Simple Hydrogen Plasma Doping Process of Amorphous Indium Gallium Zinc Oxide-Based Phototransistors for Visible Light Detection

Unlocking Neuromorphic Vision: Advancements in IGZO-Based Optoelectronic Memristors with Visible Range Sensitivity

Optoelectronic memristors based on amorphous oxide semiconductors (AOSs) are promising devices for the development of spiking neural network (SNN) hardware in neuromorphic vision sensors. In such devices, the conductance state can be controlled by both optical and electrical stimuli, while the typical persistent photoconductivity (PPC) of AOS materials can be used to emulate synaptic functions. However, due to the large band gap of these materials, sensitivity to visible light (red/green/blue) is difficult to accomplish, which hinders applications requiring color discrimination. In this work, we report a 4 μm2 hydrogen-doped (H-doped) indium-gallium-zinc oxide (IGZO) optoelectronic memristor that emulates all of the important rules of SNNs such as short- to long-term memory transition (STM-LTM), paired-pulse facilitation (PPF), spike-time-dependent plasticity (STDP), and learning and forgetting capabilities. By the incorporation of hydrogen gas in the sputtering deposition of IGZO, visible sensitivity was achieved for green and blue wavelengths. Additionally, extremely high light/dark ratios of 179, 93, and 12 are demonstrated for wavelengths of 365, 405, and 505 nm, respectively, due to hydrogen-induced subgap states and device miniaturization. Therefore, the proposed device shows remarkable potential for integration with the pixel circuits of IGZO-based displays with extreme resolution for a true intelligent self-processing display.

Influence of NF3 Plasma-Treated HfO2 Gate Insulator Surface on Tin Oxide Thin-Film Transistors

We studied the impact of NF3 plasma treatment on the HfO2 gate insulator of amorphous tin oxide (a-SnOx) thin-film transistors (TFTs). The plasma treatment was for 0, 10, or 30 s. The HfO2 insulator demonstrated a slightly higher breakdown voltage, whereas the capacitance value remained almost constant (~150 nF/cm2). The linear mobility slightly increased from ~30 to ~35 cm2/Vs when the treatment time increased from 0 to 10 s, whereas a 30 s-treated TFT demonstrated a decreased mobility of ~15 cm2/Vs. The subthreshold swing and the threshold voltage remained in the 100-120 mV/dec. range and near 0 V, respectively. The hysteresis dramatically decreased from ~0.5 V to 0 V when a 10 s treatment was applied, and the 10 s-treated TFT demonstrated the best stability under high current stress (HCS) of 100 μA. The analysis of the tin oxide thin film crystallinity and oxygen environment demonstrated that the a-SnOx remained amorphous, whereas more metal-oxygen bonds were formed with a 10 s NF3 plasma treatment. We also demonstrate that the density of states (DOS) significantly decreased in the 10 s-treated TFT compared to the other conditions. The stability under HCS was attributed to the HfO2/a-SnOx interface quality.

Multifunctional Crystalline InGaSnO Phototransistor Exhibiting Photosensing and Photosynaptic Behavior Using Oxygen Vacancy Engineering

A multifunctional optoelectronic device implementing photodetector, photosynapse, and photomemory is of increasing attention for neuromorphic system. This enables multiple devices to be replaced with a single device, which simplifies the structure of complex, highly integrated electronics. Here, a multifunctional c-axis-aligned crystalline indium gallium tin oxide thin-film transistor (TFT) optoelectronic device is demonstrated. The photodetecting and photosynaptic behaviors could be demonstrated by tuning of gate pulse. The device shows a high responsivity of 1.1 × 106  A W-1 to blue light (467 nm) and cutoff frequency (f-3dB ) of 2400 Hz exhibiting high frequency switching using a gate reset pulse. It is possible to implement photosynaptic behavior using persistent photoconductivity effect by applying a gate bias to make the TFT depletion mode. When potentiation and depression of synaptic weight are implemented with light pulse and gate voltage pulse, respectively, 64-state potentiation-depression curves are demonstrated with excellent nonlinearity of 1.13 and 2.03, respectively. When an artificial neural network is constructed with this device for the Modified National Institute of Standards and Technology training pattern recognition simulation, it shows a high pattern recognition accuracy of 90.4%.

New Approach to Low-Power-Consumption, High-Performance Photodetectors Enabled by Nanowire Source-Gated Transistors

Power consumption makes next-generation large-scale photodetection challenging. In this work, the source-gated transistor (SGT) is adopted first as a photodetector, demonstrating the expected low power consumption and high photodetection performance. The SGT is constructed by the functional sulfur-rich shelled GeS nanowire (NW) and low-function metal, displaying a low saturated voltage of 0.61 V ± 0.29 V and an extremely low power consumption of 7.06 pW. When the as-constructed NW SGT is used as a photodetector, the maximum value of the power consumption is as low as 11.96 nW, which is far below that of the reported phototransistors working in the saturated region. Furthermore, benefiting from the adopted SGT device, the photodetector shows a high photovoltage of 6.6 × 10^-1 V, a responsivity of 7.86 × 10¹² V W^-1, and a detectivity of 5.87 × 10¹³ Jones. Obviously, the low power consumption and excellent responsivity and detectivity enabled by NW SGT promise a new approach to next-generation, high-performance photodetection technology.

Solution-processed transparent p-type orthorhombic K doped SnO films and their application in a phototransistor

The exploitation of p-type oxide semiconductors with excellent optoelectrical properties as well as a simple preparation process is still challenging owing to the difficulty in producing hole carriers which results from strong hole localization in p-type oxide semiconductors. In this work, we succeeded in using ethylene glycol as a reductant to prepare orthorhombic structure SnO films using a sol-gel method and through K doping the optical and electrical properties of the films were improved. When the orthorhombic K doped SnO (K-SnO) films were applied in a phototransistor, it presented ultra-broadband photosensing from the ultraviolet to infrared region (300-1000 nm), demonstrating a photoresponsivity of 349 A W^-1 and a detectivity of 5.45 × 10¹² Jones at 900 nm under a light intensity of 0.00471 mW cm^-2. In particular, infrared photosensing was for the first time reported in the SnO based phototransistors. This work not only provides a simple method to fabricate high-performance and low-cost p-type K-SnO films and phototransistors, but may also suggest a new way to improve the p-type characteristics of other oxide semiconductors and devices.

Probing the Efficacy of Large-Scale Nonporous IGZO for Visible-to-NIR Detection Capability: An Approach toward High-Performance Image Sensor Circuitry

The technological ability to detect a wide spectrum range of illuminated visible-to-NIR is substantially improved for an amorphous metal oxide semiconductor, indium gallium zinc oxide (IGZO), without employing an additional photoabsorber. The fundamentally tuned morphology via structural engineering results in the creation of nanopores throughout the entire thickness of ∼30 nm. See-through nanopores have edge functionalization with vacancies, which leads to a large density of substates near the conduction band minima and valence band maxima. The presence of nanoring edges with a high concentration of vacancies is investigated using chemical composition analysis. The process of creating a nonporous morphology is sophisticated and is demonstrated using a wafer-scale phototransistor array. The performance of the phototransistors is assessed in terms of photosensitivity (S) and photoresponsivity (R); both are of high magnitudes (S = 8.6 × 10⁴ at λ_ex = 638 nm and P_inc = 512 mW cm^2-; R = 120 A W^1- at P_inc = 2 mW cm^2- for the same λ_ex). Additionally, the 7 × 5 array of 35 phototransistors is effective in sensing and reproducing the input image by responding to selectively illuminated pixels.

A Review of Phototransistors Using Metal Oxide Semiconductors: Research Progress and Future Directions

Metal oxide thin-film transistors have been continuously researched and mass-produced in the display industry. However, their phototransistors are still in their infancy. In particular, utilizing metal oxide semiconductors as phototransistors is difficult because of the limited light absorption wavelength range and persistent photocurrent (PPC) phenomenon. Numerous studies have attempted to improve the detectable light wavelength range and the PPC phenomenon. Here, recent studies on metal oxide phototransistors are reviewed, which have improved the range of light wavelengths and the PPC phenomenon by introducing an absorption layer of oxide or non-oxide hybrid structure. The materials of the absorption layer applied to absorb long-wavelength light are classified into oxides, chalcogenides, organic materials, perovskites, and nanodots. Finally, next-generation convergence studies combined with other research fields are introduced and future research directions are detailed.

Neuromorphic Active Pixel Image Sensor Array for Visual Memory

Neuromorphic engineering, a methodology for emulating synaptic functions or neural systems, has attracted tremendous attention for achieving next-generation artificial intelligence technologies in the field of electronics and photonics. However, to emulate human visual memory, an active pixel sensor array for neuromorphic photonics has yet to be demonstrated, even though it can implement an artificial neuron array in hardware because individual pixels can act as artificial neurons. Here, we present a neuromorphic active pixel image sensor array (NAPISA) chip based on an amorphous oxide semiconductor heterostructure, emulating the human visual memory. In the 8 × 8 NAPISA chip, each pixel with a select transistor and a neuromorphic phototransistor is based on a solution-processed indium zinc oxide back channel layer and sputtered indium gallium zinc oxide front channel layer. These materials are used as a triggering layer for persistent photoconductivity and a high-performance channel layer with outstanding uniformity. The phototransistors in the pixels exhibit both photonic potentiation and depression characteristics by a constant negative and positive gate bias due to charge trapping/detrapping. The visual memory and forgetting behaviors of the NAPISA can be successfully demonstrated by using the pulsed light stencil method without any software or simulation. This study provides valuable information to other neuromorphic devices and systems for next-generation artificial intelligence technologies.

Novel Method for Fabricating Visible-Light Phototransistors Based on a Homojunction-Porous IGZO Thin Film Using Mechano-Chemical Treatment

A homojunction-structured oxide phototransistor based on a mechano-chemically treated indium-gallium-zinc oxide (IGZO) absorption layer is reported. Through this novel and facile mechano-chemical treatment, mechanical removal of the cellophane adhesive tape induces reactive radicals and organic compounds on the sputtered IGZO film surface. Surface modification, following the mechano-chemical treatment, caused porous sites in the solution-processed IGZO film, which can give rise to a homojunction-porous IGZO (HPI) layer and generate sub-gap states from oxygen-related defects. These intentionally generated sub-gap states played a key role in photoelectron generation under illumination with relatively long-wavelength visible light despite the wide band gap of IGZO (>3.0 eV). Compared with conventional IGZO phototransistors, our HPI phototransistor displayed outstanding optoelectronic characteristics and sensitivity; we measured a threshold voltage (V_th) shift from 3.64 to -6.27 V and an on/off current ratio shift from 4.21 × 10¹⁰ to 4.92 × 10² under illumination with a 532 nm green light of 10 mW/mm² intensity and calculated a photosensitivity of 1.16 × 10⁸. The remarkable optoelectronic characteristics and high optical transparency suggest optical sensor applications.

Hydrogen Barriers Based on Chemical Trapping Using Chemically Modulated Al2O3 Grown by Atomic Layer Deposition for InGaZnO Thin-Film Transistors

In this study, the excellent hydrogen barrier properties of the atomic-layer-deposition-grown Al₂O₃ (ALD Al₂O₃) are first reported for improving the stability of amorphous indium gallium zinc oxide (a-IGZO) thin-film transistors (TFTs). Chemical species in Al₂O₃ were artificially modulated during the ALD process using different oxidants, such as H₂O and O₃ (H₂O-Al₂O₃ and O₃-Al₂O₃, respectively). When hydrogen was incorporated into the H₂O-Al₂O₃-passivated TFT, a large negative shift in V_th (ca. -12 V) was observed. In contrast, when hydrogen was incorporated into the O₃-Al₂O₃-passivated TFT, there was a negligible shift in V_th (ca. -0.66 V), which indicates that the O₃-Al₂O₃ has a remarkable hydrogen barrier property. We presented a mechanism for trapping hydrogen in a O₃-Al₂O₃ via various chemical and electrical analyses and revealed that hydrogen molecules were trapped by C-O bonds in the O₃-Al₂O₃, preventing the inflow of hydrogen to the a-IGZO. Additionally, to minimize the deterioration of the pristine device that occurs after a barrier deposition, a bi-layered hydrogen barrier by stacking H₂O- and O₃-Al₂O₃ is adopted. Such a barrier can provide ultrastable performance without degradation. Therefore, we envisioned that the excellent hydrogen barrier suggested in this paper can provide the possibility of improving the stability of devices in various fields by effectively blocking hydrogen inflows.

A visible-light phototransistor based on the heterostructure of ZnO and TiO2 with trap-assisted photocurrent generation

Visible-light phototransistors have been fabricated based on the heterojunction of zinc oxide (ZnO) and titanium oxide (TiO₂). A thin layer of TiO₂ was deposited onto the spin-coated ZnO film via atomic layer deposition (ALD). The electrical characteristics of the TiO₂ layer were optimized by controlling the purge time of titanium isopropoxide (TTIP). The optimized TiO₂ layer could absorb the visible-light from the sub-gap states near the conduction band of TiO₂, which was confirmed via photoelectron spectroscopy measurements. Therefore, the heterostructure of TiO₂/ZnO can absorb and generate photocurrent under visible light illumination. The oxygen-related-states were investigated via X-ray photoelectron spectroscopy (XPS), and the interfacial band structure between TiO₂ and ZnO was evaluated via ultraviolet photoelectron spectroscopy (UPS). Oxygen-related states and subgap-states were observed, which could be used to generate photocurrent by absorbing visible light, even with TiO₂ and ZnO having a wide bandgap. The optimized TiO₂/ZnO visible-light phototransistor showed a photoresponsivity of 99.3 A W⁻¹ and photosensitivity of 1.5 × 10⁵ under the illumination of 520 nm wavelength light. This study provides a useful way to fabricate a visible-light phototransistor based on the heterostructure of wide bandgap oxide semiconductors.

Visible-light phototransistors have been fabricated based on the heterojunction of zinc oxide (ZnO) and titanium oxide (TiO₂).

Precise Turn-On Voltage Control of MIOSM Thin-Film Diodes with Amorphous Indium-Gallium-Zinc Oxide

Recently, metal-insulator-oxide semiconductor-metal (MIOSM) thin-film diodes (TFDs) have received attention as next-generation diodes due to their high rectification ratio and broad option on the operating voltage range. Nevertheless, precise turn-on voltage control of the MIOSM TFDs has been required for circuit design convenience. Here, we present a simple and accurate method of controlling the turn-on voltage of MIOSM TFDs. Studies on current-voltage characteristics reveal that controlling carrier injection into trap states in an insulator by oxygen vacancy variation of the oxide semiconductor plays a key role in the turn-on voltage shift of MIOSM TFDs. Moreover, by controlling the trap states in the insulator, the finely tuned turn-on voltages of the MIOSM TFDs are demonstrated for both low-voltage- and high-voltage-driving diodes. MIOSM TFDs with adjustable turn-on voltage, which can be built more efficiently and accurately, are expected to make oxide-based circuit designs more precise and straightforward.

Switching Enhancement via a Back-Channel Phase-Controlling Layer for p-Type Copper Oxide Thin-Film Transistors

P-type copper oxide (Cu_xO) thin-film transistors (TFTs) with enhanced switching characteristics were fabricated by introducing a sputter-processed capping layer capable of controlling the back-channel phase (labeled as phase-controlling layer, PCL). By optimizing the processing conditions (the deposition power and postdeposition annealing parameters), the switching characteristics of the TFTs achieved a subthreshold swing of 0.11 V dec^-1, an on/off current ratio (I_on/I_off) of 2.81 × 10⁸, and a field-effect mobility (μ_FET) of 0.75 cm² V^-1 s^-1, a considerable enhancement in performance compared to that of Cu_xO TFTs without the PCL. Through optical/electrical analyses and technology computer-aided design simulations, we determined that the performance improvements were because of the Cu_xO back-channel phase reconstruction through PCL deposition and subsequent annealing. The two factors that occurred during the process, sputtering damage and heat treatment, played key roles in creating the phase reconstruction by inducing a local phase transition that sharply reduced the off-current via controlling back-channel hole conduction. As a sample application, we fabricated a complementary metal oxide semiconductor inverter based on our optimized Cu_xO TFT and an InGaZnO TFT that demonstrated a large inverter voltage gain of >14. The proposed approach opens up advancements in low-power circuit design by expanding the utilization range of oxide TFTs.

High Photosensitive Indium-Gallium-Zinc Oxide Thin-Film Phototransistor with a Selenium Capping Layer for Visible-Light Detection

Visible light can be detected using an indium-gallium-zinc oxide (IGZO)-based phototransistor, with a selenium capping layer (SCL) that functions as a visible light absorption layer. Selenium (Se) exhibits photoconductive properties as its conductivity increases with illumination. We report an IGZO phototransistor with an SCL (SCL/IGZO phototransistor) that demonstrated optimal photoresponse characteristics when the SCL was 150 nm thick. The SCL/IGZO phototransistor exhibited a photoresponsivity of 1.39 × 10³ A/W, photosensitivity of 4.39 × 10⁹, detectivity of 3.44 × 10¹³ Jones, and external quantum efficiency of 3.52 × 10³% when illuminated by green light (532 nm). Ultraviolet-visible spectroscopy and ultraviolet photoelectron spectroscopy analysis showed that Se has a narrow energy band gap, in which visible light is absorbed and forms a p-n junction with IGZO so that photogenerated electron-hole pairs are easily separated, which makes recombination more challenging. We show that electrons generated in the SCL flow through the IGZO layer, which enables the phototransistor to detect visible light. Furthermore, the SCL/IGZO phototransistor exhibited excellent durability and reversibility owing to the constant light and dark current and the time-dependent photoresponse characteristics over 8000 s when a red light (635 nm) source was turned on and off at a frequency of 0.1 Hz.

Light response behaviors of amorphous In–Ga–Zn–O thin-film transistors via in situ interfacial hydrogen doping modulation

Thin-film transistors (TFTs) based on amorphous In–Ga–Zn–O (a-IGZO) channels present high mobility, large-area uniformity, mechanical flexibility and photosensitivity, and thus have extensive applicability in photodetectors, wearable devices, etc. However, pure a-IGZO based photosensors only exhibit a UV light response with limited sensitivity performance. By utilizing in situ interfacial hydrogen doping, it is demonstrated that the a-IGZO TFTs with the Al₂O₃ dielectric deposited by plasma-enhanced atomic layer deposition at room temperature (RT) have excellent photosensing performance, such as a photoresponsivity of over 6 × 10⁵ A W⁻¹ and a light to dark current ratio up to 10⁷. This is attributed to spontaneous interfacial hydrogen doping into the a-IGZO channel during sputtering deposition of a-IGZO on hydrogen-rich Al₂O₃ films, thus generating subgap states in the band gap of IGZO. Further, color pattern imaging was achieved by employing an array of the color distinguishable devices, and flexibility was demonstrated by fabricating the TFTs onto polymer substrates. Moreover, it is also found that both the RT and 150 °C Al₂O₃ a-IGZO TFTs exhibit typical light-stimulated synaptic behaviors, including excitatory post-synaptic current and pair-pules facilitation, etc., and the memory time of the synaptic devices can be easily modulated by the degree of the interfacial hydrogen doping.

Thin-film transistors (TFTs) based on amorphous In–Ga–Zn–O (a-IGZO) channels present high mobility, large-area uniformity, mechanical flexibility and photosensitivity, and thus have extensive applicability in photodetectors, wearable devices, etc.

Artificially Fabricated Subgap States for Visible-Light Absorption in Indium-Gallium-Zinc Oxide Phototransistor with Solution-Processed Oxide Absorption Layer

We present a solution-processed oxide absorption layer (SAL) for detecting visible light of long wavelengths (635 and 532 nm) for indium-gallium-zinc oxide (IGZO) phototransistors. The SALs were deposited onto sputtered IGZO using precursor solutions composed of IGZO, which have the same atomic configuration as that of the channel layer, resulting in superior interface characteristics. We artificially generated subgap states in the SAL using a low annealing temperature (200 °C), minimizing the degradation of the electrical characteristics of thin-film transistor. These subgap states improved the photoelectron generation in SALs under visible light of long wavelength despite the wide band gap of IGZO (∼3.7 eV). As a result, IGZO phototransistors with SALs have both high optical transparency and superior optoelectronic characteristics such as a high photoresponsivity of 206 A/W and photosensitivity of ∼10⁶ under the influence of a green (532 nm) laser. Furthermore, endurance tests proved that the IGZO phototransistor with SALs can operate stably under red laser illumination switched on and off at 0.05 Hz for 7200 s.

Dual functional photo-response for p-Si/SiO2/n-InGaZnO graphene nanocomposites photodiodes

This study demonstrates dual functional hybrid heterojunction photodiodes (PDs) that comprise an amorphous indium gallium zinc oxide (a-IGZO) thin film blended with graphene nanoflakes and a SiO₂ (5 nm)/Si substrate. The PDs exhibit a photo-responsivity of approximately 0.15-0.27 A W^-1 under 633 nm illumination, which is much higher than that for a-IGZO based phototransistor in the visible region. The device also gives a long-lasting persistent photocurrent (PPC) when the UV light is extinguished. This results show that the hybrid heterojunction acts as a high performance photodetector for the detection of visible light and provides a universal scenario for development of PPC.

Reverse Offset Printing of Semidried Metal Acetylacetonate Layers and Its Application to a Solution-Processed IGZO TFT Fabrication

The submicrometer resolution printing of various metal acetylacetonate complex inks including Fe, V, Mn, Co, Ni, Zn, Zr, Mo, and In was enabled by a robust ink formulation scheme which adopted a ternary solvent system where solubility, surface wettability, and drying as well as absorption behavior on a polydimethylsiloxane sheet were optimized. Hydrogen plasma in heated conditions resulted in bombarded, resistive, or conductive state depending on the temperature and the metal species. With a conductivity-bestowed layer of MoO _x and a plasma-protecting layer of ZrO _x situated on the top of an IGZO layer, a solution-processed TFT exhibiting an average mobility of 0.17 cm²/(V s) is demonstrated.