [PMID: 30908010 DOI: 10.1021/acsnano.8b09386] [Citation(s) in RCA: 7] [Impact Index Per Article: 1.4] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
State-of-the-art commercial light-reflecting glass is coated with a metalized film to decrease the transmittance of electromagnetic waves. In addition to the cost of the metalized film, one major limitation of such light-reflecting glass is the lack of spectral selectivity over the entire visible and near-infrared (NIR) spectrum. To address this challenge, we herein effectively harness the transmittance, reflectance, and filtration of any wavelength across the visible and NIR, by judiciously controlling the planar orientation of two-dimensional plasmonic silver nanoplates (AgNPs) in polymer nanocomposites. In contrast to conventional bulk polymer nanocomposites where plasmonic nanoparticles are randomly mixed within a polymer matrix, our thin-film polymer nanocomposites comprise a single layer, or any desired number of multiple layers, of planarly oriented AgNPs separated by tunable spacings. This design employs a minimal amount of metal and yet efficiently manages light across the visible and NIR. The thin-film plasmonic polymer nanocomposites are expected to have a significant impact on spectral-selective light modulation, sensing, optics, optoelectronics, and photonics.
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13
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Prasad A, Choi J, Jia Z, Park S, Gartia MR. Nanohole array plasmonic biosensors: Emerging point-of-care applications. Biosens Bioelectron 2019; 130:185-203. [PMID: 30738247 PMCID: PMC6475599 DOI: 10.1016/j.bios.2019.01.037] [Citation(s) in RCA: 38] [Impact Index Per Article: 7.6] [Reference Citation Analysis] [Abstract] [Key Words] [MESH Headings] [Grants] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Received: 10/29/2018] [Revised: 01/03/2019] [Accepted: 01/18/2019] [Indexed: 01/18/2023]
Abstract
Point-of-care (POC) applications have expanded hugely in recent years and is likely to continue, with an aim to deliver cheap, portable, and reliable devices to meet the demands of healthcare industry. POC devices are designed, prototyped, and assembled using numerous strategies but the key essential features that biosensing devices require are: (1) sensitivity, (2) selectivity, (3) specificity, (4) repeatability, and (5) good limit of detection. Overall the fabrication and commercialization of the nanohole array (NHA) setup to the outside world still remains a challenge. Here, we review the various methods of NHA fabrication, the design criteria, the geometrical features, the effects of surface plasmon resonance (SPR) on sensing as well as current state-of-the-art of existing NHA sensors. This review also provides easy-to-understand examples of NHA-based POC biosensing applications, its current status, challenges, and future prospects.
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Affiliation(s)
- Alisha Prasad
- Department of Mechanical and Industrial Engineering, Louisiana State University, Baton Rouge, LA 70803, USA
| | - Junseo Choi
- Department of Mechanical and Industrial Engineering, Louisiana State University, Baton Rouge, LA 70803, USA; NIH Center for BioModular Multiscale Systems for Precision Medicine, Louisiana State University, Baton Rouge, LA 70803, USA
| | - Zheng Jia
- Department of Mechanical and Industrial Engineering, Louisiana State University, Baton Rouge, LA 70803, USA; NIH Center for BioModular Multiscale Systems for Precision Medicine, Louisiana State University, Baton Rouge, LA 70803, USA
| | - Sunggook Park
- Department of Mechanical and Industrial Engineering, Louisiana State University, Baton Rouge, LA 70803, USA; NIH Center for BioModular Multiscale Systems for Precision Medicine, Louisiana State University, Baton Rouge, LA 70803, USA.
| | - Manas Ranjan Gartia
- Department of Mechanical and Industrial Engineering, Louisiana State University, Baton Rouge, LA 70803, USA.
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14
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Zhao ZJ, Gao M, Hwang S, Jeon S, Park I, Park SH, Jeong JH. Heterogeneous Nanostructures Fabricated via Binding Energy-Controlled Nanowelding. ACS APPLIED MATERIALS & INTERFACES 2019; 11:7261-7271. [PMID: 30672280 DOI: 10.1021/acsami.8b18405] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/09/2023]
Abstract
A novel concept for fabricating heterogeneous nanostructures based on different melting temperatures is developed. Au-Ag composite cross-structures are fabricated by nanowelding technologies. During the fabrication of Au-Ag composite cross-structures, Ag nanowires transform into ordered particles decorating the Au nanowire surfaces with an increase in the welding temperature because of the different melting temperatures of Au and Ag. To compare and explain the melting temperatures, the thicknesses of Au and Ag nanowires as parameters are analyzed. Scanning electron microscopy and focused ion beam imaging are used to observe the morphologies and cross sections of the fabricated samples. The evolution of 3D nanostructures is observed by atomic force microscopy, whereas the compositions and binding energies of the nanostructures are determined by X-ray diffraction and X-ray photoelectron spectroscopies. In addition, the atomic structures are analyzed by transmission electron microscopy, and the optical properties of the fabricated nanostructures are evaluated by spectrometry. Furthermore, color filter electrodes are fabricated, and their polarization properties are evaluated by sheet resistance measurements and observing the color and brightness of light-emitting diodes. The proposed method is suitable for application in various fields such as biosensors, optics, and medicine.
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Affiliation(s)
- Zhi-Jun Zhao
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34113 , South Korea
| | - Min Gao
- Department of Mechanical Engineering , Korea Advanced Institute of Technology , Deajeon 34141 , Korea
| | - SoonHyoung Hwang
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34113 , South Korea
| | - Sohee Jeon
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34113 , South Korea
| | - Inkyu Park
- Department of Mechanical Engineering , Korea Advanced Institute of Technology , Deajeon 34141 , Korea
| | - Sang-Hu Park
- School of Mechanical Engineering , Pusan National University , Busandaehak-ro 63 beon-gil , Geumjeong-gu, Busan 609-735 , Republic of Korea
| | - Jun-Ho Jeong
- Department of Nano Manufacturing Technology , Korea Institute of Machinery and Materials , 156, Gajeongbuk-ro , Yuseong-gu, Daejeon 34113 , South Korea
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15
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Tran H, Bergman HM, Parenti KR, van der Zande AM, Dean CR, Campos LM. Hierarchical patterns with sub-20 nm pattern fidelity via block copolymer self-assembly and soft nanotransfer printing. Polym Chem 2019. [DOI: 10.1039/c9py00335e] [Citation(s) in RCA: 3] [Impact Index Per Article: 0.6] [Reference Citation Analysis] [Abstract] [Track Full Text] [Journal Information] [Subscribe] [Scholar Register] [Indexed: 12/30/2022]
Abstract
We describe the development of a technique to transfer micrometer patterns of organic thin films with sub-50 nm edge resolution and sub-20 nm pattern fidelity.
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Affiliation(s)
- Helen Tran
- Department of Chemistry
- Columbia University
- New York
- USA
| | | | | | | | - Cory R. Dean
- Department of Physics
- Columbia University
- New York
- USA
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16
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Oh H, Lee J, Seo M, Baek IU, Byun JY, Lee M. Laser-Induced Dewetting of Metal Thin Films for Template-Free Plasmonic Color Printing. ACS APPLIED MATERIALS & INTERFACES 2018; 10:38368-38375. [PMID: 30360063 DOI: 10.1021/acsami.8b13675] [Citation(s) in RCA: 4] [Impact Index Per Article: 0.7] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Plasmonic color laser printing has several advantages over pigment-based technology, including the absence of ink and toner and the production of nonfading colors. However, the current printing method requires a template that should be prepared via nanofabrication processes, making it impractical for large-area color images. In this study, we show that laser-induced dewetting of metal thin films by a nanosecond pulsed laser can be effectively utilized for plasmonic color printing. Ag, Au, and their complex films deposited on a glass substrate were dewetted into different surface structures such as droplets, rods, and ripples, depending on the incident laser energy. The resulting morphological evolutions could be explained by Rayleigh and capillary instabilities. For a bimetallic film comprising Ag nanowires coated on a Au layer, a few different plasmonic colors were generated from a single sample simply by changing the laser fluence. This provides a possible method for implementing plasmonic color laser printing without using a prepatterned template.
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Affiliation(s)
- Harim Oh
- Department of Materials Science and Engineering , Yonsei University , Seoul 120-749 , Korea
| | - Jeeyoung Lee
- Department of Materials Science and Engineering , Yonsei University , Seoul 120-749 , Korea
| | - Minseok Seo
- Department of Materials Science and Engineering , Yonsei University , Seoul 120-749 , Korea
| | - In Uk Baek
- Materials Architecture Research Center , Korea Institute of Science and Technology , Seoul 02792 , Korea
| | - Ji Young Byun
- Materials Architecture Research Center , Korea Institute of Science and Technology , Seoul 02792 , Korea
| | - Myeongkyu Lee
- Department of Materials Science and Engineering , Yonsei University , Seoul 120-749 , Korea
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17
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Hwang SH, Kim MJ, Jeon S, Shin B, Jeong JH. Plasmonic color filters fabricated via oxide-based nanotransfer printing. NANOTECHNOLOGY 2018; 29:415301. [PMID: 30010087 DOI: 10.1088/1361-6528/aad394] [Citation(s) in RCA: 0] [Impact Index Per Article: 0] [Reference Citation Analysis] [Abstract] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 06/08/2023]
Abstract
Plasmonic filters have recently become a topic of significant interest because they are suitable for a wide range of applications. However, effective fabrication of plasmonic filters remains a challenge. In this paper, we demonstrate a simple method for fabricating plasmonic color filters based on nanotransfer printing (nTP) , using SiO2 as a hard mask for Al etching. nTP was performed on a 100 nm Al layer deposited on a glass wafer substrate with a 10 nm Al layer and a 20 nm SiO2 layer with a nanohole pattern. The 10 nm Al layer and 20 nm SiO2 layers were previously transferred from a polymer stamp prepared to create patterns of subwavelength-sized holes. The plasmonic filters were ultimately fabricated using the SiO2 layer as a hard mask to selectively etch the Al layer. The optical properties of the fabricated plasmonic filters were evaluated using experimental and simulation tools. In addition, we analyzed the results of nTP on the Al and SiO2 films by varying the temperature, pressure, and SiO2-film thickness. We believe that this technique is a promising method for fabricating nanostructures and for widening the scope of practical application of plasmonics because of its high efficiency and cost-effectiveness.
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Affiliation(s)
- Soon-Hyoung Hwang
- Nanomechanical System Research Center, Korea Institute of Machinery and Materials, Daejeon, Republic of Korea
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18
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Wang X, Kuchmizhak A, Storozhenko D, Makarov S, Juodkazis S. Single-Step Laser Plasmonic Coloration of Metal Films. ACS APPLIED MATERIALS & INTERFACES 2018; 10:1422-1427. [PMID: 29250954 DOI: 10.1021/acsami.7b16339] [Citation(s) in RCA: 6] [Impact Index Per Article: 1.0] [Reference Citation Analysis] [Abstract] [Key Words] [Track Full Text] [Subscribe] [Scholar Register] [Indexed: 05/15/2023]
Abstract
Utilization of structural colors produced by nanosized optical antennas is expected to revolutionize the current display technologies based on an inkjet or a pigmentation-based color printing. Meanwhile, the versatile color-mapping strategy combining the fast single-step single-substrate fabrication cycle with low-cost scalable operation is still missing. We propose lithography-free pure optical approach based on a direct local ablative reshaping of the gold film with nanojoule (nJ)-energy femtosecond laser pulses. Plasmon-color printing at a resolution up to 2.5 × 104 dots per inch satisfying the current visualization demands and data storage capacity is achieved. By controlling only the applied pulse energy, wide gamut of colors in scattering regime was reproduced via tuning the size of the printed nanovoids, which have a polarization- and shape-dependent localized plasmon-mediated scattering. Additionally, brightness of a single pixel was gradually adjusted via varying of the spacing between the printed nanovoids. The presented experimental demonstration opens a new direction toward plasmon-color printing for various applications where durability is required: low-cost cryptography, security tagging, and ultracompact optical data storage.
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Affiliation(s)
- Xuewen Wang
- Swinburne University of Technology , John Street, Hawthorn, VIC 3122, Australia
| | - Aleksandr Kuchmizhak
- School of Natural Sciences, Far Eastern Federal University (FEFU) , 8 Sukhanova Street, Vladivostok 690041, Russia
- Institute of Automation and Control Processes (IACP), Far Eastern Branch of Russian Academy of Science (FEB RAS) , 5 Radio Street, Vladivostok 690041, Russia
| | - Dmitry Storozhenko
- School of Natural Sciences, Far Eastern Federal University (FEFU) , 8 Sukhanova Street, Vladivostok 690041, Russia
- Institute of Automation and Control Processes (IACP), Far Eastern Branch of Russian Academy of Science (FEB RAS) , 5 Radio Street, Vladivostok 690041, Russia
| | - Sergey Makarov
- ITMO University , Kronverkskiy Prospect 49, St. Petersburg 197101, Russia
| | - Saulius Juodkazis
- Swinburne University of Technology , John Street, Hawthorn, VIC 3122, Australia
- Melbourne Centre for Nanofabrication, ANFF , 151 Wellington Road, Clayton, VIC 3168, Australia
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