Poly(cyclohexylethylene)-block-poly(ethylene oxide) Block Polymers for Metal Oxide Templating

Selective Swelling and Functionalization of Integral Asymmetric Isoporous Block Copolymer Membranes

SNIPS stands for a membrane fabrication technique that combines the evaporation induced self-assembly of the block copolymers and the classical nonsolvent induced phase separation. It is a one-step readily scalable technique to fabricate integral asymmetric isoporous membranes. The prominent developments in the last decade have carved out a niche for SNIPS as a potential technique to fabricate next generation isoporous membranes. In the last decade, a rich polymer library and variety of membrane postmodification routes have been successfully implemented to fabricate SNIPS membranes having the desired pore functionality. Some of these membranes form soft nanochannels in hydrated state due to swelling of the pore wall, i.e., the pore forming block of the block copolymer. These membranes having soft nanochannels have demonstrated the potential to perform several challenging separation tasks in ultrafiltration and nanofiltration. This paper highlights the currently accessible pore functionality, the strategies to tune the swelling of the soft nanochannels, the potential applications, and future perspectives of these membranes.

Synthesis and thermal properties of poly(vinylcyclohexane)-b-poly(4-vinylpyridine) diblock copolymers prepared via RAFT polymerization

A series of novel poly(vinylcyclohexane)-b-poly(4-vinylpyridine) (PVCH-b-P4VP) diblock copolymers have been synthesized through a combination of anionic and RAFT polymerization techniques. Using this approach, end functionalized ω-hydroxy-polystyrene was used to yield ω-hydroxy-PVCH by hydrogenation followed by end-functionalization via an esterification reaction with 2-(dodecylthiocarbonothioylthio)-2-methylpropionic acid to yield PVCH-RAFT agent. The crossover propagation from PVCH-RAFT to 4VP displays living character and allowed generating diblock copolymers with well-defined molecular compositions. The characterization of the resulted polymers was performed using 1H nuclear magnetic resonance (NMR) and Fourier-transform infra-red (FT-IR) spectroscopies, size-exclusion chromatography with light-scattering detector (SEC-LS), and the thermal properties were studied using differential scanning calorimetry (DSC).

Characterizing the Interface Scaling of High χ Block Copolymers near the Order-Disorder Transition

Advancements in the directed self-assembly of block copolymers (BCPs) have prompted the development of new materials with larger effective interaction parameters (χ_e). This enables BCP systems with phase separation at increasingly small degrees of polymerization (N). Very often these systems reside near the order-disorder transition and fit between the weak and strong segregation limits where the behavior of BCP systems is not as thoroughly understood. Utilizing resonant soft X-ray reflectivity (RSoXR) enables both the BCP pitch (L₀) and interface width (w_M) to be determined simultaneously, through a direct characterization of the composition profile of BCP lamellae oriented parallel to a substrate. A series of high χ_e BCPs with χ_e ranging from ≈0.04 to 0.25 and χ_eN from 19 to 70 have been investigated. The L₀/w_m ratio serves as an important metric for the feasibility of a material for nanopatterning applications; the results of the RSoXR measurement are used to establish a relationship between χ_e and L₀/w_m. The results of this analysis are correlated with experimentally established limits for the functionality of BCPs in nanopatterning applications. These results also provide guidance for the magnitude of χ_e needed to achieve small interface width for samples with sub-10 nm L₀.

Interfacial Energy-Controlled Top Coats for Gyroid/Cylinder Phase Transitions of Polystyrene-block-polydimethylsiloxane Block Copolymer Thin Films

Block copolymers (BCPs) with a high Flory-Huggins interaction parameter (χ) can form well-defined sub-10 nm periodic structures and can be used as a template for fabrication of various functional nanostructures. However, the large difference of surface energy between the blocks commonly found in high-χ BCPs makes it challenging to stabilize a useful gyroid morphology in thin film form. Here, we used an interfacial-energy-tailored top-coat on a blended film of a polystyrene-block-polydimethylsiloxane (PS-b-PDMS) BCP and a low-molecular-weight PDMS homopolymer with a hydrophilic end functional group. The top coat consisted of a random mixture of 40% hydrolyzed poly(vinyl acetate)-random-poly(vinly alcohol) (PVA-r-PVAc, PVA40) and PVAc homopolymer. At the optimized top-coat composition, gyroid nanostructures with sub-10 nm strut width were achieved down to ∼125 nm film thickness, which is only 3 times the lattice parameter of the gyroid structure. This is in marked contrast with a mixed morphology of gyroid and cylinders obtained for other compositions of the top coat. Self-consistent field theoretic simulations were used to understand the effect of the interfacial energy between the top coat and BCP/homopolymer blends on the phase transition behavior of the BCP/homopolymer films.

Light-Mediated Atom Transfer Radical Polymerization of Semi-Fluorinated (Meth)acrylates: Facile Access to Functional Materials

A highly efficient photomediated atom transfer radical polymerization protocol is reported for semi-fluorinated acrylates and methacrylates. Use of the commercially available solvent, 2-trifluoromethyl-2-propanol, optimally balances monomer, polymer, and catalyst solubility while eliminating transesterification as a detrimental side reaction. In the presence of UV irradiation and ppm concentrations of copper(II) bromide and Me₆-TREN (TREN = tris(2-aminoethyl amine)), semi-fluorinated monomers with side chains containing between three and 21 fluorine atoms readily polymerize under controlled conditions. The resulting polymers exhibit narrow molar mass distributions (Đ ≈ 1.1) and high end group fidelity, even at conversions greater than 95%. This level of control permits the in situ generation of chain-end functional homopolymers and diblock copolymers, providing facile access to semi-fluorinated macromolecules using a single methodology with unprecedented monomer scope. The results disclosed herein should create opportunities across a variety of fields that exploit fluorine-containing polymers for tailored bulk, interfacial, and solution properties.

Modular Monomers with Tunable Solubility: Synthesis of Highly Incompatible Block Copolymer Nano-Objects via RAFT Aqueous Dispersion Polymerization

The high incompatibility of block copolymers consisting of a neutral stabilizer block and a polyelectrolyte core-forming block is exploited to drive phase segregation during polymerization-induced self-assembly (PISA). A modular approach to systematically tune the solubility of ionic monomers/polymers is developed to efficiently identify monomers suitable for aqueous dispersion polymerizations. The strong phase segregation ability of the neutral-polyelectrolyte block copolymers favors the formation of worms over a relatively broad composition range and even at very low solids. These findings suggest that the degree of incompatibility between the stabilizer block and the core-forming block should be considered as one of the key parameters when studying morphological transitions in PISA.

Patterning at the 10 nanometer length scale using a strongly segregating block copolymer thin film and vapor phase infiltration of inorganic precursors

In this work, we demonstrate the use of self-assembled thin films of the cylinder-forming block copolymer poly(4-tert-butylstyrene-block-2-vinylpyridine) to pattern high density features at the 10 nm length scale. This material's large interaction parameter facilitates pattern formation in single-digit nanometer dimensions. This block copolymer's accessible order-disorder transition temperature allows thermal annealing to drive the assembly of ordered 2-vinylpyridine cylinders that can be selectively complexed with the organometallic precursor trimethylaluminum. This unique chemistry converts organic 2-vinylpyridine cylinders into alumina nanowires with diameters ranging from 8 to 11 nm, depending on the copolymer molecular weight. Graphoepitaxy of this block copolymer aligns and registers sub-12 nm diameter nanowires to larger-scale rectangular, curved, and circular features patterned by optical lithography. The alumina nanowires function as a robust hard mask to withstand the conditions required for patterning the underlying silicon by plasma etching. We conclude with a discussion of some of the challenges that arise with using block copolymers for patterning at sub-10 nm feature sizes.

Poly(cyclohexylethylene)-block-Poly(lactide) Oligomers for Ultrasmall Nanopatterning Using Atomic Layer Deposition

Poly(cyclohexylethylene)-block-poly(lactide) (PCHE-PLA) block polymers were synthesized through a combination of anionic polymerization, heterogeneous catalytic hydrogenation and controlled ring-opening polymerization. Ordered thin films of PCHE-PLA with ultrasmall hexagonally packed cylinders oriented perpendicularly to the substrate surface were prepared by spin-coating and subsequent solvent vapor annealing for use in two distinct templating strategies. In one approach, selective hydrolytic degradation of the PLA domains generated nanoporous PCHE templates with an average pore diameter of 5 ± 1 nm corroborated by atomic force microscopy and grazing incidence small-angle X-ray scattering. Alternatively, sequential infiltration synthesis (SIS) was employed to deposit Al2O3 selectively into the PLA domains of PCHE-PLA thin films. A combination of argon ion milling and O2 reactive ion etching (RIE) enabled the replication of the Al2O3 nanoarray from the PCHE-PLA template on diverse substrates including silicon and gold with feature diameters less than 10 nm.

Solvothermal Vapor Annealing of Lamellar Poly(styrene)-block-poly(d,l-lactide) Block Copolymer Thin Films for Directed Self-Assembly Application

Solvothermal vapor annealing (STVA) was employed to induce microphase separation in a lamellar forming block copolymer (BCP) thin film containing a readily degradable block. Directed self-assembly of poly(styrene)-block-poly(d,l-lactide) (PS-b-PLA) BCP films using topographically patterned silicon nitride was demonstrated with alignment over macroscopic areas. Interestingly, we observed lamellar patterns aligned parallel as well as perpendicular (perpendicular microdomains to substrate in both cases) to the topography of the graphoepitaxial guiding patterns. PS-b-PLA BCP microphase separated with a high degree of order in an atmosphere of tetrahydrofuran (THF) at an elevated vapor pressure (at approximately 40-60 °C). Grazing incidence small-angle X-ray scattering (GISAXS) measurements of PS-b-PLA films reveal the through-film uniformity of perpendicular microdomains after STVA. Perpendicular lamellar orientation was observed on both hydrophilic and relatively hydrophobic surfaces with a domain spacing (L0) of ∼32.5 nm. The rapid removal of the PLA microdomains is demonstrated using a mild basic solution for the development of a well-defined PS mask template. GISAXS data reveal the through-film uniformity is retained following wet etching. The experimental results in this article demonstrate highly oriented PS-b-PLA microdomains after a short annealing period and facile PLA removal to form porous on-chip etch masks for nanolithography application.

High χ-Low N Block Polymers: How Far Can We Go?

Block polymers incorporating highly incompatible segments are termed "high χ" polymers, where χ is the Flory-Huggins interaction parameter. These materials have attracted a great deal of interest because low molar mass versions allow for the formation of microphase-separated domains with very small (<10 nm) feature sizes useful for nanopatterning at these extreme dimensions. Given that well-established photolithographic techniques now face difficult challenges of implementation at scales of 10 nm and below, the drive to further develop high χ block polymers is motivated by trends in the microelectronics industry. This Viewpoint highlights our perspective on this niche of block polymer self-assembly. We first briefly review the relevant recent literature, exploring the various block polymer compositions that have been specifically designed for small feature size patterning. We then overview the now standard method for the benchmarking χ values between different pairs of polymers and the consequences of low N and high χ on the thermodynamic aspects of microphase separation. Finally, we comment on restrictions going forward and offer our perspective on the future of this exciting area of block polymer self-assembly.